JPH10249291A - Washing apparatus - Google Patents

Washing apparatus

Info

Publication number
JPH10249291A
JPH10249291A JP7036697A JP7036697A JPH10249291A JP H10249291 A JPH10249291 A JP H10249291A JP 7036697 A JP7036697 A JP 7036697A JP 7036697 A JP7036697 A JP 7036697A JP H10249291 A JPH10249291 A JP H10249291A
Authority
JP
Japan
Prior art keywords
tank
solvent
cleaning
work
vapor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7036697A
Other languages
Japanese (ja)
Inventor
Tadashi Yoshida
正 吉田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
OTSUKA GIKEN KOGYO KK
Original Assignee
OTSUKA GIKEN KOGYO KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by OTSUKA GIKEN KOGYO KK filed Critical OTSUKA GIKEN KOGYO KK
Priority to JP7036697A priority Critical patent/JPH10249291A/en
Publication of JPH10249291A publication Critical patent/JPH10249291A/en
Pending legal-status Critical Current

Links

Landscapes

  • Cleaning By Liquid Or Steam (AREA)

Abstract

PROBLEM TO BE SOLVED: To remove effectively a second solvent stuck to a work when the work is transferred from a washing tank to a principal washing tank by a method wherein a vapor layer of a first solvent is formed to an upper part on a liquid surface of the washing tank in which mixed solution of the first solvent (HFC or the like) and the second solvent (hydrocarbon solvent or the like) is reserved. SOLUTION: In order to wash a work, at first the work is dipped in mixed solution C in a pre-washing tank 5 of a pre-washing part 1 to execute prewashing. Then, the work is pulled up to a vapor layer D, a second solvent B stuck to the work is washed with vapor of a first solvent A, and bringing into a principal washing part 2 of a second solvent B is reduced. Then, the work is conveyed to the principal washing part 2, at first dipped into a first solvent A in a boiling tank 21, and a remaining excess content of the second solvent stuck to the work is thoroughly washed out. Thereafter, the work is pulled up into a vapor layer E from the boiling tank 21, and the work is washed with clean vapor. Thereafter, it is dipped into the first solvent A of an ultrasonic tank 22 to execute finish washing by use of ultrasonic energy.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】この発明は、例えばHC(ハ
イドロカーボン)等の炭化水素系溶剤もしくはアルコー
ルまたは双方の溶剤でワークを洗浄するような洗浄装置
に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cleaning apparatus for cleaning a workpiece with a hydrocarbon solvent such as HC (hydrocarbon) or an alcohol or both solvents.

【0002】[0002]

【従来の技術】従来上述例の洗浄装置としては、例えば
図6に示す如き構成の装置がある。すなわち上部を広く
開口してワーク出入口100に設定した装置本体101
に、第1槽102(洗浄槽)、第2槽103(すすぎ
槽)および第3槽104(PFC置換洗浄槽)を形成
し、上述の第1槽102には例えば炭化水素系溶剤とし
てのHC(ハイドロカーボン)Xを貯溜すると共に、槽
底部に超音波振動子105および加熱ヒータ106を取
付け、また第2槽103にはフッ素系溶剤Yを貯溜する
と共に、槽底部に超音波振動子107および加熱ヒータ
108を取付け、さらに第3槽104にはフッ素系溶剤
Yを貯溜し、かつ槽底部に超音波振動子109および加
熱ヒータ110を取付けると共に、このフッ素系溶剤Y
の液面と第3槽104の上部外周に配置した冷却ジャケ
ット111との間にフッ素系溶剤Yの蒸気層Zを形成
し、さらに上述のフッ素系溶剤Yの液面相当位置に液面
シャワー装置112を取付けた洗浄装置である。
2. Description of the Related Art Conventionally, as a cleaning apparatus of the above-mentioned example, there is an apparatus having a configuration as shown in FIG. That is, the main body 101 having a wide opening at the top and set at the work entrance 100.
A first tank 102 (cleaning tank), a second tank 103 (rinse tank), and a third tank 104 (PFC replacement cleaning tank) are formed in the first tank 102. In the first tank 102, for example, HC as a hydrocarbon solvent is used. In addition to storing (hydrocarbon) X, an ultrasonic oscillator 105 and a heater 106 are attached to the bottom of the tank, a fluorine-based solvent Y is stored in the second tank 103, and an ultrasonic oscillator 107 and A heater 108 is attached, a fluorine-based solvent Y is stored in the third tank 104, and an ultrasonic vibrator 109 and a heater 110 are attached to the bottom of the tank.
A vapor layer Z of the fluorinated solvent Y is formed between the liquid surface of the third tank 104 and the cooling jacket 111 disposed on the upper periphery of the third tank 104, and a liquid level shower device is provided at a position corresponding to the liquid surface of the fluorinated solvent Y described above. This is a cleaning device to which a cleaning device 112 is attached.

【0003】この従来装置によれば被洗浄物体としての
ワーク(図示せず)は、まず第1槽102のHC(X)
内に浸漬されて洗浄され、次に第2槽103のフッ素系
溶剤Y内に浸漬されてすすぎ処理され、さらに第3槽1
04のフッ素系溶剤Y内に浸漬されて置換洗浄される。
According to this conventional apparatus, a work (not shown) as an object to be cleaned is first formed of HC (X) in the first tank 102.
And then rinsed, and then immersed in a fluorinated solvent Y in the second tank 103 for rinsing.
The substrate is immersed in a fluorine-based solvent Y of No. 04 and subjected to replacement cleaning.

【0004】ワークを第1槽102から第2槽103に
移動させる時、ワークに付着したHC(X)の液切りを
行なうが、ワーク表面に残存するHC(X)が第2槽1
03および第3槽104に持込まれ、このようにHC
(X)がフッ素系溶剤Yの液中に持込まれると、フッ素
系溶剤Yによるすすぎ能力および置換洗浄能力が低下す
ると共に、蒸気層Zの洗浄度が低下して、充分なワーク
の洗浄品質が確保できなくなる問題点があった。
When the work is moved from the first tank 102 to the second tank 103, the liquid of the HC (X) adhering to the work is drained.
03 and the third tank 104, and thus HC
When (X) is carried into the solution of the fluorine-based solvent Y, the rinsing ability and the replacement cleaning ability of the fluorine-based solvent Y are reduced, and the degree of cleaning of the vapor layer Z is reduced. There was a problem that it could not be secured.

【0005】また第3槽104において比重差(例えば
フッ素系溶剤としてPFCを用いると、その比重=1.
68、HCの比重=0.815)によりフッ素系溶剤Y
の液面上に浮遊したHC(X)を上述の液面シャワー装
置112で槽外に排出除去することもできるが、この液
面シャワー装置112からのシャワー流dの噴出時に、
HC(X)とフッ素系溶剤Yとが混入される所謂巻き込
み現象が発生するので好ましくない。
In the third tank 104, a specific gravity difference (for example, when PFC is used as a fluorine-based solvent, the specific gravity = 1.
68, the specific gravity of HC = 0.815)
Although the HC (X) floating on the liquid surface can be discharged and removed to the outside of the tank by the liquid level shower device 112, when the shower flow d is ejected from the liquid level shower device 112,
It is not preferable because a so-called entrainment phenomenon in which HC (X) and the fluorinated solvent Y are mixed occurs.

