JPH0394427A - Cleaning of surface of solid - Google Patents
Cleaning of surface of solidInfo
- Publication number
- JPH0394427A JPH0394427A JP23221589A JP23221589A JPH0394427A JP H0394427 A JPH0394427 A JP H0394427A JP 23221589 A JP23221589 A JP 23221589A JP 23221589 A JP23221589 A JP 23221589A JP H0394427 A JPH0394427 A JP H0394427A
- Authority
- JP
- Japan
- Prior art keywords
- fine ice
- ice particles
- ultrapure water
- gas
- sprayed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000007787 solid Substances 0.000 title claims abstract description 15
- 238000004140 cleaning Methods 0.000 title claims description 17
- 239000007789 gas Substances 0.000 claims abstract description 22
- 239000002245 particle Substances 0.000 claims abstract description 16
- 229910021642 ultra pure water Inorganic materials 0.000 claims abstract description 13
- 239000012498 ultrapure water Substances 0.000 claims abstract description 13
- 239000007788 liquid Substances 0.000 claims abstract description 11
- 238000000034 method Methods 0.000 claims abstract description 9
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims abstract description 8
- 235000014593 oils and fats Nutrition 0.000 claims abstract description 7
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims abstract description 6
- 239000000975 dye Substances 0.000 claims abstract description 3
- 239000000049 pigment Substances 0.000 claims abstract description 3
- 239000002904 solvent Substances 0.000 abstract description 12
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract description 7
- 239000007921 spray Substances 0.000 abstract description 7
- 238000003912 environmental pollution Methods 0.000 abstract description 3
- 229910052757 nitrogen Inorganic materials 0.000 abstract description 3
- 238000004519 manufacturing process Methods 0.000 abstract description 2
- 239000000203 mixture Substances 0.000 abstract description 2
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical compound ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 abstract 1
- 238000004506 ultrasonic cleaning Methods 0.000 description 8
- 238000009835 boiling Methods 0.000 description 7
- 238000004821 distillation Methods 0.000 description 4
- 239000003921 oil Substances 0.000 description 4
- 238000000926 separation method Methods 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 239000003925 fat Substances 0.000 description 3
- 238000002347 injection Methods 0.000 description 3
- 239000007924 injection Substances 0.000 description 3
- 238000001816 cooling Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011859 microparticle Substances 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 230000003116 impacting effect Effects 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Landscapes
- Cleaning In General (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は、シリコン基板など、固体表面上の油脂・顔
料・染料等を除去するための固体表面の洗浄方法に関す
るものである．
〔従来の技術〕
第２図を参照して従来の固体表面の洗浄方法を説明する
．図において、蒸留槽（１）にヒーター（２）が付設さ
れている。蒸留槽（１）に槽上部で接続された煮沸洗浄
槽（３）にはヒーター（４）が付設されている．煮沸洗
浄槽（３）に槽上部で接続された超音波洗浄槽（５）に
は超音波発信源（６）が付設されている．超音波洗浄槽
（５）には水分離槽（ア）が槽上部で接続されている。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a method for cleaning a solid surface, such as a silicon substrate, for removing oils, pigments, dyes, etc. from the solid surface. [Prior Art] A conventional solid surface cleaning method will be explained with reference to Figure 2. In the figure, a heater (2) is attached to a distillation tank (1). A heater (4) is attached to the boiling and cleaning tank (3) connected to the distillation tank (1) at the top of the tank. The ultrasonic cleaning tank (5) connected to the boiling cleaning tank (3) at the top of the tank is equipped with an ultrasonic source (6). A water separation tank (A) is connected to the ultrasonic cleaning tank (5) at the top of the tank.
