JP2785923B2 - Work cleaning device - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to, for example, electric parts,
The present invention relates to a work cleaning apparatus used for cleaning a work such as an electronic component and a pressed component.

[0002]

2. Description of the Related Art Conventionally, as a method of cleaning a work as described above, for example, an entire work is immersed in a cleaning liquid containing a chlorine-based solvent as a main component and stored in an ultrasonic cleaning tank. There is a cleaning method in which foreign substances such as cutting chips and oil adhering to the work surface are removed by cavitation of a cleaning liquid by a vibrator.

However, when a workpiece is cleaned with a cleaning solution containing a chlorine-based solvent as a main component as described above, the chlorine-based solvent is not only harmful to the human body and the environment, but also easily dissolves the resin material. It is not suitable for cleaning resin products such as substrates. In addition, at the time of cleaning, impurities such as cutting chips and oils separated from the work are mixed into the cleaning liquid. Therefore, as the number of times of cleaning increases, the amount of impurities mixed into the cleaning liquid increases, and the cleaning power by the cleaning liquid is short. It falls with. In addition, when a work having a small heat capacity is cleaned, dew condensation occurs when the work is dried, and traces of dust and dirt are left on the condensed portion, thereby deteriorating the cleaning effect. ing.

[0004]

SUMMARY OF THE INVENTION According to the present invention, a work is washed with a primary washing liquid containing a hydrocarbon solvent as a main component, and then the work is washed with a secondary washing liquid containing an inert solvent as a main component, which is regenerated by distillation. By performing the cleaning process, it is possible to easily perform a cleaning process without residues that requires advanced technology, and it is possible to clean the entire work reliably and neatly.
By separating the primary cleaning liquid from the primary cleaning liquid containing the secondary cleaning liquid separated into the upper layer by specific gravity separation, distilling and regenerating only the secondary cleaning liquid and returning to the cleaning step, the recovery efficiency of the secondary cleaning liquid is improved. It is possible to improve the reusability, and furthermore, the primary cleaning liquid floated by the work cleaning on the surface of the work cleaning means in which the secondary cleaning liquid containing an inert solvent as a main component is stored is used as the secondary cleaning liquid. By overflowing the specific gravity separation means by the liquid surface discharge, the purity of the secondary cleaning liquid stored in the work cleaning means can be maintained at a constant high purity, and the work cleaning apparatus can maintain high cleaning efficiency for a long time. For the purpose of providing.

[0005]

SUMMARY OF THE INVENTION The present invention relates to a workpiece cleaning apparatus for cleaning a workpiece cleaned by a primary cleaning liquid mainly containing a hydrocarbon solvent with a secondary cleaning liquid mainly containing an inert solvent. there are, to form a vapor region of vaporized by secondary washing solution at the top, a workpiece cleaning means (5) for cleaning processing by the secondary cleaning liquid washed treated workpiece by the primary cleaning liquid, the workpiece cleaning means and steam Departure
Disposed adjacent to the raw device, the secondary cleaning liquid containing a primary washing solution used in the cleaning process by gravity separation, from the steam generating unit
A vapor generating means for receiving the overflowing secondary cleaning liquid, a specific gravity separating means for specific gravity separating the secondary cleaning liquid used for the above-mentioned cleaning treatment and containing the primary cleaning liquid, A distillation / regeneration means for separating the primary cleaning liquid from the cleaning liquid and distilling / regenerating only the secondary cleaning liquid and returning it to the vapor generating means; and a primary cleaning liquid floating on the liquid surface of the work cleaning means as a secondary cleaning liquid The apparatus is characterized in that it is a work cleaning apparatus provided with a liquid level cleaning means for causing the specific gravity separation means to overflow by surface discharge.

