TWI296131B - Method and apparatus for treating a substrate - Google Patents

Description

1296131 IX. The invention relates to a semiconductor wafer, a liquid crystal display (LCD) glass substrate, a plasma display (PDP) glass substrate, a printed circuit substrate, and an electronic device substrate. The substrate processing method in which the substrate is conveyed in the horizontal direction, the processing liquid containing the ice particles is supplied to the main surface of the substrate, the substrate processing such as the substrate cleaning is performed, and the substrate processing apparatus used when only the method is applied. [Prior Art] For example, in the substrate cleaning of a flat panel display (FPD) manufacturing apparatus such as an LCD or a PDP, it is performed to remove organic matter by using ultraviolet irradiation using a pseudo-molecular laser + using a roller brush (r〇1 i Ing brush) Wash and wash, remove 1 / m or more of contaminant + use the wash solution to remove the residual liquid from the cleaning solution + use 2 fluid cleaning to perform precision cleaning + use the final water wash A series of steps to complete the wash. In addition, in recent years, there has been a proposal to replace the roller brush cleaning, and it has been modified to disperse ice particles in a liquid to prepare ice mud in a snow-like suspension state, and to remove the ice mud from (4) as disclosed in Japanese Patent No. A washing method in which the surface of the plate is ejected and the ice particles collide with the substrate to wash the substrate. SUMMARY OF THE INVENTION (Problems to be Solved by the Invention) Conventionally, the cleaning method using ice mud is to eject the ice mud from the nozzle toward the surface of the substrate, so that the particles collide with the substrate, and the surface of the substrate is rubbed with the ice particles. For the southern washing effect, the ice mud must be pressurized and the ice mud should be pressed out of the nozzle according to a certain degree. However, it will contain a solid 312XP/inventive manual (supplement)/94-12/94130083 1296131 JUL 2 0 2007 Replacement page ^ ~ . — The liquid that is replacing the page grudge, spreads widely over the substrate. The surface is extremely difficult, so when the ice mud is pressurized and ejected from the nozzle, the energy when the ice mud hits the surface of the substrate is uneven depending on the position on the surface of the substrate. In particular, in recent years, the size of the substrate has increased, and in order to spread the ice mud over a wider surface of the substrate, it is necessary to increase the discharge pressure of the ice mud from the nozzle, so that the ice mud is sprayed from the nozzle and uniformly dispersed on the surface of the substrate. It's more difficult' to make the unevenness of energy when the ice mud hits the surface of the substrate. As a result, there will be problems such as uneven handling such as uneven washing. Further, for example, in the manufacture of an LCD, the metal film for a liquid crystal pattern is formed of a physically soft metal material such as aluminum (Al) + molybdenum (M〇), and the collision energy between the ice particles and the surface of the substrate is uneven. And the problem that the metal film will be partially damaged. The present invention has been made in view of the above circumstances, and an object thereof is to provide a case where a treatment liquid containing ice particles is supplied to a surface of a substrate, and a process such as washing the substrate is performed, and no unevenness in processing occurs. A substrate processing method which performs uniform substrate processing without causing damage to a coating film such as a metal film formed on a substrate, and a substrate processing apparatus which is suitable for carrying out the method. (Means for Solving the Problem) The first invention relates to a substrate processing method for supporting a substrate and transporting the processing liquid to the main surface of the substrate, and performing processing on the substrate; characterized in that the processing liquid containing ice particles is used The main surface of the substrate is supplied, and the stirring member is brought into contact with or close to the main surface of the substrate, and the treatment liquid containing ice particles is stirred on the main surface of the substrate.

326\total gun\94\94130083\94130083 (replacement)-2 1296131

Inhibition® 正汴·;

The substrate processing method according to the first aspect of the invention, wherein the substrate is supported in an inclined posture and is picked up in a direction orthogonal to the oblique direction and in a horizontal direction. While the treatment liquid containing the ice particles supplied to the main surface of the substrate is inclined and flows down the substrate, the treatment liquid containing the ice particles is stirred on the main surface of the substrate by the kneading member. According to a third aspect of the invention, in the substrate processing method of the first aspect of the invention, the agitating member is a planar brush, and the planar brush is moved back and forth across the total width of the substrate along the main surface of the substrate toward the substrate in a direction in which the parent direction is transferred to the substrate. mobile. According to a fourth aspect of the invention, a substrate processing method for supplying a processing liquid to a main surface of a substrate and treating the substrate is characterized in that a processing liquid containing ice particles containing hydrogen peroxide is supplied to the main surface of the substrate. According to a fifth aspect of the invention, in the substrate processing method of the fourth aspect of the invention, the substrate is supported and transported in a horizontal direction, and the treatment liquid of ice particles (including hydrogen peroxide) is supplied to the main surface of the substrate, and the treatment liquid is utilized. The mixing member is disturbed on the main surface of the substrate. According to a sixth aspect of the invention, a substrate processing method for supplying a processing liquid to a main surface of a substrate and treating the substrate is characterized in that a processing liquid containing ice particles dissolved in carbon dioxide is supplied to the main surface of the substrate. According to a seventh aspect of the invention, the substrate processing method according to the sixth aspect of the invention, wherein the substrate is supported and transported in a horizontal direction, and the treatment liquid containing ice particles-dissolved by carbon dioxide is supplied to the main surface of the substrate, and the treatment liquid is used for mixing. The member is stirred on the main surface of the substrate.

326\总档\94\94130083\94130083 (replacement)-2 JUL 2 Ο 2007 f Replacement buy 1296131 / ~^— ,· , _7 shed repair (Chu) is replacing page 丄________ — The 8th invention is as the first The substrate processing method according to any one of the seventh invention, wherein the processing of the substrate is a cleaning treatment. The substrate processing apparatus according to the ninth aspect of the invention includes the substrate transfer means for supporting the substrate and transporting in the t-flat direction, and the processing liquid supply means for supplying the processing liquid to the main surface of the substrate conveyed by the substrate transfer hand k The method is characterized in that the processing liquid supply means supplies the processing liquid containing ice particles to the main surface of the substrate, and further has a treatment liquid which contacts or is close to the main surface of the substrate, and contains ice particles on the main surface of the substrate. Mixed compounding components. According to a ninth aspect of the invention, in the substrate processing apparatus, the substrate transfer means supports the substrate in an inclined posture, and conveys the substrate in a direction perpendicular to the oblique direction and horizontally. The liquid i, the hand & the ice-containing particle treatment liquid supplied to the main surface of the substrate, flows down obliquely. According to the eleventh invention, the substrate processing apparatus according to the ninth invention calls for a hybrid (four) planar brush, and the planar brush is disposed in the substrate transport direction, and the processing liquid supply position by the processing liquid supply means is further advanced. The side of the square side is provided with a moving means U. The movable plane reciprocates the flat brush along the main surface of the substrate so as to intersect the direction in which the substrate is conveyed. According to a ninth aspect of the invention, the substrate processing apparatus according to the ninth aspect of the invention, wherein the processing liquid supply means in the basin is provided with a nozzle and an anti-system, and the ice-containing particle treatment liquid WK hand & The slit-shaped outlet of the nozzle liquid machine; the ice making / U6\H; _4\94130083\94130083 (replaces 1296131 muscle 2 0 2 thank the page to send liquid means to modulate the ice-containing particle treatment liquid and send it to The substrate processing apparatus according to the twelfth aspect of the invention, wherein the ice-making/liquid-feeding means is provided with: a container, a cooling means, a scraping means, a pure water supply means, and a pipe; and the container has a cylindrical inner peripheral wall surface provided with a supply port and a discharge port; the cooling means cools the wall surface of the container; the scraping means scrapes off the ice crystals deposited and grown on the inner peripheral wall surface of the container The pure water supply means supplies pure water through the supply port to the container; the pipe conveys the pure water containing ice particles discharged from the container through the discharge port to the nozzle. The 14th invention a substrate processing apparatus that supplies a processing liquid to a main surface of the substrate and performs a treatment on the substrate; and is characterized by: a substrate supporting means - and a processing liquid supply means; the substrate supporting means supports the substrate; and the processing liquid supply means A substrate processing apparatus according to a fourteenth aspect of the invention, wherein the processing liquid supply means is provided with a processing liquid, wherein the processing liquid supply means is provided in the main surface of the substrate supported by the substrate supporting means. The liquid preparation device is a substrate treatment apparatus according to a fifteenth aspect of the invention, wherein the treatment liquid preparation means is provided in the substrate treatment apparatus according to the fifteenth aspect of the invention, wherein the treatment liquid containing the hydrogen peroxide particles is cooled. There is a hydrogen peroxide water mixing method in which hydrogen peroxide and pure water are mixed in a predetermined ratio, and the above-mentioned predetermined concentration of hydrogen peroxide water is formulated.