さらに、煮沸洗浄槽（３）、超音波洗浄槽（５）、水分
離槽（７）の上部空間には冷却ジャケット（８〉が設置
されている．次に方法について説明する。油脂等の付着
した固体表面洗浄物をトリクレン等の溶剤の入った煮沸
洗浄槽（３〉に浸し、脱脂を行う。次に被洗浄物を超音
波洗浄槽（５〉に浸し、超音波発信源（６〉より超音波
を発振、洗浄を行うことにより、脱脂をさらに精密に行
う。さらに、洗浄を行った結果、溶剤中に油脂等の汚物
が移動し、洗浄効果を減退させるため、これを精製する
必要がある．そのために、超音波洗浄槽（５）の溶剤の
一部が煮沸洗浄槽（３）へ、煮沸洗浄槽（３〉の溶剤の
一部が蒸留槽（１〉へそれぞれ流れるようにしてある．
蒸留槽（１）ではヒーター（２）による加熱が行われ、
溶剤は蒸発していく。蒸気化した溶剤ガスは冷却ジャケ
ット（８）内を通過しつつ冷却され、液化して水分離槽
（７）に蒸留精製された溶剤が戻される。水分離槽（７
）内の溶剤の一部は超音波洗浄槽（５）に戻されるため
、結局、超音波洗浄槽（５〉内の溶剤が精製されたこと
になる。Furthermore, a cooling jacket (8) is installed in the upper space of the boiling cleaning tank (3), ultrasonic cleaning tank (5), and water separation tank (7).The method will be explained next. The solid surface to be cleaned is immersed in a boiling cleaning tank (3) containing a solvent such as Triclean to degrease it.Then, the object to be cleaned is immersed in an ultrasonic cleaning tank (5>) and heated from an ultrasonic source (6). Degreasing is performed more precisely by oscillating ultrasonic waves and cleaning.Furthermore, as a result of cleaning, dirt such as oil and fat moves into the solvent and reduces the cleaning effect, so it is necessary to purify it. Therefore, part of the solvent in the ultrasonic cleaning tank (5) flows to the boiling cleaning tank (3), and part of the solvent in the boiling cleaning tank (3) flows to the distillation tank (1). ．．
The distillation tank (1) is heated by a heater (2),
The solvent evaporates. The vaporized solvent gas is cooled while passing through the cooling jacket (8), and the liquefied and distilled solvent is returned to the water separation tank (7). Water separation tank (7
A part of the solvent in the ultrasonic cleaning tank (5) is returned to the ultrasonic cleaning tank (5), so the solvent in the ultrasonic cleaning tank (5>) is purified.
以上のような従来の固体表面の洗浄方法は、トリクレン
等の溶剤を常温もしくは煮沸して用いてき起こす可能性
があった．
この発明は上記のような問題点を解決するためになされ
たもので、環境汚染を招く恐れのあるトリクレン等の溶
剤を使用せず、固体表面に付着した油脂を洗浄・除去す
ることができる固体表面の洗浄方法を得ることを目的と
する。The conventional methods of cleaning solid surfaces as described above use solvents such as trichlene at room temperature or boiling, which may cause problems. This invention was made in order to solve the above-mentioned problems, and it is a solid that can clean and remove fats and oils attached to the solid surface without using solvents such as trichloride, which may cause environmental pollution. The purpose is to obtain a method for cleaning surfaces.
この発明に係る固体表面の洗浄方法は、超純水または超
純水を主成分としてオゾンガスや過酸化水素等を溶解、
ｉｌｌ製した氷の微粒子を被洗浄物に噴射、衝突−５１
ｚ、表面に付着した油脂等を洗浄・除去するものである
。The method of cleaning a solid surface according to the present invention involves dissolving ozone gas, hydrogen peroxide, etc. in ultrapure water or ultrapure water as a main component.
Spraying ice particles made by illumination onto the object to be cleaned, impacting -51
z. It is used to clean and remove oils and fats etc. that have adhered to the surface.
この発明においては、被洗浄物表面に０．１１ｍ〜５Ｉ
ＩＩ６の粒径の氷の粒子を衝突させて、物理的作用によ
り油脂等を除去する。In this invention, the surface of the object to be cleaned is 0.11 m to 5 I
Ice particles with a particle size of II6 are collided with each other to remove fats and oils by physical action.