[0006]

According to the present invention, after the work is cleaned with the primary cleaning liquid containing a hydrocarbon solvent as a main component, the work is washed with a secondary cleaning liquid containing an inert solvent (for example, hydrofluorocarbon) as a main component by the work cleaning means. The work is cleaned. At this time, the primary cleaning liquid adhering to the work is separated by the secondary cleaning liquid, and the primary cleaning liquid having a lower specific gravity than the secondary cleaning liquid floats on the liquid surface of the work cleaning means. The secondary cleaning liquid is guided to the specific gravity separation means together with the secondary cleaning liquid by discharging the surface of the secondary cleaning liquid, where the primary cleaning liquid is separated from the primary cleaning liquid containing the secondary cleaning liquid separated into the upper layer by the specific gravity separation. Since only the separated secondary cleaning liquid is distilled and regenerated by the distillation and regenerating means and supplied back to the cleaning step, the workpiece can be cleaned efficiently. Further, when the work is pulled up from the secondary cleaning liquid of the work cleaning means, the work is dried by the vapor of the secondary cleaning liquid discharged to the upper vapor region and is carried out. Ma
Also, the secondary cleaning liquid supplied to the steam generation means overflows.
The secondary washing liquid is collected by specific gravity separation means.
You.

[0007]

As described above, according to the present invention, an inert solvent (for example, hydrofluorocarbon) that has been distilled and regenerated after cleaning a workpiece with a primary cleaning liquid mainly containing a hydrocarbon solvent is used as a main component. Since the workpiece is cleaned with the secondary cleaning liquid, the residual liquid of the primary cleaning liquid, which was difficult to remove by the conventional method, can be reliably removed and removed, and there is no residue requiring advanced technology. The washing process can be performed simply and easily. In addition, since the work is cleaned with the secondary cleaning liquid having a small amount of impurities regenerated by distillation, the entire work can be reliably and cleanly cleaned, and is optimal for cleaning precision parts such as electronic parts and electric parts.

In addition, since the primary cleaning solution is separated from the primary cleaning solution containing the secondary cleaning solution by being separated into the upper layer by specific gravity separation, only the secondary cleaning solution is distilled and regenerated and returned to the washing step. There is an effect that the recovery efficiency of the cleaning liquid can be enhanced and the reusability of the secondary cleaning liquid can be improved.

In addition, the primary cleaning liquid floats on the liquid surface of the work cleaning means in which the secondary cleaning liquid containing an inert solvent as a main component is stored by washing the work. Since the surface of the next cleaning liquid is positively overflown to the above-mentioned specific gravity separation means, the primary cleaning liquid does not re-adhere to the work, and of course, the purity of the secondary cleaning liquid stored in the work cleaning means is high. Has the effect of maintaining and securing high cleaning efficiency over a long period of time. By using the above-mentioned components in an organically combined manner, it is possible to improve the cleaning efficiency of the workpiece. There is an effect that can be done.

Further, since the workpiece is pulled up from the secondary cleaning liquid and dried in the vapor region above the secondary cleaning liquid, it is possible to prevent the secondary cleaning liquid including the primary cleaning liquid from re-adhering during the drying processing, and to perform the drying processing in the work lifting step. And the processing operation is simplified.

Further, the specific gravity separating means is a work washing means.
And steam generation means,
Separation of the secondary cleaning solution containing the primary cleaning solution
Receives the overflowed secondary cleaning liquid from the steam generator.
The steam generation means
A collection gutter for collecting the secondary cleaning liquid
This eliminates the need for recovery processing means such as storage tanks,
Excess secondary washing liquid from the gas generation means is collected by the specific gravity separation means.
The steam generation means as small as necessary
Thus, compactness can be achieved.

[0012]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS One embodiment of the present invention will be described below in detail with reference to the drawings. The drawing shows a work cleaning apparatus that cleans a printed circuit board with a primary cleaning liquid mainly containing a hydrocarbon solvent and then cleans a printed circuit board as a work with a secondary cleaning liquid mainly containing an inert solvent. 1, a work cleaning apparatus 1 includes a primary cleaning liquid L containing a hydrocarbon-based solvent such as naphthesol (trade name, manufactured by Nippon Petrochemical Co., Ltd.) inside a cleaning chamber 2 that is hermetically sealed. After cleaning and removing the printed circuit board W by, for example, a cleaning tank 3 for cleaning the printed circuit board W with a secondary cleaning liquid F containing an inert solvent such as hydrofluorocarbon, ie, HFC as a main component, and a cleaning process for the printed circuit board W A distillation regeneration tank 4 for distilling and regenerating the used secondary washing liquid F is provided.