【0006】[0006]

【発明が解決しようとする課題】この発明の請求項1記
載の発明は、第1溶剤(HFC、HFEまたはフッ素系
溶剤など)と、第2溶剤(炭化水素系溶剤もしくはアル
コールまたは双方の溶剤)とを混合貯溜した前洗浄槽の
液面上部に第1溶剤の蒸気層を形成し、ワークを前洗浄
槽から本洗浄槽へ移動させる時、ワーク表面に付着して
いる第2溶剤を第1溶剤の蒸気で除去して、第2溶剤の
本洗浄槽への持込み量低減を図ることができるのは勿
論、第1溶剤を貯溜した本洗浄槽と、この第1溶剤の液
面上部に第1溶剤の蒸気層を形成する蒸気槽とを設け
て、クリーンな蒸気にてワークを蒸気洗浄し、ワークの
充分な洗浄品質を確保することができる洗浄装置の提供
を目的とする。
The invention according to claim 1 of the present invention comprises a first solvent (HFC, HFE or a fluorine-based solvent) and a second solvent (hydrocarbon-based solvent or alcohol or both solvents). A vapor layer of the first solvent is formed above the liquid surface of the pre-cleaning tank in which the second solvent is mixed and stored, and when the work is moved from the pre-cleaning tank to the main cleaning tank, the second solvent adhering to the work surface is removed by the first solvent. It is possible to reduce the amount of the second solvent brought into the main cleaning tank by removing the solvent with the vapor of the solvent, and of course, the main cleaning tank in which the first solvent is stored and the second solvent are provided above the liquid level of the first solvent. An object of the present invention is to provide a cleaning apparatus that is provided with a steam tank that forms a vapor layer of one solvent, performs steam cleaning of a workpiece with clean steam, and can ensure sufficient cleaning quality of the workpiece.

【0007】この発明の請求項2記載の発明は、上記請
求項1際の発明の目的と併せて、上述の蒸気槽を本洗浄
槽を構成する煮沸槽または超音波槽の側方に設けること
で、本洗浄槽の上面開放構造のワーク出入口用の開口部
の面積を小さくして、時間当りの溶剤消費量低減を図る
ことができる洗浄装置の提供を目的とする。
According to a second aspect of the present invention, in addition to the object of the first aspect of the present invention, the above-mentioned steam tank is provided on a side of a boiling tank or an ultrasonic tank which constitutes a main cleaning tank. Accordingly, it is an object of the present invention to provide a cleaning apparatus capable of reducing the area of an opening for a work entrance having a top opening structure of a main cleaning tank to reduce solvent consumption per unit time.

【0008】この発明の請求項3記載の発明は、上記請
求項1または2記載の発明の目的と併せて、本洗浄槽の
開口部周辺に設けられた冷却手段で溶剤蒸気を再生液化
し、かつ水分離後の再生液を超音波槽へ還流すること
で、超音波槽の清浄度を保つと共に、同槽の液温上昇防
止を図ることができる洗浄装置の提供を目的とする。
According to a third aspect of the present invention, in addition to the object of the first or second aspect, the solvent vapor is regenerated and liquefied by cooling means provided around the opening of the main cleaning tank. In addition, an object of the present invention is to provide a cleaning apparatus capable of maintaining the cleanliness of an ultrasonic tank and preventing a rise in liquid temperature of the tank by refluxing a regenerated liquid after water separation to an ultrasonic tank.

【0009】この発明の請求項4記載の発明は、上記請
求項1記載の発明の目的と併せて、本洗浄槽に蒸留槽を
隣設し、この蒸留槽の上方に冷却手段と液受部とを設け
て、蒸留された溶剤を凝縮再生すべく構成することで、
凝縮再生により蒸気中のミスト分離を行なうことができ
る洗浄装置の提供を目的とする。
According to a fourth aspect of the present invention, in addition to the object of the first aspect of the present invention, a distillation tank is provided adjacent to the main cleaning tank, and a cooling means and a liquid receiving part are provided above the distillation tank. By providing and condensing and regenerating the distilled solvent,
It is an object of the present invention to provide a cleaning device capable of performing mist separation in steam by condensation regeneration.

【0010】この発明の請求項5記載の発明は、上記請
求項4記載の発明の目的と併せて、本洗浄槽と蒸留槽と
の間に分離槽を設け、第1溶剤と、汚れを含んだ第2溶
剤とを温度差により分離することができる洗浄装置の提
供を目的とする。
According to a fifth aspect of the present invention, in addition to the object of the fourth aspect, a separation tank is provided between the main washing tank and the distillation tank to contain the first solvent and dirt. It is an object of the present invention to provide a cleaning apparatus capable of separating a second solvent from a second solvent by a temperature difference.

【0011】[0011]

【課題を解決するための手段】この発明の請求項1記載
の発明は、HFC、HFEまたはフッ素系溶剤などの第
1溶剤と、炭化水素系溶剤もしくはアルコールまたは双
方の第2溶剤とを混合貯溜した前洗浄槽の液面上部に第
1溶剤の蒸気層が形成されてなる前洗浄部と、第1溶剤
を貯溜した本洗浄槽と、該本洗浄槽の液面上部に第1溶
剤の蒸気層を形成する蒸気槽とを備えた洗浄装置である
ことを特徴とする。
According to the first aspect of the present invention, a first solvent such as HFC, HFE, or a fluorine-based solvent is mixed with a hydrocarbon-based solvent or an alcohol or both of the second solvents. A pre-cleaning section in which a vapor layer of the first solvent is formed above the liquid level of the pre-cleaning tank, a main cleaning tank storing the first solvent, and a vapor of the first solvent being disposed above the liquid level of the main cleaning tank. The cleaning device includes a steam tank for forming a layer.

【0012】この発明の請求項2記載の発明は、上記請
求項1記載の発明の構成と併せて、上記蒸気槽は本洗浄
槽を構成する煮沸槽または超音波槽の側方に設けられた
洗浄装置であることを特徴とする。
According to a second aspect of the present invention, in addition to the configuration of the first aspect, the steam tank is provided on a side of a boiling tank or an ultrasonic tank which constitutes a main cleaning tank. It is a cleaning device.

【0013】この発明の請求項3記載の発明は、上記請
求項1または2記載の発明の構成と併せて、上面が開放
された本洗浄槽の開口部周辺に冷却手段を設け、該冷却
手段で再生液化した再生液が水分離された後に、上記超
音波槽へ還流されるように構成した洗浄装置であること
を特徴とする。
According to a third aspect of the present invention, in addition to the configuration of the first or second aspect of the present invention, a cooling means is provided around an opening of the main cleaning tank having an open upper surface. The cleaning device is characterized in that the regenerating solution liquefied in the above is separated into water and then returned to the ultrasonic bath.

【0014】この発明の請求項4記載の発明は、上記請
求項1記載の発明の構成と併せて、上記本洗浄装置に蒸
留槽を隣設し、蒸留槽の上方に冷却手段と液受部とを設
け、蒸留された溶剤を凝縮再生する洗浄装置であること
を特徴とする。
According to a fourth aspect of the present invention, in addition to the configuration of the first aspect of the present invention, a distillation tank is provided adjacent to the main cleaning apparatus, and a cooling means and a liquid receiving unit are provided above the distillation tank. And a washing apparatus for condensing and regenerating the distilled solvent.