第１図はこの発明の一実施倒を説明するための装置を示
し、図において、微粒水生戒容器（９）の容器内は断熱
されている，この微粒水生威容器（９〉の上部にはスプ
レーノズル（１０）が設置され、液源（１１）がスプレ
ーノズル（１０）に接続され、超純水、または超純水を
主戒分としてオゾンガス、過酸化水素などを溶解させた
ものを供給する．また、スプレーノズル（１０）に窒素
ガス等の媒体ガスを供給するガスボンベ（１２〉が接続
されている．微粒氷精製容器（９）に接続された噴射ノ
ズル（１３）にも媒体ガスを供給するためにガスボンベ
（１２）が接続されている．
次に方法について説明する．微粒氷生成容器〈９〉は液
体窒素等で低温冷却されているが、この容器（９）内に
液源（１ｌ）から供給される超純水または超純水にオゾ
ンガスなどを溶解した液とガスボンベ（１２〉から供給
される媒体ガスの混合物をスプレーノズル（１０）から
噴霧すると、容器内が低温なため液滴は氷化し、微粒氷
（１４〉が生戒する。この微粒氷（１４〉は容器（９）
内の別の出口（９ａ）より取り出され、ガスボンベ（１
２）から供給される媒体ガスと混合、この媒体ガスのガ
ス圧により噴射ノズル（１３）から噴射される。このと
き、噴射された微粒氷（１４）を被洗浄物（１５）に衝
突させると、微粒氷（１４〉のもつ衝撃力により油脂等
が被洗浄物（１５）の・表面より剥離する。FIG. 1 shows a device for explaining one embodiment of the present invention. In the figure, the inside of the micro-particle aquatic protection container (9) is insulated, and the upper part of this micro-particle aquatic protection container (9) is A spray nozzle (10) is installed, a liquid source (11) is connected to the spray nozzle (10), and supplies ultrapure water or ultrapure water with ozone gas, hydrogen peroxide, etc. dissolved therein. In addition, a gas cylinder (12>) that supplies a medium gas such as nitrogen gas is connected to the spray nozzle (10).A medium gas is also supplied to the injection nozzle (13) connected to the fine ice purification container (9). A gas cylinder (12) is connected to supply the ice.Next, the method will be explained.The fine ice generation container (9) is cooled at low temperature with liquid nitrogen, etc. When ultrapure water or a mixture of ozone gas etc. dissolved in ultrapure water supplied from a gas cylinder (12) is sprayed from a spray nozzle (10), the liquid will drop because the temperature inside the container is low. The drops turn into ice and form fine ice (14).This fine ice (14) is in the container (9).
The gas cylinder (1
2), and is injected from the injection nozzle (13) by the gas pressure of this medium gas. At this time, when the jetted ice particles (14) collide with the object to be cleaned (15), the impact force of the ice particles (14) causes oils and fats to be peeled off from the surface of the object to be cleaned (15).
ここで、微粒氷（１４）の粒径は、０．ＩＩＩＩＩ〜５
ｌの範囲で適宜に選ぶものとする。また、微粒氷（１４
）の温度は、液体窒素温度（−１９６℃）からＯ℃の範
囲で適宜に選ぶものとする．
なお、微粒氷（１４〉に有機溶剤を含ませることも考え
られる。Here, the particle size of the fine ice (14) is 0. III-5
It shall be selected appropriately within the range of l. In addition, fine ice (14
) shall be appropriately selected within the range of liquid nitrogen temperature (-196°C) to 0°C. It is also possible to include an organic solvent in the fine ice (14).
以上のように，この発明によれば、超純水等の微粒氷を
用いて油脂等の洗浄・除去を行うので、トリクレン等に
よる環境汚染を引き起こすことのない無害で安全な油脂
等の洗浄・除去ができる。As described above, according to the present invention, oils and fats, etc. are cleaned and removed using ultrapure water and other fine ice particles, so oils and fats, etc. are cleaned and removed in a harmless and safe manner that does not cause environmental pollution due to trichlene or the like. Can be removed.