326\|悤 file\94\94130083\94130083 (replace)·2

The substrate processing apparatus according to the fourteenth aspect of the invention, wherein the substrate supporting means supports the substrate and transports the substrate in a horizontal direction. Further, the means for supplying the stirring means further supplies a treatment liquid containing hydrogen peroxide ice particles to the main surface of the substrate to which the substrate transfer means is transported by the processing liquid supply means, and is provided on the main surface of the substrate The treatment liquid containing hydrogen peroxide ice particles is stirred up. The 18th invention is a substrate processing apparatus which supplies a processing liquid to a main surface of a substrate and performs a treatment on the substrate, and is characterized in that: a substrate supporting means and a processing liquid supply means are provided The substrate supporting means supports the substrate; the processing liquid supply means supplies a processing liquid containing ice particles by dissolving carbon dioxide to the main surface of the substrate which is supported by the substrate supporting means. The substrate processing apparatus according to the eighteenth aspect of the invention, wherein the processing liquid supply means is provided with a processing liquid modulating means for dissolving carbon dioxide dissolved in carbon dioxide in pure water The substrate processing apparatus according to the nineteenth aspect of the present invention, wherein the processing liquid preparation means is provided with a carbon dioxide aqueous solution preparation means, which is pure The substrate processing apparatus according to the eighteenth aspect of the invention, wherein the substrate supporting means is a substrate conveying means that supports the substrate and is conveyed in a horizontal direction, and further includes a stirring member. By the processing liquid supply means, the main surface of the substrate to which the substrate transfer means is transported is supplied with 326_file\94\94130083\94130083 (replacement)·2 1296131 month is the daily repair). Replacement page JOL 2 0 2007, a processing liquid containing ice particles dissolved in carbon dioxide is replaced, and a treatment liquid containing ice particles dissolved in carbon dioxide is mixed on the main surface of the substrate. The 22nd invention is any one of the substrates of the 8th to 21st inventions. In the processing apparatus, the processing of the substrate is washed. (Effect of the invention) The substrate processing method according to the first aspect of the invention is to contain ice micro The treatment liquid of the granules is supplied to the main surface of the substrate, and the treatment liquid containing the ice granules is stirred on the main surface of the slab by the mixing member, whereby, for example, during the cleaning treatment, the concave portion of the surface of the substrate can be Contaminants such as ages are scraped off with ice particles, and the pollutants are discharged from the main surface of the substrate together with the treatment liquid. Therefore, the pollutants are not contaminated by the force of the ice particles colliding with the main surface of the substrate. Instead of removing the substrate, the treatment liquid containing ice particles is mixed on the main surface of the substrate to remove the contaminant from the substrate, so that it is not necessary to pressurize the treatment liquid containing the ice particles and eject it from the nozzle. Step