The cleaning tank 3 includes an ultrasonic cleaning tank 5 provided under the cleaning tank 3 for immersing the entire printed circuit board W in a secondary cleaning liquid F for ultrasonic cleaning, and a secondary cleaning liquid F (specific gravity of HFC). = 1.58) contained in the primary cleaning liquid L (specific gravity of HC =
0.815), and a steam generating tank 7 for evaporating and evaporating the secondary cleaning liquid F regenerated by distillation, and condensed and liquefied on the upper side wall of the generating tank 7. A water separation tank 8 for separating the separated secondary cleaning liquid F into water is connected.

A work inlet / outlet 9 formed in the cleaning tank 3 at a position directly above the ultrasonic cleaning tank 5 corresponding to the ultrasonic cleaning tank 5 and having a size permitting the entry and exit of the printed circuit board W is opened. A cooling jacket 10 is piped on an inner wall surface corresponding to the region, and a water separation tank 8 connected to the inner wall surface is provided.
A cooling coil 11 is piped in the upper steam area of the cleaning tank 3, for example, a coolant cooled to an appropriate temperature is circulated and supplied to the cooling jacket 10 and the cooling coil 11, and the secondary cleaning liquid discharged to the upper steam area in the cleaning tank 3. The temperature of the cooling jacket 10 and the cooling coil 11 is kept at a temperature at which the vapor Fa of F and the moisture in the atmosphere entering the tank are condensed and liquefied.

The above-described ultrasonic cleaning tank 5 includes a printed circuit board W
A predetermined amount of the secondary cleaning liquid F is stored to a liquid level at which the whole is immersed, and an ultrasonic vibrator 12 for ultrasonically vibrating the secondary cleaning liquid F is arranged on the bottom wall inside the ultrasonic cleaning tank 5. The ultrasonic vibrator 12 is vibrated at a vibration frequency of, for example, 27 KHz to 200 KHz to induce ultrasonic vibration in the secondary cleaning liquid F. In addition, the liquid surface portion of the secondary cleaning liquid F stored in the ultrasonic cleaning tank 5 (in other words, the portion of the primary cleaning liquid L floating on the secondary cleaning liquid F due to the work cleaning) corresponds to the liquid level on the upstream side wall surface. A liquid level cleaning nozzle 13 as a cleaning means is connected, and the discharge direction of the liquid level cleaning nozzle 13 is horizontally fixed toward the specific gravity separation tank 6 disposed downstream. In addition, between the upstream ultrasonic cleaning tank 5 and the downstream specific gravity separation tank 6, between the upper end side walls of the ultrasonic cleaning tank 5 disposed on the upstream side and the specific gravity separation tank 6 disposed on the downstream side. A flow-down plate 14 for causing the secondary cleaning liquid F (the secondary cleaning liquid containing the primary cleaning liquid L) to overflow toward the liquid surface is inclined.

The above-mentioned specific gravity separation tank 6 is provided with two partition plates 6c and 6d vertically suspended at the position where the lower liquid storage area inside the specific gravity separation tank 6 is divided into right and left parts. Each of the discharge valves 15 and 16 is formed on a side wall surface corresponding to the primary cleaning liquid L which has been divided and floated on the liquid surface portion of one of the separation tanks 6a.
And one end of a liquid discharge passage 18 via a discharge pump 17, and the other end of the liquid discharge passage 18 is connected to a liquid surface portion of a secondary cleaning liquid F stored in a distillation regeneration tank 4 described later. Than the upper wall.

On the bottom wall surface corresponding to the lower liquid storage area of the other separation tank 6b, a circulation valve 19, a circulation pump 20, a filter 21 and a heat exchanger 22 One end is connected, and the other end of the liquid circulation path 23 is fixed to the side wall surface corresponding to the upper liquid storage region of the ultrasonic cleaning tank 5 and the upstream side wall surface via the respective circulation valves 24 and 25. It is connected to the liquid level cleaning nozzle 13 respectively. That is, the circulation pump 20 is driven, and the secondary cleaning liquid F stored in the other separation tank 6 b side of the specific gravity separation tank 6 is separated from the ultrasonic cleaning tank 5 through the filter 21 and the heat exchanger 22. The cleaning nozzle 13 is supplied.