【0015】この発明の請求項5記載の発明は、上記請
求項4記載の発明の構成と併せて、上記本洗浄槽と上記
蒸留槽との間に第1溶剤と、汚れを含んだ第2溶剤とを
温度差により分離する分離槽が設けられた洗浄装置であ
ることを特徴とする。
According to a fifth aspect of the present invention, in addition to the structure of the fourth aspect of the present invention, a first solvent and a second solvent containing dirt are provided between the main cleaning tank and the distillation tank. The cleaning device is provided with a separation tank for separating a solvent from a solvent by a temperature difference.

【0016】[0016]

【発明の作用及び効果】この発明の請求項1記載の発明
のよれば、第1溶剤(HFC、HFEまたはフッ素系溶
剤など)と、第2溶剤(炭化水素系溶剤もしくはアルコ
ールまたは双方の溶剤)とを混合貯溜した前洗浄槽の液
面上部に第1溶剤の蒸気層を形成したので、ワークを前
洗浄槽から本洗浄槽へ移動させる時、ワーク表面に付着
している第2溶剤を第1溶剤の蒸気で除去(蒸気洗浄)
して、第2溶剤が本洗浄槽へ持込まれる量を低減させる
ことができるのは勿論である。しかも第1溶剤を貯溜し
た本洗浄槽と、この第1溶剤の液面上部に第1溶剤の蒸
気層を形成する蒸気槽とを設けたので、クリーンな蒸気
にてワークを蒸気洗浄し、ワークの充分な洗浄品質を確
保することができる効果がある。
According to the first aspect of the present invention, a first solvent (such as HFC, HFE or fluorine-based solvent) and a second solvent (hydrocarbon-based solvent or alcohol or both solvents) are used. A vapor layer of the first solvent was formed above the liquid surface of the pre-cleaning tank in which the mixture was stored, so that when the work was moved from the pre-cleaning tank to the main cleaning tank, the second solvent adhering to the work surface was removed. Removed with one solvent vapor (steam cleaning)
As a result, the amount of the second solvent brought into the main cleaning tank can be reduced. In addition, since the main cleaning tank storing the first solvent and the vapor tank for forming the vapor layer of the first solvent above the liquid surface of the first solvent are provided, the workpiece is subjected to steam cleaning with clean steam, and This has the effect that sufficient cleaning quality can be ensured.

【0017】この発明の請求項2記載の発明のよれば、
上記請求項1際の発明の効果と併せて、上述の蒸気槽を
本洗浄槽を構成する煮沸槽または超音波槽の側方に設け
たので、本洗浄槽の上面開放構造のワーク出入口用の開
口部の面積を小さくして、時間当りの溶剤消費量低減を
図ることができる効果がある。
According to the invention described in claim 2 of the present invention,
In addition to the effect of the invention according to claim 1, the above-described steam tank is provided on the side of the boiling tank or the ultrasonic tank that constitutes the main cleaning tank, so that it is used for the entrance of the work having the upper surface open structure of the main cleaning tank. There is an effect that the area of the opening can be reduced to reduce the amount of solvent consumed per unit time.

【0018】この発明の請求項3記載の発明のよれば、
上記請求項1または2記載の発明の効果と併せて、本洗
浄槽の開口部周辺に設けられた冷却手段で溶剤蒸気を再
生液化し、かつ水分離後の再生液を超音波槽へ還流する
ので、超音波槽の清浄度を保つことができると共に、こ
の超音波槽の液温が上昇するのを防止することができる
効果がある。
According to the invention described in claim 3 of the present invention,
In addition to the effect of the first or second aspect of the present invention, the solvent vapor is regenerated and liquefied by cooling means provided around the opening of the main cleaning tank, and the regenerated liquid after water separation is returned to the ultrasonic tank. Therefore, there is an effect that the cleanliness of the ultrasonic bath can be maintained and the liquid temperature of the ultrasonic bath can be prevented from rising.

【0019】この発明の請求項4記載の発明のよれば、
上記請求項1記載の発明の効果と併せて、本洗浄槽に蒸
留槽を隣設し、この蒸留槽の上方に冷却手段と液受部と
を設けて、蒸留された溶剤を凝縮再生すべく構成したの
で、凝縮再生により蒸気中のミスト分離を行なうことが
できる効果がある。
According to the invention described in claim 4 of the present invention,
In addition to the effect of the first aspect of the present invention, a distillation tank is provided adjacent to the main cleaning tank, and a cooling means and a liquid receiving portion are provided above the distillation tank to condense and regenerate the distilled solvent. With such a configuration, there is an effect that the mist in the steam can be separated by the condensation regeneration.

【0020】この発明の請求項5記載の発明のよれば、
上記請求項4記載の発明の効果と併せて、本洗浄槽と蒸
留槽との間に分離槽を設けたので、この分離槽内の液体
を冷却すると、第1溶剤と、汚れを含んだ第2溶剤とを
温度差により分離することができる効果がある。
According to the invention described in claim 5 of the present invention,
In addition to the effect of the fourth aspect of the present invention, since a separation tank is provided between the main cleaning tank and the distillation tank, when the liquid in the separation tank is cooled, the first solvent and the dirt containing dirt are removed. There is an effect that the two solvents can be separated by a temperature difference.

【0021】[0021]

【実施例】この発明の一実施例を以下図面に基づいて詳
述する。図面は溶剤を用いてワークを洗浄する洗浄装置
を示し、図1において、この洗浄装置は前洗浄部1と本
洗浄部2とを備えている。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS One embodiment of the present invention will be described below in detail with reference to the drawings. The drawing shows a cleaning apparatus for cleaning a work using a solvent. In FIG. 1, the cleaning apparatus includes a pre-cleaning section 1 and a main cleaning section 2.

【0022】上述の前洗浄部1は上方にワーク出入口3
を設けたタンク本体4に前洗浄槽5(第1洗浄槽)とサ
ブタンク(プールタンク)としての蒸留槽6とを形成
し、これら両槽5,6間にはオーバフロー部7を形成し
ている。また上述の両槽5,6内にはHFC、HFEま
たはフッ素系溶剤などの第1溶剤Aと、炭化水素系溶剤
(たとえばHC)もしくはアルコールまたは双方の第2
溶剤Bとの混合液Cを貯溜している。
The above-mentioned pre-cleaning section 1 has a work entrance 3
A pre-cleaning tank 5 (first cleaning tank) and a distillation tank 6 as a sub-tank (pool tank) are formed in a tank body 4 provided with the above. An overflow section 7 is formed between the tanks 5 and 6. . In the tanks 5 and 6 described above, a first solvent A such as HFC, HFE or a fluorine-based solvent, and a second solvent A such as a hydrocarbon-based solvent (eg, HC) or an alcohol or both.
The mixed solution C with the solvent B is stored.

【0023】上述の蒸留槽6には混合液Cのうちの第1
溶剤Aをその沸点(第1溶剤AとしてHFEを用いる場
合には60℃)に加熱して第1溶剤Aの蒸気層Dを形成
する加熱手段としてのヒータ8を取付けている。上述の
前洗浄槽5には超音波振動子9を配置する一方、蒸留槽
6と前洗浄槽5との間には、ポンプ10、フィルタ1
1、熱交換器12等を備えた送液手段13を付設して、
ポンプ10で蒸留槽6内の混合液Cを送液し、フィルタ
11で粒子状のゴミをろ過すべく構成している。
In the above-described distillation tank 6, the first liquid C
A heater 8 is attached as heating means for heating the solvent A to its boiling point (60 ° C. when HFE is used as the first solvent A) to form a vapor layer D of the first solvent A. While the ultrasonic vibrator 9 is disposed in the above-described pre-cleaning tank 5, a pump 10 and a filter 1 are provided between the distillation tank 6 and the pre-cleaning tank 5.
1. A liquid sending means 13 provided with a heat exchanger 12 and the like is provided,
The structure is such that the mixed liquid C in the distillation tank 6 is sent by the pump 10 and the particulate dust is filtered by the filter 11.

【0024】また上述のワーク出入口3の外周には冷却
ジャケット14および冷却コイル15を取付け、上記飛
散防止のために冷却により溶剤の回収を行なうように構
成している。ここで、上述の冷却ジャケット14および
冷却コイル15は前洗浄槽5の大きさに対応して何れか
一方を選択し、装置の大きさを抑制することも可能であ
る。
A cooling jacket 14 and a cooling coil 15 are attached to the outer periphery of the work entrance 3 so as to recover the solvent by cooling to prevent the scattering. Here, one of the cooling jacket 14 and the cooling coil 15 can be selected according to the size of the pre-cleaning tank 5 to suppress the size of the apparatus.

【0025】上述の冷却ジャケット14はそのコイルを
1本以上再生液a中に漬けるように構成し、これにより
冷却ジャケットコイル面積と溶剤で冷却面積の増加を図
り、また冷却管表面温度に変動が発生しても溶剤を冷却
させることで、一定な冷却効果を確保すべく構成してい
る。上述の熱交換器12、冷却ジャケット14、冷却コ
イル15は冷凍機16または低温冷却のできる冷水器な
どの冷凍手段に接続されている。
The above-mentioned cooling jacket 14 is constructed so that one or more coils thereof are immersed in the regenerating solution a, thereby increasing the cooling area with the cooling jacket coil area and the solvent, and the fluctuation of the cooling pipe surface temperature. Even if it occurs, it is configured to ensure a certain cooling effect by cooling the solvent. The above-described heat exchanger 12, cooling jacket 14, and cooling coil 15 are connected to a refrigerating device such as a refrigerator 16 or a water cooler capable of low-temperature cooling.

【0026】この前洗浄部1はワークを前洗浄槽5の混
合液C中に浸漬して、エマルジョン状態の混合液Cにて
ワークを前洗浄(超音波洗浄)し、この液中から引き上
げたワークを蒸気層Dに位置させて、この第1溶剤Aの
蒸気にてワークに付着した第2溶剤Bを蒸気洗浄し、第
2溶剤Bが本洗浄部2へ持込まれる量を低減させる。
In the pre-cleaning section 1, the work is immersed in the mixed solution C of the pre-cleaning tank 5, the work is pre-cleaned (ultrasonic cleaning) with the mixed solution C in an emulsion state, and the work is pulled up from the liquid. The work is positioned in the vapor layer D, and the second solvent B attached to the work is vapor-cleaned with the vapor of the first solvent A, so that the amount of the second solvent B brought into the main cleaning section 2 is reduced.

【0027】一方、前述の本洗浄部2は次の如く構成し
ている。すなわち、この本洗浄部2は上面が開放された
ワーク出入用の開口部17を設けたタンク本体18に蒸
留槽19、セパレータ分離タンク20、煮沸槽21(第
2洗浄槽)、超音波槽22(第3洗浄槽)、蒸気槽2
3、水分離槽24を形成している。
On the other hand, the above-mentioned main cleaning section 2 is configured as follows. That is, the main cleaning unit 2 includes a distillation tank 19, a separator separation tank 20, a boiling tank 21 (second cleaning tank), an ultrasonic tank 22, (Third washing tank), steam tank 2
3. A water separation tank 24 is formed.

【0028】上述の開口部17の外周には冷凍機16に
接続された冷却ジャケット25を配設し、この冷却ジャ
ケット25はそのコイルを1本以上再生液a中に漬ける
ように構成し、これにより冷却ジャケットコイル面積と
溶剤で冷却面積の増加を図り、また冷却管表面温度に変
動が発生しても溶剤を冷却させることで、一定な冷却効
果を確保すべく構成している。
A cooling jacket 25 connected to the refrigerator 16 is provided on the outer periphery of the opening 17, and the cooling jacket 25 is configured so that one or more coils thereof are immersed in the regenerating solution a. Thus, the cooling area is increased by the cooling jacket coil area and the solvent, and the solvent is cooled even if the surface temperature of the cooling pipe fluctuates, so that a constant cooling effect is ensured.

【0029】また上述の開口部17前方(図示右方)の
冷却領域26と、水分離槽24の液中とに冷却コイル2
7,28を配設し、これら両コイル27,28を上述の
冷凍機16に接続している。ここで、冷却コイルを10
℃以下、冷却ジャケットを15℃以下に冷却するために
冷凍機16としては中低温タイプのものを用いること
で、上記冷却温度を達成することができ、またチラーや
ブラインチラーで冷凍能力を補助してもよい。本洗浄槽
を構成する煮沸槽21と超音波槽22とのうち、煮沸槽
21は次のように構成している。
The cooling coil 2 is provided between the cooling area 26 in front of the opening 17 (right side in the figure) and the liquid in the water separation tank 24.
7 and 28 are disposed, and these coils 27 and 28 are connected to the refrigerator 16 described above. Here, the cooling coil is set to 10
In order to cool the cooling jacket to 15 ° C. or lower, the above-mentioned cooling temperature can be achieved by using a medium-low temperature type as the refrigerator 16, and the refrigeration capacity is assisted by a chiller or a blusher. You may. Of the boiling tank 21 and the ultrasonic tank 22 constituting the main cleaning tank, the boiling tank 21 is configured as follows.

【0030】つまり、この煮沸槽21には第1溶剤Aを
単体にて貯溜すると共に、この第1溶剤Aを加熱する加
熱手段としてのヒータ29を取付けて、第1溶剤Aとし
てHFE(ハイドロ・フルオロ・エーテル)を用いる場
合にはこの溶剤をその沸点としての60℃に加熱すべく
構成している。
That is, the first solvent A is stored in the boiling tank 21 alone, and a heater 29 as a heating means for heating the first solvent A is attached. When (fluoroether) is used, the solvent is heated to 60 ° C. as its boiling point.

【0031】この煮沸槽21は前洗浄済みのワークを本
洗浄し、このワークに付着した混合液C中の第2溶剤B
の残余分を完全に洗い取り、超音波槽22への持込みを
完全に防止する。また、この煮沸槽21に対してワーク
に付着した混合液Cの第2溶剤Bに含まれた汚れが持込
まれてきた時、セパレータ分離タンク20を介して蒸留
槽19へ送込み(オーバフロー)、煮沸槽21の溶剤濃
度を一定に保つ。
The boiling tank 21 is used for main cleaning of the pre-cleaned work, and the second solvent B in the mixed liquid C adhered to the work.
Is completely washed away, and carry-in to the ultrasonic bath 22 is completely prevented. Further, when dirt contained in the second solvent B of the mixed liquid C adhered to the work is brought into the boiling tank 21, the dirt is sent to the distillation tank 19 via the separator separation tank 20 (overflow). The solvent concentration in the boiling tank 21 is kept constant.

【0032】上述の煮沸槽21と蒸留槽19との間に介
設されたセパレータ分離タンク20は仕切板30と冷却
コイル31とを有し第1溶剤A異を冷却コイル31で冷
却(第1溶剤AとしてHFEを用いる場合には55℃以
下に冷却)することにより、第1溶剤Aと汚れを含んだ
第2溶剤Bとを温度差を持たせることで、各溶剤の特性
を利用して分離し、分離した第1溶剤Aと汚れを含んだ
第2溶剤Bとを蒸留槽19に送り込む(オーバフロ
ー)。
The separator separation tank 20 interposed between the boiling tank 21 and the distillation tank 19 has a partition plate 30 and a cooling coil 31, and the first solvent A is cooled by the cooling coil 31 (the first solvent A). When HFE is used as the solvent A, the temperature of the first solvent A and the second solvent B containing dirt are reduced by cooling to 55 ° C. or lower, and the characteristics of each solvent are utilized. The separated first solvent A and the second solvent B containing dirt are sent to the distillation tank 19 (overflow).

【0033】本洗浄槽としての煮沸槽21にセパレータ
分離タンク20を介して隣設された蒸留槽19はヒータ
32を備え、溶剤を蒸留再生する。なお再生された液a
は冷却ジャケット25にて冷却再生された後に、リター
ン経路33,34を介して蒸気層23、超音波槽22に
送り込まれる。ここで上述のリターン経路33には電磁
開閉弁(図示せず)が介設されている。
The distillation tank 19 provided adjacent to the boiling tank 21 as the main cleaning tank via the separator separation tank 20 is provided with a heater 32 for regenerating the solvent by distillation. Regenerated liquid a
After being cooled and regenerated in the cooling jacket 25, it is sent into the vapor layer 23 and the ultrasonic tank 22 via the return paths 33 and 34. Here, an electromagnetic on-off valve (not shown) is interposed in the return path 33 described above.

【0034】また上述の超音波槽22はその内部に第1
溶剤Aの単体を貯溜すると共に、超音波振動子35とヒ
ータ36(加熱手段)とを備えている。上述のヒータ3
6で第1溶剤A(例えばHFEを用いる)を30〜45
℃に温度保持し、最も超音波効果が得られる温度条件下
にてワークを仕上げ洗浄する。
The above-described ultrasonic bath 22 has a first
An ultrasonic vibrator 35 and a heater 36 (heating means) are provided while storing the solvent A alone. The above heater 3
In step 6, the first solvent A (for example, using HFE) is changed to 30 to 45.
The temperature is maintained at ° C., and the work is finish-cleaned under the temperature condition at which the ultrasonic effect is most obtained.

【0035】この超音波槽22には、冷却コイル28を
有する水分離槽24で冷却、水分離された後の溶剤が還
流されてくるので、同槽22の液温を一定(35℃以
下)に保ち、その液温上昇を防止することができる。つ
まり、煮沸槽21、蒸留槽19、蒸気槽23で加熱され
た第1溶剤Aの蒸気により超音波槽22の液温が過熱さ
れるのを防止する。
Since the solvent after cooling and water separation in the water separation tank 24 having the cooling coil 28 is refluxed in the ultrasonic tank 22, the liquid temperature in the tank 22 is kept constant (35 ° C. or lower). To prevent the liquid temperature from rising. That is, the liquid temperature of the ultrasonic bath 22 is prevented from being overheated by the vapor of the first solvent A heated in the boiling bath 21, the distillation bath 19, and the steam bath 23.

【0036】さらに、上述の超音波槽22には、ポンプ
37、フィルタ38、熱交換器39等を備えた循環手段
40を付設して、ポンプ37で超音波槽22内の第1溶
剤Aを循環すべく構成している。ここで、上述の熱交換
器39は冷凍機16に接続される一方、ポンプ37,1
0のシール部分にはPTFE(4フッ化エチレン樹脂)
を用いて、その耐溶剤性向上を図っている。
Further, a circulation means 40 having a pump 37, a filter 38, a heat exchanger 39 and the like is attached to the above-mentioned ultrasonic bath 22, and the first solvent A in the ultrasonic bath 22 is pumped by the pump 37. It is configured to circulate. Here, the above-described heat exchanger 39 is connected to the refrigerator 16 while the pumps 37 and 1 are connected.
PTFE (tetrafluoroethylene resin) in the seal part of 0
Is used to improve the solvent resistance.

【0037】一方、上述の蒸気槽23はヒータ41(加
熱手段)を備え、リターン経路33から還流されてくる
液化再生後の第1溶剤Aの再生液を再度加熱して、炭化
水素系溶剤などの油分が一切含まれていないクリーンな
蒸気を発生させて、蒸気層Eを形成し、蒸気洗浄により
仕上げ洗浄を行なうものである。第1溶剤AとしてHF
E(ハイドロ・フルオロ・エーテル)を用いる場合に
は、蒸気槽23の第1溶剤60℃(沸点)に加熱し、超
音波槽22の液温との間に30℃近い温度差をつける。
On the other hand, the above-mentioned steam tank 23 is provided with a heater 41 (heating means), and reheats the regenerated liquid of the first solvent A after liquefaction and recirculation, which is refluxed from the return path 33, so that a hydrocarbon solvent or the like A clean steam containing no oil is generated to form a steam layer E, and finish washing is performed by steam washing. HF as the first solvent A
When E (hydro-fluoro-ether) is used, the first solvent in the steam tank 23 is heated to 60 ° C. (boiling point), and a temperature difference of about 30 ° C. is made between the first solvent and the liquid temperature in the ultrasonic tank 22.

【0038】上述の水分離槽24は冷却コイル28およ
び仕切板42を備え、冷却ジャケット25で冷却した溶
剤と、蒸気層Eの蒸気を冷却コイル28で冷却再生した
液を貯溜し、空気中の水分と第1溶剤Aとを分離させ
る。水分離槽24にたまった溶剤Aを冷却コイル28に
て0℃〜35℃に強制冷却し、この再成分離した溶剤A
をリターン経路34を介して超音波槽22に送り、この
超音波槽22の温度保持および清浄度を維持させる。
The above-mentioned water separation tank 24 is provided with a cooling coil 28 and a partition plate 42, and stores a solvent cooled by the cooling jacket 25 and a liquid obtained by cooling and regenerating the vapor of the vapor layer E by the cooling coil 28. The water and the first solvent A are separated. The solvent A accumulated in the water separation tank 24 is forcibly cooled to 0 ° C. to 35 ° C. by the cooling coil 28, and the regenerated and separated solvent A
Is sent to the ultrasonic bath 22 via the return path 34 to maintain the temperature of the ultrasonic bath 22 and maintain the cleanliness thereof.

【0039】また蒸気槽23の液面管理によりリターン
経路33の電磁開閉弁(図示せず)で再生液を蒸気槽2
3に定量供給して、清浄度の高い蒸気(蒸気層E参照)
を発生すべく構成している。上述の第1溶剤Aとしては
例えばHFE(ハイドロ・フルオロ・エーテル)を用
い、第2溶剤Bとしては例えばHC(ハイドロカーボ
ン)を用いるので、これらの物性を以下に列記する。
Also, by controlling the liquid level in the steam tank 23, the regenerated liquid is supplied to the steam tank 2 by an electromagnetic on-off valve (not shown) in the return path 33.
3 Cleanly supplied steam with high cleanliness (see Steam layer E)
Is configured to occur. For example, HFE (hydro-fluoro-ether) is used as the first solvent A and HC (hydrocarbon) is used as the second solvent B, and their physical properties are listed below.

【0040】HFEの物性 化学式………C4 9 OCH3 沸 点………60℃ 表面張力……13.6dynes/cm 比 熱………0.28cal/g/℃ 引火点………なし 密 度………1.52g/ml VOC………なし HCの物性 比 重………0.816 沸 点………100℃以上 アニリン点…67℃ 流動点………マイナス60℃以下 図示実施例は上記の如く構成するものにして以下作用を
説明する。
Physical properties of HFE Chemical formula: C 4 F 9 OCH 3 Boiling point: 60 ° C. Surface tension: 13.6 dynes / cm Specific heat: 0.28 cal / g / ° C. Flash point: None Density: 1.52 g / ml VOC: None Property of HC Specific gravity: 0.816 Boiling point: 100 ° C or higher Aniline point: 67 ° C Pour point: -60 ° C or lower The example is configured as described above and the operation will be described below.

【0041】ワークを洗浄するには、まず該ワークを前
洗浄部1の前洗浄槽5における混合液c中に浸漬して、
前洗浄する。前洗浄後のワークを蒸気層Cまで引き上
げ、ここで第1溶剤Aの蒸気にてワークに付着した第2
溶剤Bを蒸気洗浄し、この第2溶剤Bが本洗浄部2へ持
込まれるのを低減する。
In order to clean the work, the work is first immersed in the mixed solution c in the pre-cleaning tank 5 of the pre-cleaning section 1 and
Pre-clean. The work after pre-cleaning is pulled up to the vapor layer C, where the second solvent A adhered to the work with the vapor of the first solvent A.
The solvent B is subjected to steam cleaning to reduce the second solvent B from being carried into the main cleaning section 2.

【0042】このようにして前洗浄、蒸気洗浄が終了し
たワークを本洗浄部2へ搬送し、このワークをまず煮沸
槽21の第1溶剤A中に浸漬して、ワークに付着した第
2溶剤Bの残余分を完全に洗い取り、次段の超音波槽2
2への持込みを完全に防止する。
The work which has been subjected to the pre-cleaning and the steam cleaning as described above is conveyed to the main cleaning section 2, and the work is first immersed in the first solvent A of the boiling tank 21 so that the second solvent adhered to the work is removed. Completely wash the residue of B, and use the next ultrasonic bath 2
2 is completely prevented.

【0043】次に煮沸槽21からワークを蒸気層Eに引
き上げて、ワークをクリーンな蒸気にて蒸気洗浄した後
に、上述のワークを超音波槽22の第1溶剤A中に浸漬
して、超音波エネルギを利用して仕上げ洗浄する。仕上
げ洗浄後のワークをその直上の蒸気層E、並びに蒸気槽
23直上の蒸気層Eにて蒸気洗浄する。なお、このよう
にして一連の洗浄が完了したワークはワーク出入用の開
口部17から取り出されて、次工程へ搬送される。
Next, the work is pulled up from the boiling tank 21 to the vapor layer E, and the work is steam-cleaned with clean steam. Then, the above-mentioned work is immersed in the first solvent A of the ultrasonic bath 22, Finish cleaning using sonic energy. The work after the finish cleaning is subjected to steam cleaning in the vapor layer E immediately above and the vapor layer E immediately above the vapor tank 23. The work that has undergone a series of cleaning operations in this manner is taken out of the work entrance / exit opening 17 and transported to the next process.

【0044】このように、第1溶剤A(HFC、HFE
またはフッ素系溶剤など)と、第2溶剤B(炭化水素系
溶剤もしくはアルコールまたは双方の溶剤)とを混合貯
溜した前洗浄槽5の液面上部に第1溶剤Aの蒸気層Dを
形成したので、ワークを前洗浄槽5から本洗浄部2へ移
動させる時、ワーク表面に付着している第2溶剤Bを第
1溶剤Aの蒸気で除去(蒸気洗浄)して、第2溶剤Bが
本洗浄部2へ持込まれる量を低減させることができるの
は勿論である。しかも第1溶剤Aを貯溜した本洗浄部2
と、この第1溶剤Aの液面上部に第1溶剤Aの蒸気層E
を形成する蒸気槽23とを設けたので、クリーンな蒸気
にてワークを蒸気洗浄し、ワークの充分な洗浄品質を確
保することができる効果がある。
As described above, the first solvent A (HFC, HFE
Since a vapor layer D of the first solvent A was formed above the liquid surface of the pre-cleaning tank 5 in which the second solvent B (hydrocarbon solvent or alcohol or both solvents) was mixed and stored. When the work is moved from the pre-cleaning tank 5 to the main cleaning section 2, the second solvent B adhering to the work surface is removed with the vapor of the first solvent A (steam cleaning), and the second solvent B Of course, the amount brought into the cleaning unit 2 can be reduced. Moreover, the main cleaning section 2 storing the first solvent A
And a vapor layer E of the first solvent A above the liquid surface of the first solvent A.
Is provided, the work is steam-cleaned with clean steam, and there is an effect that sufficient cleaning quality of the work can be ensured.

【0045】また、本洗浄部2の開口部周辺に設けられ
た冷却手段(冷却ジャケット25、冷却コイル27参
照)で溶剤蒸気を再生液化し、かつ水分離後の再生液を
超音波槽22へ還流するので、超音波槽22の清浄度を
保つことができると共に、この超音波槽22の液温が上
昇するのを防止することができる効果がある。
The solvent vapor is regenerated and liquefied by cooling means (see cooling jacket 25 and cooling coil 27) provided around the opening of the main washing section 2, and the regenerated liquid after water separation is transferred to the ultrasonic bath 22. Because of the reflux, there is an effect that the cleanliness of the ultrasonic bath 22 can be maintained and that the liquid temperature of the ultrasonic bath 22 can be prevented from rising.

【0046】さらに、本洗浄槽を構成する煮沸槽21と
蒸留槽19との間に分離槽(セパレータ分離タンク20
参照)を設けたので、このタンク20内の液体を冷却す
ると、第1溶剤Aと、汚れを含んだ第2溶剤Bとを温度
差により分離することができる効果がある。
Further, a separation tank (separator separation tank 20) is provided between the boiling tank 21 and the distillation tank 19 constituting the main cleaning tank.
Therefore, when the liquid in the tank 20 is cooled, the first solvent A and the second solvent B containing dirt can be separated by a temperature difference.

【0047】図2、図3は洗浄装置の他の実施例を示
し、先の図1の実施例においては超音波槽22の前方
(ワーク進行方向の前方)に蒸気槽23を設けたが、こ
の図2、図3に示す実施例においては本洗浄槽を構成す
る煮沸槽21の側方に蒸気槽23を離間形成し、開口部
43を介してクリーンな蒸気を蒸気層Eに供給すべく構
成している。
FIGS. 2 and 3 show another embodiment of the cleaning apparatus. In the embodiment shown in FIG. 1, the steam tank 23 is provided in front of the ultrasonic bath 22 (in front of the workpiece moving direction). In the embodiment shown in FIGS. 2 and 3, a steam tank 23 is formed separately from the boiling tank 21 constituting the main cleaning tank, and clean steam is supplied to the steam layer E through the opening 43. Make up.

【0048】このように、上述の蒸気槽23(図3参
照)を本洗浄槽を構成する煮沸槽21の側方に設ける
と、本洗浄部2の上面開放構造のワーク出入口用の開口
部17の面積を小さくして、時間当りの溶剤消費量低減
を図ることができる効果がある。
As described above, when the above-described steam tank 23 (see FIG. 3) is provided on the side of the boiling tank 21 constituting the main cleaning tank, the opening 17 for the work entrance of the main cleaning section 2 having an open top surface structure is provided. Has the effect that the area of the solvent can be reduced to reduce the amount of solvent consumption per unit time.

【0049】ここで、上述の蒸気槽23は煮沸槽21の
側方に代えて、超音波槽22の側方に設けてもよいこと
は勿論である。なお、その他の点に付いては先の実施例
とほぼ同様の作用、効果を奏するので、図2、図3にお
いて前図と同一の部分には同一符号を付して、その詳し
い説明を省略するが、図2において44はリターン経路
33に介設された電磁開閉弁であって、このリターン経
路33のポイント45は図3にポイント45に連通接続
される。
Here, the above-described steam tank 23 may be provided on the side of the ultrasonic tank 22 instead of the side of the boiling tank 21. Since the other points have substantially the same functions and effects as those of the previous embodiment, the same reference numerals are given to the same parts in FIGS. 2 and 3 as those in the previous figures, and detailed description thereof is omitted. However, in FIG. 2, reference numeral 44 denotes an electromagnetic on-off valve interposed in the return path 33, and a point 45 of the return path 33 is connected to a point 45 in FIG.

【0050】図4、図5は洗浄装置のさらに他の実施例
を示し、先の図2、図3の実施例の構成に加えて、この
図4、図5に示す実施例では、本洗浄部2における蒸留
槽19の上方に蒸気導出路46と冷却チャンバ47とを
形成すると共に、逆L字状の仕切板48および立設状の
仕切板49を有する液受部50を形成している。この液
受部50は蒸留槽19に対して再生量を確保するための
空間を隔てて形成されている。
FIGS. 4 and 5 show still another embodiment of the cleaning apparatus. In the embodiment shown in FIGS. 4 and 5, in addition to the configuration of the embodiment shown in FIGS. A vapor outlet channel 46 and a cooling chamber 47 are formed above the distillation tank 19 in the section 2, and a liquid receiving section 50 having an inverted L-shaped partition plate 48 and an upright partition plate 49 is formed. . The liquid receiving portion 50 is formed with a space for ensuring a regeneration amount with respect to the distillation tank 19.

【0051】而して、この液受部50には前述の冷凍機
16に接続された冷却コイル51を配設し、この冷却コ
イル51の一部分を再生液a中に漬けるように構成し、
これにより冷却コイル51面積と溶剤で冷却面積の増加
を図り、また冷却管表面温度に変動が発生しても溶剤を
冷却させることで、一定な冷却効果を確保すべく構成し
ている。
The liquid receiving portion 50 is provided with a cooling coil 51 connected to the refrigerator 16 described above, and a part of the cooling coil 51 is soaked in the regenerating liquid a.
Thus, the cooling area is increased by the area of the cooling coil 51 and the solvent, and even when the surface temperature of the cooling pipe fluctuates, the solvent is cooled to ensure a constant cooling effect.

【0052】また上述の各仕切板48,49により図示
右側の液受室は蒸気と完全に液封されている。特に第1
溶剤AとしてHFEを用いると、この溶剤は洗浄能力に
優れる反面、汚れやミストを保有した状態のままで蒸気
になる可能性が高く、これを防止するために上述の液封
構造を採用している。
Further, the liquid receiving chamber on the right side in the figure is completely liquid-sealed with steam by the above-mentioned respective partition plates 48 and 49. Especially the first
When HFE is used as the solvent A, this solvent is excellent in cleaning ability, but is likely to become a vapor in a state in which dirt and mist are retained. In order to prevent this, the above-mentioned liquid sealing structure is employed. I have.

【0053】而して、上述の冷却コイル51により凝縮
液化した再生液aを斯る液封構造により汚れ、ミストの
侵入を完全に防止し、液受部50の図示右側の液受室か
らリターン経路52,53を介して煮沸槽21および蒸
気槽23に再生液aを還流すべく構成している。なお、
図4のポイント54は図5のポイント54に連通接続さ
れる。
Thus, the regenerating liquid a condensed and liquefied by the cooling coil 51 is contaminated by the liquid-sealing structure to completely prevent mist from entering, and return from the liquid receiving chamber on the right side of the liquid receiving section 50 in the drawing. The regenerating solution a is configured to be recirculated to the boiling tank 21 and the steam tank 23 via the paths 52 and 53. In addition,
The point 54 in FIG. 4 is communicatively connected to the point 54 in FIG.

【0054】このように、本洗浄部2に蒸留槽19を隣
設し、この蒸留槽19の上方に冷却手段(冷却コイル5
1参照)と液受部50とを設けて、蒸留された第1溶剤
Aを凝縮再生すべく構成したので、凝縮再生により蒸気
中のミスト分離を行なうことができる効果がある。
As described above, the distillation tank 19 is provided adjacent to the main washing section 2, and the cooling means (the cooling coil 5) is provided above the distillation tank 19.
1) and the liquid receiving portion 50 are provided to condense and regenerate the distilled first solvent A. Therefore, there is an effect that the mist in the vapor can be separated by the condensing and regenerating.

【0055】なお、その他の点については先の実施例と
ほぼ同様の作用、効果を奏するので、図4、図5におい
て前図と同一の部分には同一符号を付して、その詳しい
説明を省略するが、この図4、図5の実施例にあっても
上述の蒸気槽23は煮沸槽21の側方に代えて、超音波
槽22の側方に設けてもよいことは勿論である。
In other respects, the operation and effects are substantially the same as those of the previous embodiment. Therefore, in FIGS. 4 and 5, the same parts as those in the previous figures are denoted by the same reference numerals, and detailed description thereof will be given. Although omitted, in the embodiment of FIGS. 4 and 5, the above-described steam tank 23 may be provided on the side of the ultrasonic tank 22 instead of the side of the boiling tank 21. .

【0056】この発明の構成と、上述の実施例との対応
において、この発明の本洗浄槽は、実施例の煮沸槽2
1、超音波槽22に対応し、以下同様に、請求項3記載
の冷却手段は、冷却ジャケット25、冷却コイル27に
対応し、請求項4記載の冷却手段は、冷却コイル51に
対応し、分離槽は、セパレータ分離タンク20に対応
し、この発明は、上述の実施例の構成のみに限定される
ものではない。
In correspondence with the configuration of the present invention and the above-described embodiment, the present cleaning tank of the present invention is different from the boiling tank 2 of the embodiment.
1, the cooling means according to claim 3 corresponds to the cooling jacket 25 and the cooling coil 27, and the cooling means according to claim 4 corresponds to the cooling coil 51, and so on. The separation tank corresponds to the separator separation tank 20, and the present invention is not limited to the configuration of the above-described embodiment.

【0057】例えば上述の前洗浄槽5、煮沸槽21、超
音波槽22を複数槽構成と成してもよく、本洗浄槽を構
成するタンク21,22は何れか一方のみとしてもよ
い。また溶剤については実施例で開示したHFE、HC
に限定されるものではなく、第1溶剤としてはHFC、
HFEまたはフッ素系不活性溶剤、フッ素系溶剤を用い
ることができ、第2溶剤としては炭化水素系溶剤もしく
はアルコールまたは双方を用いることができる。
For example, the pre-cleaning tank 5, the boiling tank 21, and the ultrasonic tank 22 may be configured in a plurality of tanks, and only one of the tanks 21 and 22 constituting the main cleaning tank may be configured. As for the solvent, HFE and HC disclosed in the examples are used.
The first solvent is not limited to HFC,
HFE, a fluorine-based inert solvent, or a fluorine-based solvent can be used. As the second solvent, a hydrocarbon-based solvent, an alcohol, or both can be used.

【図面の簡単な説明】[Brief description of the drawings]

【図1】 本発明の洗浄装置を示す系統図。FIG. 1 is a system diagram showing a cleaning device of the present invention.

【図2】 洗浄装置の他の実施例を示す断面図。FIG. 2 is a sectional view showing another embodiment of the cleaning device.

【図3】 図2のP−P線矢視断面図。FIG. 3 is a sectional view taken along line PP of FIG. 2;

【図4】 洗浄装置のさらに他の実施例を示す断面図。FIG. 4 is a sectional view showing still another embodiment of the cleaning apparatus.

【図5】 図4のQ−Q線矢視断面図。FIG. 5 is a sectional view taken along line QQ of FIG. 4;

【図6】 従来の洗浄装置を示す断面図。FIG. 6 is a sectional view showing a conventional cleaning device.

【符号の説明】[Explanation of symbols]

A…第1溶剤 D,E…蒸気層 1…前洗浄部 5…前洗浄槽 17…開口部 19…蒸留槽 20…セパレータ分離タンク 21…煮沸槽 22…超音波槽 23…蒸気槽 25…冷却ジャケット 27…冷却コイル 50…液受部 51…冷却コイル A: first solvent D, E: vapor layer 1 ... pre-cleaning section 5 ... pre-cleaning tank 17 ... opening 19 ... distillation tank 20 ... separator separation tank 21 ... boiling tank 22 ... ultrasonic tank 23 ... steam tank 25 ... cooling Jacket 27 Cooling coil 50 Liquid receiver 51 Cooling coil

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】HFC、HFEまたはフッ素系溶剤などの
第1溶剤と、炭化水素系溶剤もしくはアルコールまたは
双方の第2溶剤とを混合貯溜した前洗浄槽の液面上部に
第1溶剤の蒸気層が形成されてなる前洗浄部と、第1溶
剤を貯溜した本洗浄槽と、該本洗浄槽の液面上部に第1
溶剤の蒸気層を形成する蒸気槽とを備えた洗浄装置。
A vapor layer of a first solvent is provided above a liquid level of a pre-cleaning tank in which a first solvent such as HFC, HFE or a fluorine-based solvent is mixed and stored with a hydrocarbon-based solvent or an alcohol or both of them. A main cleaning tank in which a first solvent is stored, and a first cleaning tank on a liquid level of the main cleaning tank.
A cleaning apparatus comprising: a vapor tank for forming a vapor layer of a solvent.
【請求項2】上記蒸気槽は本洗浄槽を構成する煮沸槽ま
たは超音波槽の側方に設けられた請求項1記載の洗浄装
置。
2. The cleaning apparatus according to claim 1, wherein the steam tank is provided on a side of a boiling tank or an ultrasonic tank constituting the main cleaning tank.
【請求項3】上面が開放された本洗浄槽の開口部周辺に
冷却手段を設け、該冷却手段で再生液化した再生液が水
分離された後に、上記超音波槽へ還流されるように構成
した請求項1または2記載の洗浄装置。
3. A cooling means is provided around the opening of the main cleaning tank whose upper surface is open, and the regenerated liquid liquefied by the cooling means is separated into water and then returned to the ultrasonic tank. The cleaning device according to claim 1 or 2, wherein
【請求項4】上記本洗浄装置に蒸留槽を隣設し、蒸留槽
の上方に冷却手段と液受部とを設け、蒸留された溶剤を
凝縮再生する請求項1記載の洗浄装置。
4. The cleaning apparatus according to claim 1, wherein a distillation tank is provided adjacent to the cleaning apparatus, and a cooling means and a liquid receiving section are provided above the distillation tank to condense and regenerate the distilled solvent.
【請求項5】上記本洗浄槽と上記蒸留槽との間に第1溶
剤と、汚れを含んだ第2溶剤とを温度差により分離する
分離槽が設けられた請求項4記載の洗浄装置。
5. The cleaning apparatus according to claim 4, wherein a separation tank is provided between the main cleaning tank and the distillation tank to separate the first solvent and the second solvent containing dirt by a temperature difference.
JP7036697A 1997-03-07 1997-03-07 Washing apparatus Pending JPH10249291A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7036697A JPH10249291A (en) 1997-03-07 1997-03-07 Washing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7036697A JPH10249291A (en) 1997-03-07 1997-03-07 Washing apparatus

Publications (1)

Publication Number Publication Date
JPH10249291A true JPH10249291A (en) 1998-09-22

Family

ID=13429378

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7036697A Pending JPH10249291A (en) 1997-03-07 1997-03-07 Washing apparatus

Country Status (1)

Country Link
JP (1) JPH10249291A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003080180A (en) * 2001-09-10 2003-03-18 Asahi Kasei Corp Washing method and washing device
JP2010279866A (en) * 2009-06-03 2010-12-16 Ask Corp Hydro-extraction drying system
CN114449779A (en) * 2020-10-30 2022-05-06 北京铁路信号有限公司 Cleaning device
CN114449779B (en) * 2020-10-30 2024-05-31 北京铁路信号有限公司 Cleaning device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003080180A (en) * 2001-09-10 2003-03-18 Asahi Kasei Corp Washing method and washing device
JP2010279866A (en) * 2009-06-03 2010-12-16 Ask Corp Hydro-extraction drying system
CN114449779A (en) * 2020-10-30 2022-05-06 北京铁路信号有限公司 Cleaning device
CN114449779B (en) * 2020-10-30 2024-05-31 北京铁路信号有限公司 Cleaning device

Similar Documents

Publication Publication Date Title
WO2009110548A1 (en) Method and system for washing electronic component
WO2009110549A1 (en) Method and system for washing electronic component
JPH10249291A (en) Washing apparatus
JPS62183804A (en) Method for replenishing and/or regenerating treatment liquid
JP2002210424A (en) Apparatus for cleaning filter
US5402806A (en) Cleaning apparatus having a partitioned boil sump
JPH10277507A (en) Washing apparatus
JPH10202209A (en) Cleaning device
JP2785923B2 (en) Work cleaning device
US20140048103A1 (en) Method and apparatus for continuous separation of cleaning solvent from rinse fluid in a dual-solvent vapor degreasing system
JPH1071370A (en) Completely hermetic washing apparatus
JP2018015687A (en) Washing device
JP2003305417A (en) Solvent-used cleaning machine
JP3706668B2 (en) Workpiece cleaning device
JP6927827B2 (en) Cleaning equipment
JP2002309390A (en) Apparatus for cleaning electronic filter
JP5415825B2 (en) Drainer
JP2000033348A (en) Parts cleaner
JPH08243515A (en) Washer and method thereof
JP4444892B2 (en) Cleaning device
JPH08155208A (en) Oil film removing device
JP3272400B2 (en) Dry liquid regeneration equipment
JP4122147B2 (en) Separation and regeneration device
JPH10317182A (en) Chloride removing and cleaning device
JP4689084B2 (en) Solvent separator

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20040303

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20060316

A131 Notification of reasons for refusal

Effective date: 20060411

Free format text: JAPANESE INTERMEDIATE CODE: A131

A02 Decision of refusal

Effective date: 20060801

Free format text: JAPANESE INTERMEDIATE CODE: A02