第１図はこの発明の一実施例を説明するための装置の概
略立断面図、第２図は従来の固体表面の洗浄方法を説明
するための装置の概略立断面図である。
（９）・・微粒氷精製容器、（１ｏ）・・スプレーノズ
ル、（１１）・・液源、（ｌ２）・・ガスボンベ、（１
３〉・・噴射ノズル、（１４）・・微粒氷、（１５）・
・被洗浄物．
なお、各図中、同一符号は同一又は相当部分を示す６FIG. 1 is a schematic vertical sectional view of an apparatus for explaining an embodiment of the present invention, and FIG. 2 is a schematic vertical sectional view of an apparatus for explaining a conventional solid surface cleaning method. (9)...Fine ice purification container, (1o)...Spray nozzle, (11)...Liquid source, (l2)...Gas cylinder, (1
3>...Injection nozzle, (14)...Fine ice, (15)...
・Object to be cleaned. In each figure, the same reference numerals indicate the same or equivalent parts6.
Claims (1)
てオゾンガスや過酸化水素等を溶解させた液の微粒氷の
いずれかを噴射、衝突させ、前記固体表面に付着してい
る油脂・顔料・染料等を洗浄除去する固体表面の洗浄方
法。Either fine ice particles of ultrapure water or fine ice particles of a liquid containing ultrapure water as a main component and dissolved ozone gas, hydrogen peroxide, etc. are injected and collided with the solid surface, and the oils and fats adhering to the solid surface are removed.・A method for cleaning solid surfaces to remove pigments, dyes, etc.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23221589A JPH0394427A (en) | 1989-09-06 | 1989-09-06 | Cleaning of surface of solid |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23221589A JPH0394427A (en) | 1989-09-06 | 1989-09-06 | Cleaning of surface of solid |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0394427A true JPH0394427A (en) | 1991-04-19 |
Family
ID=16935789
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP23221589A Pending JPH0394427A (en) | 1989-09-06 | 1989-09-06 | Cleaning of surface of solid |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0394427A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006303143A (en) * | 2005-04-20 | 2006-11-02 | Seiko Epson Corp | Apparatus and method for cleaning substrate |
| KR100699787B1 (en) * | 2004-09-13 | 2007-03-27 | 다이니폰 스크린 세이조우 가부시키가이샤 | Method and apparatus for treating substrate |
| JP2016064943A (en) * | 2014-09-24 | 2016-04-28 | 株式会社Ihi | Ozone generating method using ozone hydrates and apparatus therefor |
| JP2016064944A (en) * | 2014-09-24 | 2016-04-28 | 株式会社Ihi | Ozone treatment method using ozone hydrates and apparatus therefor |
| CN113169062A (en) * | 2018-11-30 | 2021-07-23 | 东京毅力科创株式会社 | Substrate cleaning method, processing container cleaning method, and substrate processing apparatus |
-
1989
- 1989-09-06 JP JP23221589A patent/JPH0394427A/en active Pending
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100699787B1 (en) * | 2004-09-13 | 2007-03-27 | 다이니폰 스크린 세이조우 가부시키가이샤 | Method and apparatus for treating substrate |
| JP2006303143A (en) * | 2005-04-20 | 2006-11-02 | Seiko Epson Corp | Apparatus and method for cleaning substrate |
| JP4507967B2 (en) * | 2005-04-20 | 2010-07-21 | セイコーエプソン株式会社 | Substrate cleaning device |
| JP2016064943A (en) * | 2014-09-24 | 2016-04-28 | 株式会社Ihi | Ozone generating method using ozone hydrates and apparatus therefor |
| JP2016064944A (en) * | 2014-09-24 | 2016-04-28 | 株式会社Ihi | Ozone treatment method using ozone hydrates and apparatus therefor |
| CN113169062A (en) * | 2018-11-30 | 2021-07-23 | 东京毅力科创株式会社 | Substrate cleaning method, processing container cleaning method, and substrate processing apparatus |
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