The above-mentioned steam generating tank 7 is
A heating pipe 26 for heating the secondary cleaning liquid F is piped to the bottom wall surface of the inside, and a heating medium such as an oil or an aqueous solution heated to an appropriate temperature is circulated and supplied to the heating pipe 26 to generate steam. The heating pipe 26 is heated to a boiling point at which the secondary cleaning liquid F stored in the tank 7 evaporates. In addition, one end of each of liquid return paths 29 and 30 in which return valves 27 and 28 are interposed are connected to side wall surfaces corresponding to the lower liquid storage area of the steam generation tank 7, and these liquid return paths 29 are connected. , 30 are connected to the bottom wall surface of the water separation tank 8 described above and the bottom wall surface of the water separation tank 41 described later. In addition, between the upstream-side steam generation tank 7 and the downstream-side specific gravity separation tank 6, between the upper end side wall portions of the specific gravity separation tank 6 provided on the downstream side and the steam generation tank 7 provided on the upstream side. A falling plate 31 for overflowing the distilled and regenerated secondary washing liquid F is provided obliquely.

The above-mentioned distillation regeneration tank 4 is provided with a heating pipe 32 for heating the secondary cleaning liquid F on the bottom wall inside the distillation regeneration tank 4, for example, oil or aqueous solution heated to an appropriate temperature. Is circulated and supplied to the heating tube 32 to heat the heating tube 32 to a boiling point at which the secondary cleaning liquid F recovered in the distillation regeneration tank 4 evaporates. Further, one end of a liquid circulation path 35 is connected to a side wall surface corresponding to the upper liquid storage area of the distillation regeneration tank 4 via a circulation valve 33 and a circulation pump 34, The end is connected to a side wall surface corresponding to a lower storage area of the distillation and regeneration tank 4 via a circulation valve 36 and a solvent separation tank 37. That is, the circulating pump 34 is driven to supply the primary cleaning liquid L collected in the distillation and regeneration tank 4 to the solvent separation tank 37. For example, the secondary cleaning liquid F is converted from the primary cleaning liquid F using characteristics such as a boiling point and specific gravity. While separating only L, the separated secondary washing liquid F is returned and supplied to the distillation and regeneration tank 4.

In addition, a cooling jacket 38 is provided on the inner wall surface corresponding to the upper steam region of the distillation regeneration tank 4, and for example,
The coolant cooled to an appropriate temperature is circulated and supplied to the cooling jacket 38 to keep the temperature of the cooling jacket 38 at a temperature at which the vapor Fa of the secondary cleaning liquid F discharged into the upper vapor region inside the distillation regeneration tank 4 is condensed and liquefied. . And cooling jacket 3
A lower drop tank 39 for dropping the condensed and liquefied secondary cleaning liquid F is disposed on the lower wall surface corresponding to 8 and the lower drop tank 3 is provided.
9 is connected to a side wall surface corresponding to the lower liquid storage area of the liquid storage tank 9 and a water separation tank 41 for separating the condensed and liquefied secondary cleaning liquid F from the lower wall surface corresponding to the liquid discharge port 40. Are connected.

The illustrated embodiment is configured as described above, and the operation of cleaning the printed circuit board W by the work cleaning apparatus 1 will be described below. First, as shown in FIG.
The secondary cleaning liquid F containing hydrofluorocarbon as a main component and stored in the vapor generation tank 7 is heated to an appropriate temperature by the heating pipe 26, and the vapor Fa of the secondary cleaning liquid F is discharged to the upper vapor region inside the cleaning tank 3. After that, the printed circuit board W preliminarily cleaned with the primary cleaning liquid L containing a hydrocarbon solvent as a main component is carried into the cleaning tank 3 and passes through the vapor Fa of the secondary cleaning liquid F discharged into the cleaning tank 3. Then, the entire printed circuit board W is immersed in the secondary cleaning liquid F stored in the ultrasonic cleaning tank 5.