Therefore, according to the substrate processing method of the first aspect of the invention, uniform substrate processing can be performed without causing uneven processing, and damage to a coating film such as a metal film formed on the substrate is not caused. In the substrate processing method according to the second aspect of the invention, since the substrate is supported and transported in an inclined posture, the processing liquid for supplying the ice-containing fine particles to the main surface of the substrate is inclined to flow down the substrate, and is performed on the main surface of the substrate by the stirring member. The mixing is carried out while naturally flowing out from the edge of the lower side of the substrate. In the substrate processing method according to the third aspect of the invention, the page is replaced by the flat brush along the substrate main 326_file\94\94130083\94130083 (replacement)·2 11 1296131 JUL 2 Ο 2007 replacement page #9月) The treatment liquid containing ice particles supplied to the main surface of the substrate can be efficiently scrambled on the main surface of the substrate in a direction perpendicular to the substrate transfer direction and moving back and forth across the total width of the substrate. In the substrate processing method of the fourth aspect, by supplying the processing liquid containing the ice particles to the main surface of the substrate, it is possible to use the ice particles in the presence of particles such as fine particles present in the concave portion of the substrate surface during the cleaning process. The scraping is performed to cause the smudge substance and the treatment liquid to flow out and be removed from the main surface of the substrate. In this case, since the ice particles contain hydrogen peroxide, they are softer than ice particles prepared by only cooling with pure water. Therefore, for example, when the treatment liquid containing ice particles is pressurized and ejected from the nozzle, the unevenness of the energy when the ice particles collide against the surface of the substrate even with the position on the surface of the substrate can be prevented. For example, in the case where the metal film for the liquid crystal pattern is partially damaged, the degree of contamination of the organic matter contained in the glass substrate or the like supplied by the manufacturer of FPD or the like has been reduced in recent years, but because of the main surface of the base plate of the Kiru plate The ice particles supplied to the treatment liquid contain hydrogen peroxide, whereby the organic matter on the substrate can be decomposed and removed by the oxidation of hydrogen peroxide. Therefore, according to the substrate processing method of the fourth aspect of the invention, it is possible to prevent the coating film such as the metal film formed on the substrate from being damaged, and when the degree of contamination of the organic substance of the substrate is not so serious, a series of cleaning treatments on the substrate are performed. In the middle, the removal step of organic contamination will be omitted. In the substrate processing method according to the sixth aspect of the invention, the processing liquid containing the ice particles is supplied to the main surface of the substrate, for example, when the cleaning process is performed, the surface of the substrate is concave 326\|§ file\94\94130083\94130083 (replacement)- 2 12 1296131 JUL 2 Ο 2007 Replacement of the 寊月曰修 (more) is replacing the pollutants such as particles present in the page-part, etc., and the material is discharged from the main surface of the substrate together with the treatment liquid. And removed. Here, the treatment liquid containing ice particles dissolved in carbon dioxide is produced by cooling an aqueous solution of carbon dioxide which dissolves carbon dioxide in pure water, and is therefore softer than ice particles obtained by cooling only pure water. Therefore, for example, when pressurizing the work containing the particles and ejecting from the squirt, even if the position of the two substrates is on the surface of the substrate, the energy of the ice particles colliding with the surface of the substrate is somewhat uneven. It is prevented that a metal film for a liquid crystal pattern is partially damaged, and a wound condition occurs. Further, since carbon dioxide is dissolved in the treatment liquid containing ice particles, the resistivity 处理 of the treatment liquid will be smaller than that of pure water. The treatment liquid containing ice particles due to the b,, and the second/combination of the mono-oxidation is less likely to generate static electricity when flowing through the pipe and being conveyed by the nozzle, so that the supply of the main surface of the alpha substrate is Keep in mind that the fine patterns and devices on the substrate will not be damaged by static electricity. In the substrate processing method according to the sixth aspect of the invention, the coating film such as the metal film formed on the substrate is not damaged, and the fine pattern and the device on the substrate are not damaged by static electricity. According to the substrate processing method of the fifth and seventh inventions, for example, when the cleaning process is performed, the pollutants are not removed from the substrate by the force of the ice particles colliding with the main surface of the substrate, but by the main surface of the substrate. Supplying the treatment liquid containing ice particles, and removing the contaminant shell from the substrate by mixing with the compounding member on the main surface of the substrate. Therefore, it is not necessary to pressurize the treatment liquid containing the ice particles to be ejected from the nozzle. Measures. 326\||file\94\94130083\94130083 (replacement)·2 13 1296131 JUL 2 0 2007 Replacement page, therefore, in the substrate processing method of the fifth and seventh inventions, there will be no treatment liquid containing ice particles The energy unevenness when colliding with the surface of the substrate causes a possibility that unevenness in processing occurs, so that uniform substrate processing can be performed, and damage to a coating film such as a metal film formed on the substrate can be more reliably prevented. The substrate processing method of the syllabary is to remove contaminants such as fine particles existing in the concave portion of the substrate surface from the main surface of the substrate. In the substrate processing apparatus according to the ninth aspect of the invention, the processing liquid supply means supplies the processing liquid containing ice particles to the main surface of the substrate, and the mixing member contacts or approaches the main surface of the substrate, and the ice particles are disposed on the main surface of the substrate. The treatment liquid is stirred, whereby, for example, when the cleaning treatment is performed, there is a presence of a concave portion or the like on the surface of the substrate (the chemical-specific pollutant is scraped off by the ice particles, and the pollutant is discharged from the main surface of the substrate together with the treatment liquid. It flows out and removes. According to this, instead of using the particles of ice particles to collide with the main surface of the substrate, the pollutants are removed from the substrate, but the treatment liquid containing ice particles is used to stir the main surface of the substrate. Since the object shell is removed from the substrate, there is no need to pressurize the microparticle-containing treatment liquid by the treatment liquid supply means, and then spray it onto the main surface of the substrate. Therefore, if the substrate processing apparatus of the ninth invention is used, The processing is uneven, and uniform substrate processing can be performed without causing damage to the coating film such as a metal film formed on the substrate. Since the substrate is supported by the substrate transfer means in an inclined posture and transported, the processing liquid supply 326W^\94\94130083\94130083(#^)-2 14 1296131 JOL 2 Ο 2007 replaces the page month/3⁄4 repair ( In addition, the replacement page--the processing liquid supplied to the main surface of the substrate containing the ice particles, the one side of the Shanghai-Mei board is inclined, and the two-mixing is performed on the main surface of the substrate by the stirring member, and then the lower position of the substrate is removed. The substrate processing apparatus according to the eleventh aspect of the present invention uses the moving means to move the flat brush in a direction intersecting the substrate conveying direction in a direction intersecting the substrate conveying direction, and to reciprocate across the total width of the substrate. The processing liquid containing ice particles supplied to the main surface of the substrate is efficiently pulverized on the main surface of the substrate. The substrate processing apparatus according to the twelfth aspect of the invention is prepared by using an ice making/liquid feeding means to prepare a processing liquid containing ice particles. To the nozzle, the treatment liquid containing the ice particles is discharged from the slit-like outlet of the nozzle and supplied to the main surface of the substrate, particularly without applying pressure. The substrate treatment of the thirteenth invention The device cools the wall surface of the container by using a cooling means, and supplies a part of the pure water in the container through the supply port through a pure water supply means, and freezes by cooling the wall surface of the container, and then uses the scraping means. Scrape the ice crystals deposited and grown on the inner peripheral wall of the container, and diffuse it in pure water to prepare pure water containing ice particles. Then, the pure water containing ice particles is discharged from the container through the discharge port. The substrate processing apparatus according to the fourteenth aspect of the present invention supplies the treatment liquid containing ice and particles to the main surface of the substrate by the processing liquid supply means, for example, in the concave portion of the substrate surface, etc., when the cleaning treatment is performed. Contaminants such as particles will be scraped off by the ice particles, and the pollutants will flow from the main surface of the substrate together with the treatment liquid 326\total file\94\94130083\94130083 (replacement)-2 丨(S) 1296131 JUL 2 Ο 200? Replace the month/3⁄4 repair (love} is replacing page 1 ^ and remove. At this time, the ice particles in the Z liquid supplied to the main surface of the substrate by the treatment liquid supply means are softer than the ice particles produced only by the pure water. Therefore, for example, when the treatment liquid containing ice particles is pressurized and ejected from the nozzle, the energy of the ice particles colliding against the surface of the substrate may be uneven even if the position on the surface of the substrate is different. In order to prevent partial damage to the metal film for a liquid crystal pattern, for example, since the ice particles in the processing liquid supplied to the main surface of the substrate contain hydrogen peroxide, the organic matter of oxygen using the hydrogen peroxide is decomposed and decomposed. Remove. Therefore, the substrate processing device invented by the right brother 14 can damage the coating film such as the metal film, and the organic film of the substrate is severely affected by the affair, and the substrate is connected. The string washing treatment will omit the removal step of organic contamination. In the substrate processing apparatus according to the fifteenth aspect of the invention, the treatment liquid supply means adjusts a predetermined concentration of hydrogen peroxide water to cool the "3 ice particles (which are hydrogen peroxide containing) treatment liquid. The substrate processing apparatus is a processing liquid (4), a manual processing method, and a method of mixing chlorine peroxide and pure cesium in a predetermined ratio to prepare hydrogen peroxide water of a predetermined concentration. The treatment liquid for treating the ice particles is supplied to the main surface of the substrate, and is stored in the concave portion of the substrate surface during the treatment, and the cleaning is carried out by the ice particles, so that the pollutants such as pollutants are treated. The liquid is taken from the substrate 326\total gun\94\94130083\94130083 (replacement)-2 JUL 2 0 2007 Replacement page 1296131 Π~~^~- , <_?月别修(more) replacement page 1

_" 1 _ιι 一,·_ “^t J is discharged and removed on the main surface. At this time, the treatment liquid supplied to the main surface of the substrate by the treatment-liquid supply means is dissolved in the pure water. The aqueous solution of carbon dioxide is cooled and thus softened by cooling only pure water to produce ice particles. Therefore, for example, when the treatment liquid containing ice particles is pressurized and ejected from the nozzle, even due to the surface of the substrate The upper position is different, and the energy f when the ice particles collide against the surface of the substrate is small: the uniform condition can still prevent, for example, the metal film of the liquid crystal pattern from being damaged by the redundant portion. Moreover, since it is dissolved in the treatment liquid containing ice particles. The carbon dioxide' is thus less than the pure water. Therefore, the treatment liquid containing ice particles supplied to the main surface of the substrate is less likely to generate static electricity when flowing through the pipe and being supplied to the nozzle, and is supplied to the main surface of the substrate. At the time, the fine patterns and devices on the substrate will not be damaged by static electricity. Therefore, if the substrate processing device of the invention of 帛18 is used, it will not be formed on the substrate. The metal coating film is damaged, and the JL does not cause damage to the fine pattern and the device on the substrate due to static electricity. The substrate processing apparatus according to the nineteenth aspect of the present invention dissolves the pure water by the treatment liquid preparation means of the treatment liquid supply means. The carbon dioxide aqueous solution of carbon dioxide is cooled, and the oxidized carbon granules containing the oxidized carbon are prepared. The substrate processing apparatus according to the twentieth aspect of the invention is a carbon dioxide aqueous solution preparation means using a treatment liquid preparation means to dissolve carbon dioxide in pure water to prepare An aqueous solution of carbon dioxide is obtained. S) 326 fiber file\94\94130083\94130083 (replacement)-2 17 1296131 *September 73⁄4 repair (moving replacement page J|4°ι07, regarding the substrate processing apparatus of the 17th and 21st inventions, for example When performing the cleaning and treatment, 'because the force of the ice particles against the main surface of the substrate is not used to remove the contaminated material from the substrate, but the processing liquid containing the ice particles supplied to the main surface of the substrate is used in the substrate main The surface is removed by mixing with the mixing member to remove the pollutants from the substrate, so that it is not necessary to pressurize the treatment liquid containing the ice particles. In the nozzle processing apparatus of the 17th and 21st inventions, the unevenness of the processing may occur due to the non-uniform energy when the treatment liquid containing the ice particles collides against the surface of the substrate. Therefore, it is possible to perform a uniform substrate treatment, and it is possible to more reliably prevent damage to a coating film such as a metal film formed on a substrate. The substrate processing apparatus according to the 22nd aspect of the invention is a microparticle present in a concave portion or the like on a substrate surface. [Embodiment] Hereinafter, preferred embodiments of the present invention will be described with reference to the drawings. Fig. 1 to Fig. 4 show an example of an embodiment of the present invention. The substrate processing apparatus is an important part perspective view of the schematic structure of the substrate cleaning apparatus in this example, and FIG. 2 is a front view thereof, and FIG. 3 is a side view thereof, and FIG. 4 is not a substrate cleaning apparatus. A schematic cross-sectional view of the structure of the ice making/liquid supply unit constituting one of the requirements. The substrate cleaning apparatus includes a drum conveyor (not shown in FIG. 3 and FIG. 3), a nozzle 12, and a flat brush 14; the drum conveyor is a plurality of conveying rollers arranged in parallel with each other. 1〇, the substrate 326·file\94\94130083\94130083 (replacement)-2 18 1296131: is supported in an inclined posture, and is horizontally oriented in the oblique direction of the oblique direction; the substrate W is conveyed; The nozzle 12 supplies pure water containing ice particles (hereinafter referred to as "ice mud") to the main surface of the substrate w conveyed by the drum conveyor, and the flat brush 14 is used to mix the ice mud on the main surface of the substrate w. . The length of the jet V 12 is substantially equal to the width direction of the substrate ψ transporting direction, and is disposed at a position directly above the substrate W so as to be inclined with respect to the substrate transfer direction and the substrate W. A slit-shaped outlet is provided in the longitudinal direction of the lower end surface of the nozzle 丨2, and the ice-like sludge flows out from the slit-shaped outlet. The nozzle 12 is connected to the pipe 16 so as to communicate with the flow path formed therein, and the nozzle 2 passes through the pipe 16 to form a flow path connection state with an ice making/liquid supply unit 2 (see Fig. 4) which will be described later. The flat brush 14 is provided at a position closer to the front side of the substrate transfer direction than the nozzle 12, and is located close to the nozzle 12, and bristles 18 such as mohair and nylon are placed in a plane on the lower surface. The length of the flat brush 14 is substantially the same as the dimension of the substrate W in the width direction, and is disposed at a position directly above the substrate w so as to intersect the substrate transport direction and be inclined along the substrate w. Further, although not shown, the flat brush 14 is supported by the supporting/moving mechanism so that the front end of the bristles 18 is in contact with or close to the main surface of the substrate w, and is reciprocally moved across the total width of the substrate W in the longitudinal direction by the supporting/moving mechanism. The ice making/liquid supply unit 20 that modulates the ice mud and transports it to the nozzle 12, as shown in FIG. 4, is provided with a granulator 22 having a double wall structure and having a cylindrical inner peripheral wall surface, and A pure water supply port 24 and an ice sludge discharge port 26 are provided. 312XP/Invention Manual (Supplement)/94-12/94130083 19 1296131 The pure water supply port of the device 22 is a system 涟28 (the system is connected by a flow path. The pure water supply pipe is connected and connected to the ice mud liquid supply 2用. With the official 1 6 (the flow path 逵 salt recognition + 12). The inner wall of the container 22 is connected to the outer wall, and the mouth is 3 〇. The anti-double is in the container 22 double: The temperature of the liquid, 俾 will be able to cry p 9 ♦ to the freezing point below the freezing point of the inner wall of the village. 22 inside the container 22, in the 苴铋, search, the freezing point below the freezing point on the axis 34 The end of the spiral blade 3 匕 extended on the outside of the container 22 is connected === the blade 36 has a close to the crying 22 heart $, and the red shaft is rotated. The spiral uses the peripheral blade of the inner wall of the 、 。. When the fulcrum 34 rotates, the spiral blade 36 will appear as a peripheral blade-edge close to the container 2. The soil is rotated by the edge in the ice making/liquid supply section 2, if you stand D 24 99 ^ 砘水(The source is pure water to supply I pure water, (4) the pure phase is frozen by the second 曰I in the container 22, and precipitates on the inner wall surface of the container 22 and grows into two The outer blade of the squeezing blade is scraped. Then, the ice crystals scraped from the wall of 2 will be diffused in pure water, and the second cement will be adjusted. At this time, the ice particles in the ice mud are, for example, τδ. ^(4) The particle size of the left and right 'fitted to the substrate to be cleaned W Table 3 ^The line width and the groove width' are rotated by the cooling fins 36 on the inner peripheral wall surface of the container 22, and the pure water supply flow in the container 22 The appropriate setting of the conditions can be adjusted to adjust the particle size of the ice particles. In the container 312XP / invention manual (supplement) / 94_〗 〖 3 〇〇 83 20 1296131; again, the force, and through the container 22 through the ice The mud discharge 26 discharge is sent to the nozzle 12 by the official 16th. Therefore, according to the ice making/sending, the static ice-free transfer can be performed without pulsation. In addition, the ice making/liquid portion 2G hardly needs to be set. The space can be installed in the vicinity of the nozzle 12, so that the pipe 16 can be shortened. With respect to the substrate cleaning device having the above-described structure, the ice-feeding portion of the liquid-feeding unit 2 is adjusted and sent to the ice mud of the nozzle 12, In the case of no special pressurization I: the slit-shaped outflow port of the stunned 12 flows out and is supplied to the utilization. The main surface of the substrate w that is conveyed in the horizontal direction by the drum conveyor in the horizontal direction. The ice mud supplied to the main surface of the substrate W is inclined to flow along the substrate (9), and is moved by a plane brush that reciprocates in the direction in which the substrate is conveyed. 14. On the main surface of the board W, the mixing is carried out, and then naturally flows out from the lower end side edge of the substrate w. At this time, the ice mud will be searched and mixed on the main surface of the substrate by the flat brush 14, thereby the substrate W Contaminants such as particles present in the surface recesses and the like are contaminated with ice particles in the ice mud, and the pollutants are discharged from the main surface of the substrate W together with the ice mud and the gluten water. . In addition, the structure of the ice making/liquid supply unit 20 is not limited to that described in the above-described embodiment of the bear, and the ice field of the ice making unit (4) can be stored in the buffer tank γ, and the ice mud can be carried out in the buffer tank. The slurry is sent to the nozzle 12 by static stirring while using the fruit buffer tank. In the substrate cleaning apparatus shown in FIG. 1 to FIG. 3, a treatment liquid containing ice particles containing hydrogen peroxide (hereinafter referred to as "hydrogen peroxide containing ice water") may be sent to the nozzle 12 through the pipe 16. 'With the hydrogen peroxide ice mud 312XP / invention manual (supplement) / 94-12/94130083 21 1296131, the main surface of the substrate conveyed by the conveyor. The liquid supply unit 4 picks up the rain water and the liquid portion 2, and instead, the ice making unit I 4 0 ' is placed in the pipe 16 and the portion 40 is connected to the nozzle 12 as shown in Fig. 5 . The ice-making/liquid-feeding inner peripheral wall surface has a double-wall structure and a cylinder 46. The container 42 hydrogen peroxide water supply port 44 communicates with the ice sludge discharge port supply port 44, and connects the valley/per emulsified hydrophobic water hydrogen peroxide water supply with the distribution f water supply pipe 48, and further, in the hydrogen peroxide water It enters the inside of the mixing tank 50. Pure in the flow path connected to the pure water supply source: supply bank 曰 =: and the connection flow path is connected to the hydrogen peroxide supply tank (not supplied port, and 6 〇 supply port. In the pure water supply pipe 58, ^ = Emulsified hydrogen supply control valve 62 and flow adjustment 阙, and in the second pass, the switch is controlled by the switch to set the switch to control the hurricane "Guan 60 command, 剌 66 66 and flow adjustment valve 68. In the bar 42 The space between the inner wall and the outer wall is filled with the antifreeze solution 70, which is frozen in the double wall of the container 42. The intermediate (four) ring is cooled by the cold box 72 to the following temperature, and the inner circumference of the container 42 is used. Wall cooling is maintained at the temperature of solidification. In the case of H 42 (four) (four) heart position _ extension 5 and the outer end of the valley 4 2, the rabbit, the fish gentleman 浐 77 77 7fW 目 ▲ ▲ for the rotation of the motor 78 The screw blade 76 is "a peripheral blade near the inner peripheral wall of the container 42. 312XP / invention manual (supplement) / 94-12/94130083 22 74 1296131 ^^«>x/itr,t" VI^ ^:4^# ° 58中中#9 knives control the pure water supply pipe: =r pure water, and Tong 2 ==:: line mixed, and yttrium oxide 'in the mixing tank 5 〇 依 既 既 。 。 调制 调制 调制 调制 调制 调制 调制 调制 调制 调制 调制 调制 调制 调制 调制 调制 调制 调制 调制 调制 调制 调制 调制 调制 调制 调制 调制 调制 调制 调制 调制 调制 调制 调制 调制 调制 调制 调制 调制 调制 调制 调制 调制 调制 调制 调制Oxygen is passed through the hydrogen peroxide water supply = water, supplied by hydrogen peroxide water... Inflow ~ =: ::: Too: hydrogen water, part of the inner wall of the container 42 will be 曰m : 'Ice, which is deposited and grown on the inner wall of the valley 2, will be scraped off by the outer blade of the spiral blade 76. The ice crystals scraped from the inner wall surface of the container 42 will diffuse the material. Perchloric acid chlorinated mud. At this time, the sulphuric acid containing ice: the hail granules will contain hydrogen peroxide. In the case of the main surface of the substrate W which is conveyed by the squirrel-shaped conveyor in the horizontal direction, as described above, the substrate Η is a contaminant such as particles present in the recess or the like. It will flow out from the substrate surface with the hydrogen peroxide containing hydrogen peroxide and its dissolved water. In addition, because of the ice micro-containing hydrogen peroxide ice mud The granule contains hydrogen peroxide, and thus the organic matter on the substrate w is decomposed and removed by the oxidation of hydrogen peroxide by the 312Xp/invention specification (supplement)/94-12/94130083 23 1296131; hydrogen peroxide The ice particles in the ice mud are due to the pervaporation "flat brush 140 sway rocking speed (when the flat brush 14 is used instead of the rolling brush, it is the rotation speed), and the washing with the plane... Net performance. In addition, because the flat brush = 18 frequent contact and peroxide k k 々 々 细菌 bacteria. In the cryptophobic feng shui 'thus can also inhibit the flat brush 14 produced in the waste / containing peroxy bismuth: The waste liquid contains peroxidic gas, and the waste liquid is placed for a predetermined period of time to carry out water/side water.仃J can thus be reused as a common other 'this device is not the same as the above, and is supplied from the nozzle 12 to the substrate w main, = mud to add hydrogenated ice mud to perform the Garry again #_ ^ P The ice in the peroxygen peroxide-containing ice mud is on the main surface of the substrate W. Since no liquid crystal pattern is used, for example, it is soft, so that the ice making/liquid supply unit 40 is ^^^^ As described in the above, for example, it is also possible to modulate the ice granules of the morphological particles in the ice making portion, and store the prepared ice mud in the buffer = the ice of the wind, and statically mix the ice mud in the buffer tank. The ice mud is conveyed toward the nozzle 12 while wide side. In the buffer tank, the pump is used in the next step. 'The substrate shown in Fig. 1 to Fig. 3 is washed by the pipe 16 and the poem is sent to the poem. 2 is dissolved. The second processing solution (hereinafter referred to as "carbonic acid gas - oxygen ^) The ice crystals are dissolved in ice mud and supplied to the ice mud.) The carbon dioxide gas transfer machine is transported to the main surface of the county plate W. 3] 2XP / hair face book (supplement) / 94-] 2 / 94〗 30083 24 !296131, in other words, in place of the ice / liquid supply section 20 will be replaced as shown in Figure 6 / = 8G 'The flow path is connected to the nozzle 12 via the pipe 16 . The ice making/supplying liquid 〇 is provided with a container 82 which has a double wall structure and has a peripheral wall surface and is provided with a dioxide aqueous solution supply port 84 and ice sludge discharge. The discharge port 86 of the container 82 is connected to and connected to the ice-slurry liquid supply system=16 (the flow path is connected to the nozzle (2). The supply port 84 of the container 82 is connected to the carbon dioxide aqueous solution supply f 88, and the pipe is provided. / Will be inserted into the inside of the carbon dioxide aqueous solution preparation tank 90. In addition, two: = intervening the pump 92, the transition unit 94, and the on-off valve 96. The reservoir circumference; the groove sealing structure 'this modulation groove 9. The flow path is connected to the fine ^ two banks It is connected to the pure water supply pipe 2 through which the on-off valve 100 is inserted, and the carbon dioxide gas supply port 2 is inserted into the inside of the modulation tank 9 (the octagonal & road is connected to the front end of the carbon dioxide gas supply gas supply pipe 1〇2). Blowing out two =: and near the surface. In the carbon dioxide gas supply pipe 1 〇 2 into,;: \90 insole # valve 1G4 and flow adjustment valve (10). 77 〃 & set the switch control in the Valley 82 The inner wall and the outer wall* (10). The anti-mother; the east liquid m system is filled with the anti-bowling liquid in the room of the crying 82. The temperature in the middle of the process is repeated, and the temperature of the crying is 82. The temperature is cooled to the freezing point. Temperature: in the container 2 ==: ^^_- under 112, and on the (four) support axis m to fix the snail: 疋 turn 3 axis m system extended outside the container 82 Rotating sleeves. Spiral blade (1), with; " near ° = controversy for the outer wall of the inner wall of the 312XP / invention manual (supplement) / 94-12/94130083 25 1296131 week blade. So, using the motor Π 6, the rotation support shaft 112 is rotated, and the outer circumference of the blade Π4 is rotated while being close to the inner peripheral wall surface of the container 8 2. In the ice making/liquid supply portion 80, the pure water supply pipe 98 is pure. The water supply is supplied to the immersion tank 90, and the pure water is stored in the modulating tank 90. Further, the switch is controlled by the opening of the carbon dioxide gas supply pipe 1 〇 2 = 4' via the carbon dioxide gas supply pipe 1 2, the carbon dioxide gas supplied in the three pairs of the modulation tank 90 is supplied to the inside of the modulating tank 9 ,, and is blown from the carbon dioxide gas, the outlet of the front end, and sprayed in the pure water in the modulating tank 9 而 to be foamed. The carbon dioxide aqueous solution in which carbon dioxide is dissolved in pure water is prepared. When the pure water in the brewing tank 90 is cooled and the carbonic acid gas is foamed in the low-temperature pure water, more carbon dioxide can be dissolved in the pure The resistance of the aqueous solution of carbon dioxide can be further reduced in water. The aqueous solution of carbon dioxide prepared in the brewing tank 90 is supplied to the supply port 84 of the vessel 82 by the pumping valve 92 and the second valve 88. If the aqueous solution of the dioxin is poured into the vessel 82 through the supply port 84, the carbon dioxide is dissolved. The "middle knives will be cooled by the inner wall of the Valley Pirate 82 and will freeze. The ice crystals that have been deposited and grown on the inner wall of the containment 82 will be taken by the outer blade of the spiral blade 114. (4) From the container 82 The ice crystals obtained by the inner peripheral wall surface are diffused in the treatment liquid, and are prepared to dissolve the ice mud by dissolving the carbon dioxide gas in the dioxide furnace. When the carbon dioxide gas dissolved ice mud prepared by the ice making/liquid supply unit 80 shown in FIG. 6 is supplied to the nozzle 12 and supplied to the main surface of the substrate w which is conveyed in the horizontal direction by the drum conveyor in the horizontal direction, As described above, in the base 312XP / invention manual (supplement) / 94-12/94130083 26 1296131, the surface of the surface w, such as particles and other pollutants, will be dissolved with the carbon dioxide gas and its melt water It flows out from the main surface of the substrate W and is removed. In addition, since the carbon dioxide dissolved ice mud system is obtained by cooling the carbon dioxide aqueous solution, the ice particles dissolved in the ice mud are softer and softer, and the swing speed of the flat brush 14 can be further improved (when replacing the flat brush 14 In the case of a roller brush, the rotation speed is increased, and the washing performance by the flat brush 14 is further improved. Further, it is intended to dissolve carbon dioxide in the dissolved carbon dioxide of the carbonic acid gas, and thus the resistivity of the carbonic acid-dissolved ice mud is small. Therefore, when the carbonic acid gas dissolves the ice mud flowing through the pipe 16 and is sent to the nozzle 12, static electricity is less likely to occur. When the carbonic acid gas dissolves the ice mud supply ... the main surface of the substrate W, the fine pattern on the substrate w and the device are not static electricity. And suffered from the fear of destruction. Moreover, since the carbonic acid gas dissolves the ice mud to a low temperature, the carbon oxide can maintain a long-lasting dissolved state in the liquid. In addition, as long as the above-mentioned "in this apparatus" is applied to the main surface of the substrate w from the nozzle 12 without applying pressure to the carbonic acid-dissolved ice mud, even if the carbonic acid-dissolved ice mud is pressurized, Further, the nozzle 12 is sprayed out of the main surface of the substrate w. Since the carbon dioxide gas dissolves the ice mud to cool the carbon dioxide aqueous solution, the ice micro-pull in the dissolved carbon dioxide is soft. Therefore, there is no fear that the ice crystal particles in the carbonated deionized sludge are ejected from the main surface of the substrate w, for example, the liquid crystal pattern is partially damaged by the metal film. The ice making/liquid supply unit 80 of the Γ Γ structure is easy to manufacture because it is provided with the carbonation gas supply pipe 1 〇 2, so the purpose is not practical, and the ice is made. / liquid supply unit 80 312Xp / invention manual (supplement) / 94-12 / 94130083

The configuration of V 1296131 is not limited to that shown in FIG. 6. For example, the carbon dioxide gas may be dissolved in the ice making portion to dissolve the ice mud, and the dissolved carbon dioxide dissolved in the ice mud may be stored in the buffer tank, and the carbonic acid dissolved ice mud is statically stirred in the buffer tank while buffering. A carbon dioxide gas dissolved sludge is delivered to the nozzle 12 by a pump in the tank. Further, instead of providing the brewing tank 9〇, the carbon dioxide gas supply supplier 102 is directly connected to and connected to the container 82, and carbon dioxide gas is supplied into the container 82 by injecting carbonic acid gas into the pure water in the container 82. By foaming, carbon dioxide gas can be dissolved in the container 82 to dissolve the ice mud. At this time, since the pure water in Guyi 82 will be cooled to a low temperature state, more carbon dioxide will be dissolved in the pure water. Moreover, the means for dissolving carbon dioxide in pure water and preparing an aqueous solution of carbon dioxide is not limited to the structure in which carbonic acid gas is foamed in pure water as described in the above-mentioned conventional cancer, and may be connected to a flow path, for example. In the middle of the pure water supply pipe of the ice part, a gas dissolving module is interposed, and the gas dissolving module is connected to the carbonic acid gas supply pipe (the flow path is connected to the carbonic acid gas supply source), and the gas is dissolved through the gas decomposing module. Carbon dioxide is dissolved in the pure water inside. Further, the gas dissolving module may be interposed in the middle of the pipe 16 connecting the ice making portion and the flow path of the nozzle 12, in which case, since carbon dioxide is dissolved in the low temperature ice mud prepared by the container 82$, Thus more carbon dioxide can be dissolved in the ice mud. The above-mentioned "mouth" nozzle 12 is disposed to be transported to the substrate. The parent is inclined along the substrate W, but the nozzle may be disposed at a position directly above the upper end edge of the inclined substrate and in the state in which the slab is conveyed. In addition, in the above-mentioned embodiment, the "side" 312 ΧΡ / invention manual (supplement) / 94-12 / 94130083 28 1296131 Γ 2 = posture main force is selected and transported in the horizontal direction, - from the mouth to the base, The main surface is supplied with ice mud' and the flat brush 14 is used on the substrate main

The ice mud is mixed on the surface, and when the substrate W is used, the substrate 1 is horizontally supported, and the surface of the substrate is supplied with ice mud, and the substrate W is tilted by using the plane ^4 ==::: Washing is carried out. Further, the mud may be replaced with a flat brush 14 instead of y. Fig. 7 is a schematic front view showing an essential part of a substrate (rotary washer) according to another embodiment of the present invention. The substrate rotary cleaning device is provided with a motor (not shown) that supports the substrate chucks 120 〇 # 转 转 转 转 转 转 122 122 122 122 122 122 122 122 ( ( ( ( ( ( ( ( ( ( ( ( Is the winding straight down slightly slightly illustrated, but is the substrate held by the rotating collet (10)? The surrounding transfer f is formed to surround the substrate captured by the ice mud on the substrate W and surround the substrate w. In addition, the rotating chuck 12 is held: the hydrogen peroxide-containing ice mud is disposed to be ejected to the surface of the substrate W by two degrees 124. The hemorrhoids 124 are connected to the ice-water supply pipe 126, although Not shown, the pipe 126 is connected to the ice making/liquid supply unit by a flow path. The structure of the part is, for example, prepared in the ice making unit to prepare a peroxide containing hydrogen peroxide to be stored in the buffer tank w. Nitrogen peroxide-containing ice mud is used for static separation (4). In the buffer tank, the pump is placed in the middle of the pipe 126, and the pump containing hydrogen peroxide is added from the buffer tank to the 312XP/invention manual. ()) /94-12/94130083 29 1296131 After the pressure, it is sent to the discharge nozzle 124.

In the apparatus shown in Fig., the hydrogen peroxide containing ice water is pressurized, and is ejected from the discharge nozzle 124 toward the surface of the substrate w held and rotated by the rotary chuck 120. Thereby, the contaminant such as fine particles existing in the concave portion or the like on the surface of the substrate W is scraped off by the ice particles, and is discharged from the surface of the substrate w together with the hydrous containing hydrogen peroxide. In this case, the ice particles contained in the hydrogen peroxide-containing ice slurry discharged from the ejection nozzle} toward the surface of the substrate W are softer than the ice obtained by cooling only the pure water because of the hydrogen peroxide. particle. Therefore, on the surface of the substrate W, even if the energy of the ice particles contained in the hydrogen peroxide-containing ice sprayed from the discharge nozzle i 24 collides with the surface of the substrate W, the energy is somewhat uneven, and the pattern formed on the surface of the substrate W can be prevented. The metal film or the like is partially damaged. Further, by containing hydrogen peroxide in the ice granule containing the cerium peroxide-containing ice sprayed on the surface of the substrate w, the organic matter on the substrate w can be decomposed and deoxidized by the oxidation of the cerium peroxide. Xu. Further, in the substrate rotary cleaning apparatus shown in FIG. 7, instead of the hydrogen peroxide containing ice, the carbonic acid-dissolved ice mud may be transferred to the discharge nozzle 124 via a pipe, and the rotary chuck may be used. The surface of the substrate W held and rotated by 120 is sprayed with a carbon dioxide gas from the discharge nozzle 124 to dissolve the ice mud. In this case, as described above, contaminants such as fine particles existing in the concave portion of the surface of the substrate W are discharged and removed from the surface of the substrate W together with the dissolved carbon dioxide. Further, the carbonic acid gas discharged from the discharge nozzle 124 toward the surface of the substrate W dissolves the ice mud, and since the carbon dioxide aqueous solution is cooled, the ice particles in the dissolved carbon dioxide are softer than the pure water alone. Made of ice particles. Therefore, on the surface of the substrate W, that is, 30 312XP / invention manual (supplement) / 94 · 12 / 94130083 1296131 from the spray nozzle particles, the age of the gas lifted 124 of the carbon dioxide gas dissolved in the ice mud micro-

The inner ’ is sent to the squirting 嗤 π are all 1 94 α^ .

The state of destruction. In addition to the above-described embodiments, the substrate treatment can be applied to the substrate, and the substrate treatment other than the cleaning can be applied. For example, when the apparatus constructed in FIGS. 1 to 3 is used in the water washing portion of the substrate etching processing apparatus, the etching liquid and the ice mud are mixed by the flat brush 14, thereby promoting the use of pure water for the high viscosity etching liquid. By performing the dilution treatment and lowering the substrate and the etching solution by supplying the ice slurry to the substrate, the etching reaction can be quickly stopped, and the etching liquid replacement efficiency by the pure water can be improved. Further, the type of the treatment liquid is not limited to pure water, and may be a chemical liquid. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a perspective view of an essential part of a schematic configuration of a substrate cleaning apparatus according to an embodiment of the present invention. Fig. 2 is a front elevational view showing an essential part of the substrate cleaning apparatus shown in Fig. 1. Fig. 3 is a side elevational view of an essential part of the substrate cleaning apparatus shown in Fig. 1. Fig. 4 is a schematic cross-sectional view showing the structure of an ice making/sending 312XP/invention specification (supplement)/9^12/94130083 31 1296131 which is one of the constituent elements of the substrate cleaning apparatus shown in Fig. 1. The structure of the liquid supply unit: a two-U section I; a schematic cross-sectional view of a structure example in which the liquid 2f of the phantom treatment liquid is water, and the ice particles (the structure of which is dissolved in the clothing ice/throttle portion) The present invention is a schematic front view of a structure of a substrate rotary cleaning device according to another embodiment of the present invention. 10 12 14 16 , 126 18 20 , 40 , 80 22 , 42 , 82 ^ 24 26 , 46 , 86 28 30 , 70 , 108 32 , 72 , 110 34 , 74 , 112 36 , 76 , 1 14 38 , 78 , 1 16 44 ΓMain component symbol description】Transfer Xingkun nozzle flat brush pipe brushing ice making/liquid supply container pure water supply port ice mud discharge pure water supply pipe antifreeze chiller (cooling skirt) > 122 rotation Spiral blade motor hydrogen peroxide water supply 〇312ΧΡ/Invention manual (supplement)/94-12/94130083 32 1296131 48 Hydrogen peroxide water supply piping 50, 90 Mixing tank 52, 92 Pump 54, 94 Filter 56 > 96 > 100 On-off valve 58, 98 Pure water supply pipe 60 Perhydric oxide supply pipe 62, 66, 104 Switch control valve 64, 68, 106 Flow regulating valve 84 Carbon dioxide aqueous solution supply port 88 Carbon dioxide aqueous solution supply pipe 102 Carbonic acid Gas supply pipe 120 * Rotating chuck 124 Spraying nozzle W Substrate 33 312XP / Invention manual (supplement) / 94-12/94130083

Claims (1)

1296131 ~ 0CT 1 9 2007 Replace this bee \ 丨 修 修 正 替换 替换 替换 替换 替换 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 The substrate is supplied to the main surface of the substrate and is characterized by: a ' /, touch: ΐ: Γ Γ processing liquid is supplied to the main surface of the substrate, and the mixing member is connected, and the ice is mixed on the main surface of the substrate The treatment liquid of the granules.丨2. If you apply for the special (4) 丨 之 之 之 之 基板 基板 基板 = = = = = = = = = = = = = = = = 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板The treatment liquid containing ice particles supplied to the main surface of the substrate is inclined to flow along the substrate, and the treatment liquid containing ice particles is mixed on the main surface of the substrate by using the above-mentioned mixing member. 3. The substrate processing method of claim 1, wherein the upper flat brush is configured to reciprocate the planar brush along the main surface of the substrate toward the substrate in the direction of the parent fork and across the total width of the substrate. . And a substrate processing method 'supporting the substrate and moving in the horizontal direction' and supplying the processing liquid to the main surface of the substrate to perform processing on the substrate; characterized in that: ice particles containing hydrogen peroxide are contained The treatment liquid is supplied to the main surface of the substrate, and the sub-fourth member contacts or approaches the substrate main ©, and moves on the main surface of the substrate—(4) a treatment liquid containing ice particles containing hydrogen peroxide. 5. A substrate processing method, which supports the (four) substrate and is moved in a horizontal direction, and supplies the processing liquid to the main surface of the substrate and is characterized by: 〃 326\total gun\94\94130083\94130083 (replacement). 3 34 1296131 'Mrr_&quot;ll,lll&quot;,l&quot;&quot;'r&quot;·ΙΒ—r ww„|, one, ^日修漫) is replacing the page: containing dissolved ice carbon dioxide and containing ice micro-plate ^ to disturb A substrate processing method in which the member is in contact with or close to the main surface of the substrate, and the substrate is treated with a method of dissolving carbon dioxide and containing ice particles on the main surface of the substrate. 7. The substrate processing apparatus includes: a substrate transfer means that supports the substrate (four) in the horizontal direction; and a liquid supply means that uses the substrate transfer means The main surface of the substrate to be transported is supplied with a processing liquid; and the processing liquid supply means is that the processing liquid for supplying the ice particles is supplied to the base surface to be improved to have contact or close to the main surface of the substrate, and to move on the main side of the substrate. Will contain The processing liquid of the microparticles is subjected to a turbulent mixing and arranging member. The substrate processing apparatus of claim 7 wherein the above-mentioned j = ί segment supports the substrate in an inclined posture, and the substrate is tilted toward the substrate °The conveyance is carried out in the direction of the horizontal direction and in the horizontal direction, and the ice-containing fine particle treatment liquid supplied to the main surface of the substrate flows downward along the substrate by the above-mentioned treatment liquid hand & 9 · ★ The substrate of the seventh item of the patent scope In the processing apparatus, the agitating member is a planar brush, and the planar brush is disposed in the substrate transporting direction, and a moving means is provided in front of the processing liquid supply position by the processing liquid supply means, and the moving means is provided. The flat brush is moved along the main surface of the substrate in a direction crossing the substrate transport direction, across the total width of the substrate, to the 326V total file, \94\94130083\94130083 (replacement)-3 35 1296131, back to the mobile, and the repair (3⁄4 positive replacement page) , 鲁理: r:: the substrate processing device of the seventh paragraph of the patent dry circumference, in the basin, the above-mentioned treatment liquid supply means is provided with a top-bottom sneeze and a system for causing the ice-containing particle treatment liquid to flow out The slit-like effluent spray = ice/liquid transport means 'modulates the ice-containing fine particle treatment liquid, and is sent to the above:: · The substrate processing apparatus of claim 10 of the patent application scope describes the ice/liquid supply means provided with: /, The upper middle mouth container has a cylindrical inner peripheral wall surface, and is provided with a supply port and a discharge cooling means for cooling the wall surface of the container; the different, # is scraped on the inner peripheral wall surface of the container Precipitating the growing ice and twin crystals and diffusing them into pure water; supplying the above-mentioned pure water supply means by supplying pure water through the supply port; and b owing it to the container The ice-containing pure water discharged from the discharge port is supplied to the nozzle. 12. A substrate processing apparatus comprising: a substrate transfer means for transporting a substrate in a horizontal direction, and a processing liquid supply means for a substrate main body transported by the substrate transfer means The surface is supplied with a treatment liquid; characterized in that the treatment liquid supply means is 326\|the affected file containing the hydrogen peroxide-containing ice particles\94\94130083\94130083 (replacement)-3 36月日日修(忧) The replacement page 1296131 is supplied to the main surface of the substrate, and is further provided with a mixing member which is in contact with or close to the base _i on the main surface of the substrate while stirring the treatment liquid containing the ice particles containing cerium oxide. • The substrate processing device of the 12th patent scope of the patent, in which the upper 3 lyolysis method is provided with a treatment liquid modulating means, which is to cool the predetermined bismuth: ruthenium peroxide, and the preparation contains Hydrogen oxide ice micro-drawing treatment solution. The substrate processing apparatus according to claim 13, wherein the upper processing liquid preparation means is provided with a hydrogen peroxide water mixing means, which mixes the t-emulsified hydrogen and the pure water according to a predetermined ratio. The above-mentioned predetermined degree of hydrogen peroxide water. A substrate processing apparatus is provided with the following means: substrate transfer: 3⁄4 means 'supporting the substrate and transporting it in a horizontal direction; and processing liquid supply means for transporting by the substrate transfer means a processing liquid is supplied to the main surface of the substrate; wherein the processing liquid supply means supplies the processing liquid containing ice particles dissolved in carbon dioxide to the main surface of the substrate, and further comprises a disturbing member which is in contact with or close to the substrate main On the surface of the substrate, the treatment liquid containing the ice particles dissolved in the dissolved carbon dioxide was stirred while moving. The substrate processing apparatus according to the fifteenth aspect of the invention, wherein the processing liquid supply means is provided with a treatment liquid containing a solution of dissolved carbon dioxide in the treatment liquid to be cooled by the dissolved carbon dioxide aqueous solution == dissolved carbon dioxide and containing ice particles. </ br> </ br> </ br> </ br> The carbon dioxide solution is prepared by dissolving carbon dioxide in pure water. The substrate processing apparatus according to any one of claims 7 to 17, wherein the processing of the substrate is a washing treatment. 326 fiber file \94\94130083\94130083 (replacement)·3 38 1296131 VII. Designated representative figure (1) The representative representative of the case is: (1). (2) The symbol of the symbol of this representative figure is simple: 12 nozzle 14 flat brush 16 piping 18 bristles W substrate VIII. If there is a chemical formula in this case, please reveal the chemical formula that best shows the characteristics of the invention: 312XP/Invention Manual (supplement)/94-12/94130083