Thereafter, the ultrasonic vibrator 12 is vibrated to
Printed circuit board W by cavitation of secondary cleaning solution F
The primary cleaning liquid L adhered to the substrate is peeled and removed, and the peeled and removed primary cleaning liquid L and the secondary cleaning liquid F are emulsified with each other, and the primary cleaning liquid L having a small specific gravity floats on the liquid surface portion of the ultrasonic cleaning tank 5. At the same time, the circulation pump 20 is driven to supply the secondary cleaning liquid F stored in the separation tank 6 b of the specific gravity separation tank 6 to the ultrasonic cleaning tank 5 and the liquid level cleaning nozzle 13. Cleaning liquid F discharged from
The primary cleaning liquid L that has floated on the liquid surface portion of the ultrasonic cleaning tank 5 by the jet flow overflows to the separation tank 6 a side of the specific gravity separation tank 6.

Next, the primary washing liquid L and the secondary washing liquid F are overflowed to the separation tank 6a side of the specific gravity separation tank 6 in an emulsified state to be separated by specific gravity. That is, the primary cleaning liquid L having a small specific gravity is floated on the liquid surface portion of the secondary cleaning liquid F stored in the separation tank 6a of the specific gravity separation tank 6, and the discharge pump 17 is driven to drive the liquid surface portion of the separation tank 6a. The primary cleaning liquid L having a small specific gravity (the primary cleaning liquid L containing the secondary cleaning liquid F) is supplied to the distillation regeneration tank 4. On the other hand, the secondary cleaning liquid F having a large specific gravity that has dropped to the bottom of the separation tank 6a is supplied to the separation tank 6b.
The secondary cleaning liquid F stored in the separation tank 6 b of the specific gravity separation tank 6 is supplied to the ultrasonic cleaning tank 5 and the liquid level cleaning nozzle 13 by driving the circulation pump 20.

At the same time, the circulation pump 34 is driven to supply the primary cleaning liquid L (the primary cleaning liquid containing the secondary cleaning liquid) collected in the distillation and regeneration tank 4 to the solvent separation tank 37, At 37, the primary cleaning liquid L and the secondary cleaning liquid F are separated, and only the separated secondary cleaning liquid F is returned to the distillation regeneration tank 4. The secondary cleaning liquid F stored in the distillation regeneration tank 4 is heated by the heating pipe 32 to evaporate and evaporate, and the vapor Fa of the secondary cleaning liquid F discharged into the distillation regeneration tank 4 is condensed and liquefied by the cooling jacket 38. Then, the secondary cleaning liquid F dropped into the droplet lowering tank 39 is dropped into the water separating tank 4.
Overflows to 1. In addition, the vapor Fa of the secondary cleaning liquid F discharged into the cleaning tank 3 is condensed and liquefied by the cooling jacket 10 and the cooling coil 11 and dropped into the water separation tank 8.

The secondary cleaning liquid F stored in each of the water separation tanks 8 and 41 is returned to the steam generation tank 7, and the secondary cleaning liquid F stored in the steam generation tank 7 is returned to the heating pipe 26. To discharge the vapor Fa of the secondary cleaning liquid F into the upper vapor region inside the cleaning tank 3 to vapor-clean the printed circuit board W with the vapor-repelled secondary cleaning liquid F containing less impurities. Can be. On the other hand, the secondary cleaning liquid F stored in the steam generation tank 7 overflows to the separation tank 6 b side of the specific gravity separation tank 6, and the circulation pump 20 is driven to drive the specific cleaning tank 6.
By supplying the secondary cleaning liquid F stored in the separation tank 6b to the ultrasonic cleaning tank 5 and the liquid level cleaning nozzle 13, the purity of the secondary cleaning liquid F stored in the ultrasonic cleaning tank 5 is kept constant. The printed circuit board W can be cleaned with the high-purity secondary cleaning solution F that can be maintained at a high purity and is distilled and regenerated.

Next, after the cleaning processing, the printed circuit board W is taken out of the secondary cleaning liquid F stored in the ultrasonic cleaning tank 5 and the secondary cleaning liquid F discharged into the upper vapor region inside the cleaning tank 3 is removed. The printed circuit board W is heated to an appropriate temperature with the steam Fa and dried. Thereafter, the printed circuit board W that has been subjected to the cleaning process is carried out of the cleaning chamber 2 to complete the cleaning process for one printed circuit board W.

As described above, after cleaning the printed circuit board W with the primary cleaning liquid L containing a hydrocarbon solvent as a main component, the printed circuit board W is washed with a secondary cleaning liquid F containing a hydrofluorocarbon as a main component, which has been recycled. Since the cleaning treatment is performed, the residual liquid of the primary cleaning liquid L, which has been difficult to remove by the conventional method, can be reliably peeled and removed, and the residue-free cleaning treatment that requires advanced technology can be easily and easily performed. I can do it. Further, since the printed circuit board W is washed with the high-purity secondary cleaning liquid F that has been distilled and regenerated, the entire printed circuit board W can be reliably and neatly cleaned, and the precision processing of electronic components and electric components can be performed. Ideal for

In addition, the primary cleaning solution L is separated from the primary cleaning solution L containing the secondary cleaning solution F by the specific gravity separation, and only the secondary cleaning solution F is distilled and regenerated to return to the cleaning step. Therefore, the recovery efficiency of the secondary cleaning solution F is increased,
There is an effect that the reusability of the secondary cleaning liquid F can be improved.

Moreover, the primary cleaning liquid L floats on the liquid surface of the work cleaning means (see the ultrasonic cleaning tank 5) in which the secondary cleaning liquid F containing an inert solvent as a main component is stored by cleaning the work W. Since the primary cleaning liquid L positively overflows to the above-described specific gravity separation means (see the specific gravity separation tank 6) by the liquid level discharge of the secondary cleaning liquid F from the liquid level cleaning means (see the liquid level cleaning nozzle 13), the primary cleaning liquid L Not to prevent L from re-adhering to the workpiece W, the secondary cleaning liquid F stored in the workpiece cleaning means (refer to the ultrasonic cleaning tank 5) can be kept at a high purity, and high cleaning for a long time can be maintained. There is an effect that the efficiency can be maintained and ensured, and there is an effect that the efficiency of cleaning the work can be improved by organically combining and adopting the above-described respective components.

In the correspondence between the configuration of the present invention and the above-described embodiment, the work of the present invention corresponds to the printed circuit board W of the embodiment, and similarly, the work cleaning means corresponds to the ultrasonic cleaning tank 5. The distillation regeneration means corresponds to the distillation regeneration tank 4, the specific gravity separation means corresponds to the specific gravity separation tank 6, and the liquid level cleaning means corresponds to the liquid level cleaning nozzle 13. The configuration is not limited only to the configuration of the embodiment.

For example, in the above embodiment, hydrofluorocarbon is exemplified as the inert solvent.
Of course, other inert solvents such as (perfluorocarbon) and other completely fluorinated solvents may be used.

[Brief description of the drawings]

FIG. 1 is an overall configuration diagram showing a work cleaning apparatus of the present invention.

[Explanation of symbols]

 L: Primary cleaning liquid F: Secondary cleaning liquid W: Workpiece 4: Distillation regeneration tank 5: Ultrasonic cleaning tank 6: Specific gravity separation tank 13: Nozzle for liquid surface cleaning

Claims (1)

(57) [Claims] 1. A workpiece cleaning apparatus for cleaning a workpiece (W) cleaned by a primary cleaning liquid (L) mainly containing a hydrocarbon solvent with a secondary cleaning liquid (F) mainly containing an inert solvent. A work in which a vapor region of the vaporized secondary cleaning liquid (F) is formed at an upper portion, and the work (W) cleaned by the primary cleaning liquid (L) is cleaned by the secondary cleaning liquid (F). A cleaning means (5); a steam generating means (7) for vaporizing the secondary cleaning liquid (F) and releasing the vaporized secondary cleaning liquid (F) into a steam area of the work cleaning means (5); a work cleaning means (5) and a steam generating means ( 7) next to
Is contact disposed, the secondary cleaning fluid (F) and gravity separation including primary cleaning liquid used in the cleaning process (L), steam generating means
A specific gravity separation means (6 ) for receiving the secondary cleaning liquid overflowing from (7); and a primary cleaning liquid (L) containing a secondary cleaning liquid (F) separated into an upper layer by the above specific gravity separation. ), And only the secondary washing liquid (F) is distilled and regenerated and returned to the steam generating means (7).
A liquid surface cleaning means (1) for causing the primary cleaning liquid (L) floating on the liquid surface of the work cleaning means (5) to overflow to the specific gravity separation means (6) by discharging the liquid surface of the secondary cleaning liquid (F);
3) A work cleaning apparatus comprising: