JP2008118065A - Substrate treatment method and substrate treatment device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a device that can perform uniform substrate treatment without causing treatment unevenness and does not damage a coating formed on the substrate when a substrate cleaning process is performed using ice particles. <P>SOLUTION: A device is configured to include a reservoir 12 that stores purified water including ice particles that include micro-bubbles, a bubble generating unit 14 that generates the micro-bubbles in the purified water, an ice forming unit 16 that generates the ice particles in the purified water, a cleaning process unit 10 that performs a cleaning process on a substrate by spraying the ice particles including the micro-bubbles and nitrogen gas to the main surface of a substrate W from a nozzle head pipe 22, and a means of supplying the ice particles including the micro-bubbles from the reservoir 12 to the nozzle head pipe 22. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention relates to a semiconductor wafer, a glass substrate for a liquid crystal display (LCD), a glass substrate for a plasma display (PDP), a glass or ceramic substrate for magnetism or an optical disk, a printed substrate, an electronic device substrate, etc. The present invention relates to a substrate processing method for performing a cleaning process using fine particles, and a substrate processing apparatus used for performing the method.

For example, substrate cleaning in flat panel display (FPD) manufacturing equipment such as LCD and PDP removes organic contaminants by excimer laser UV irradiation, and removes or replaces contaminants of 1 μm or more by scrub cleaning using a roll brush. It is performed in a series of steps such as removal of the chemical solution after cleaning with the chemical solution by cleaning, precision cleaning by two-fluid cleaning, and final cleaning by final water cleaning. However, in a cleaning process using a roll brush, the metal film formed on the surface of the substrate is scratched by the brush, bacteria are generated on the brush, and the pressure on the substrate surface changes due to brush wear. There was a problem that garbage was generated. Therefore, in recent years, instead of roll brush cleaning, ice slurry is prepared in a state where ice fine particles are dispersed in a liquid to form a sherbet-like suspension, and the ice slurry is sprayed from the nozzle onto the surface of the substrate. A cleaning method in which a fine particle of ice collides with a substrate to clean the substrate has also been proposed (see, for example, Patent Document 1).
Japanese Patent No. 3380021 (page 3, FIGS. 1 and 2)

  In the conventional cleaning method using ice slurry, the ice slurry is sprayed from the nozzle onto the surface of the substrate and the fine particles of ice collide with the substrate to rub the surface of the substrate with the fine particles of ice. Needs to pressurize the ice slurry and eject the ice slurry from the nozzle at a certain pressure. However, it is extremely difficult to uniformly disperse a liquid containing solid matter over a wide area of the substrate surface, although it is a minute ice particle, and therefore, when the ice slurry is pressurized and ejected from the nozzle, Depending on the position on the surface of the substrate, the energy is uneven when the ice slurry collides with the surface of the substrate. In particular, when the substrate is enlarged as in recent years, it is necessary to increase the discharge pressure of the ice slurry from the nozzle in order to diffuse the ice slurry over a wider area of the substrate surface. Uniform dispersion on the substrate surface becomes increasingly difficult, and the energy unevenness when the ice slurry collides with the substrate surface increases. As a result, there is a problem that processing unevenness such as cleaning unevenness occurs.

  For example, in the manufacture of LCDs, the metal film for the liquid crystal pattern is formed of a physically soft metal material such as aluminum (Al) or an aluminum alloy, and unevenness of the collision energy between ice particles and the substrate surface is uneven. Therefore, there is a problem that the metal film is partially damaged.

  The present invention has been made in view of the circumstances as described above, and in the case of performing cleaning processing of a substrate using fine particles of ice, it is possible to perform uniform substrate processing without causing processing unevenness. An object of the present invention is to provide a substrate processing method that does not damage a coating such as a metal film formed on the substrate, and a substrate processing apparatus that can suitably carry out the method.

  The invention according to claim 1 is a substrate processing method for processing a substrate using ice fine particles, an ice particle generating step for generating ice fine particles containing ultrafine bubbles, and the ice particle generating step. An ice particle supplying step of supplying ice fine particles together with a fluid to the main surface of the substrate to clean the main surface of the substrate. Here, the ultrafine bubble is a bubble having a diameter of 70 μm to 50 μm or less and generally called a microbubble (hereinafter, “ultrafine bubble” is referred to as “microbubble”), and is relatively long in the liquid. It stays for a period of time and gradually contracts and breaks down, and the internal pressure increases with the contraction and releases energy when extinguished (for example, the energy released by a microbubble having a diameter of 1 μm is about 3 kgf). is there. Bubbles having a diameter larger than 70 μm gradually expand in the liquid, burst in a short time, and disappear near the liquid surface.

  According to a second aspect of the present invention, in the substrate processing method according to the first aspect, the fine particles of ice containing microbubbles are sprayed together with the gas onto the main surface of the substrate in the ice particle supply step.

  According to a third aspect of the present invention, in the substrate processing method according to the first aspect, a processing liquid containing fine particles of ice containing microbubbles is supplied to the main surface of the substrate in the ice particle supplying step. .

  According to a fourth aspect of the present invention, there is provided the substrate processing method according to the third aspect, wherein a processing liquid containing fine particles of ice containing microbubbles is stored in a container, and the processing liquid is relative to the substrate in the container. The main surface of the substrate is brought into contact with the substrate while being fluidized.

  According to a fifth aspect of the present invention, in the substrate processing method according to the fourth aspect, a processing liquid containing fine particles of ice containing microbubbles is continuously supplied into a fixed container and allowed to flow in the container. While discharging from the container, the substrate is carried into the container, conveyed through the container, and carried out of the container.

  According to a sixth aspect of the present invention, there is provided a substrate processing apparatus for processing a substrate using ice fine particles, ice particle generating means for generating ice fine particles containing microbubbles, and ice generated by the ice particle generating means. And an ice particle supply means for supplying the fine particles together with a fluid to the main surface of the substrate to clean the main surface of the substrate.

  The invention according to claim 7 is the substrate processing apparatus according to claim 6, wherein the ice particle supply means is a gas spraying means for spraying ice fine particles containing microbubbles onto the main surface of the substrate together with a gas. It is characterized by that.

  According to an eighth aspect of the present invention, in the substrate processing apparatus of the sixth aspect, the ice particle supplying means supplies a processing liquid containing fine particles of ice containing microbubbles to the main surface of the substrate. It is characterized by being.

  The invention according to claim 9 is the substrate processing apparatus according to claim 8, further comprising: a container for storing a processing liquid containing fine particles of ice containing microbubbles; and a substrate carrying means for carrying the substrate into the container. The processing liquid supply means supplies a processing liquid containing microparticles of ice containing microbubbles into the container, and the processing liquid containing microparticles of ice containing microbubbles is relative to the substrate in the container. In contact with the main surface of the substrate while flowing.

  According to a tenth aspect of the present invention, in the substrate processing apparatus according to the ninth aspect, the container includes a slit-shaped substrate carry-in port, a slit-shaped substrate carry-out port, and a supply port and a discharge port for a treatment liquid containing fine particles of ice. It is characterized by being a sealed rectangular housing having

  The invention according to an eleventh aspect is the substrate processing apparatus according to the ninth or tenth aspect, wherein the container is fixed, and the processing liquid supply means supplies the processing liquid containing fine particles of ice containing microbubbles. A processing liquid distribution means for continuously supplying the liquid into the container, causing the liquid to flow in the container and discharging the liquid from the container, wherein the substrate carrying-in means carries the substrate into the container and conveys the inside of the container from the inside of the container. It is a board | substrate conveyance means to carry out, It is characterized by the above-mentioned.

  A twelfth aspect of the present invention is the substrate processing apparatus according to any one of the sixth to eleventh aspects, wherein the ice particle generating means stores a liquid containing fine particles of ice containing microbubbles. And a liquid inflow port connected to the first liquid outlet of the liquid storage tank and a liquid outflow port connected to the first liquid inlet of the liquid storage tank, and the liquid storage tank A bubble generating means that circulates a liquid between the liquid storage tank, pressurizes the liquid flowing from the liquid storage tank through the liquid inlet, and dissolves a gas in the liquid to generate microbubbles in the liquid; and the liquid storage A liquid inlet connected to the second liquid outlet of the tank and a liquid outlet connected to the second liquid inlet of the liquid storage tank and a liquid outlet connected to the liquid storage tank; Circulate to cool the liquid flowing from the liquid storage tank through the liquid inlet and Generates a child, characterized in that it is constituted by a ice means for returning to said reservoir a liquid containing fine particles of ice that is generated by flowing out of the liquid outlet.

According to the substrate processing method of the first aspect of the present invention, the fine particles of ice containing microbubbles are supplied to the main surface of the substrate together with the fluid, so that the contaminants such as particles present in the recesses on the surface of the substrate become ice. The particles are scraped by the fine particles, and the contaminants flow out of the main surface of the substrate together with the fluid to be removed. And since the microbubbles are contained in the fine particles of ice, when the fine particles of ice are dissolved on the main surface of the substrate, the microbubbles contained in the fine particles of ice are destroyed and disappeared Due to the energy released to the substrate, the cleaning effect of the substrate is enhanced. For this reason, it is not necessary to remove contaminants from the substrate by the force with which the ice particles collide with the main surface of the substrate. Therefore, it is necessary to press the ice particles to a high pressure together with the fluid to be ejected to the main surface of the substrate. No. In addition, since the fine particles of ice contain microbubbles therein, they are softer than ordinary fine particles of ice that do not contain bubbles such as microbubbles. For this reason, for example, when ice fine particles are ejected from a nozzle together with a pressurized fluid, even if there is some unevenness in energy when the ice fine particles collide with the surface of the substrate depending on the position on the surface of the substrate. For example, the metal film for the liquid crystal pattern is prevented from being partially damaged.
Therefore, when used in the substrate processing method according to the first aspect of the present invention, uniform substrate processing can be performed without causing processing unevenness, and a film such as a metal film formed on the substrate is damaged. There is nothing.

  In the substrate processing method according to the second aspect of the present invention, the above-described effects of the first aspect of the present invention can be achieved by spraying fine particles of ice containing microbubbles together with the gas onto the main surface of the substrate.

  In the substrate processing method according to the third aspect of the present invention, the processing liquid containing fine particles of ice containing microbubbles is supplied to the main surface of the substrate, so that the above-described effect of the first aspect of the present invention is achieved. .

In the substrate processing method according to the fourth aspect of the present invention, the processing liquid containing fine particles of ice containing microbubbles in the container is in contact with the main surface of the substrate while flowing relatively to the substrate. Contaminants such as particles present in the recesses are scraped out by the fine particles of ice, and the contaminants flow out of the main surface of the substrate together with the processing liquid and are removed.
When the fine particles of ice in the treatment liquid are dissolved, the microbubbles contained in the fine particles of ice are released into the treatment liquid. For example, the microbubbles pass through the treatment liquid containing fine particles of ice. When the substrate cleaning process is performed while the substrate is being transported, the microbubbles released into the processing liquid around the substrate even if the ice particles around the substrate are dissolved and then try to freeze again around the substrate. Thus, re-freezing is prevented by the gas layer generated around the substrate. Therefore, the transport of the substrate is not hindered by re-freezing around the substrate, and the transport of the substrate can be performed stably.

  In the substrate processing method according to the fifth aspect of the present invention, the processing liquid containing the fine particles of ice containing microbubbles is continuously supplied into the container, flows in the container, and is discharged from the container while the substrate is in the container. When the substrate is transported into the container and is transported out of the container, the processing liquid containing the fine particles of ice containing microbubbles flows in the container and comes into contact with the main surface of the substrate to clean the substrate. Processing is performed.

In the substrate processing apparatus according to the sixth aspect of the present invention, ice particles containing microbubbles are generated by the ice particle generation means, and the generated ice particles together with the fluid are transferred to the main surface of the substrate by the ice particle supply means. By being supplied, contaminants such as particles present in the recesses on the substrate surface are scraped out by the fine particles of ice, and the contaminants flow out of the main surface of the substrate together with the fluid and are removed. And since the microbubbles are contained in the fine particles of ice, when the fine particles of ice are dissolved on the main surface of the substrate, the microbubbles contained in the fine particles of ice are destroyed and disappeared Due to the energy released to the substrate, the cleaning effect of the substrate is enhanced. For this reason, it is not necessary to remove contaminants from the substrate by the force with which the ice particles collide with the main surface of the substrate. Therefore, it is necessary to press the ice particles to a high pressure together with the fluid to be ejected to the main surface of the substrate. No. In addition, since the fine particles of ice contain microbubbles therein, they are softer than ordinary fine particles of ice that do not contain bubbles such as microbubbles. For this reason, for example, when ice fine particles are ejected from a nozzle together with a pressurized fluid, even if there is some unevenness in energy when the ice fine particles collide with the surface of the substrate depending on the position on the surface of the substrate. For example, the metal film for the liquid crystal pattern is prevented from being partially damaged.
Therefore, when the substrate processing apparatus of the invention according to claim 6 is used, uniform substrate processing can be performed without causing processing unevenness, and a film such as a metal film formed on the substrate is damaged. There is nothing.

  In the substrate processing apparatus according to the seventh aspect of the present invention, the fine particles of ice containing the microbubbles are sprayed on the main surface of the substrate together with the gas by the gas spraying means. Played.

  In the substrate processing apparatus of the invention according to claim 8, the processing liquid containing fine particles of ice containing microbubbles is supplied to the main surface of the substrate by the processing liquid supply means, whereby the above-described function of the invention according to claim 6 is achieved. An effect is produced.

  In the substrate processing apparatus according to the ninth aspect of the invention, the processing liquid containing ice microparticles containing microbubbles is supplied into the container by the processing liquid supply means, and the substrate is carried into the container by the substrate carrying means. In the container, the processing liquid containing fine particles of ice containing microbubbles is in contact with the main surface of the substrate while flowing relatively to the substrate, so that contaminants such as particles present in the recesses on the surface of the substrate are removed. Scattered by the fine particles of ice, the contaminants flow out of the main surface of the substrate together with the processing liquid and are removed.

  In the substrate processing apparatus of the invention according to claim 10, the processing liquid containing ice microparticles containing microbubbles is supplied into the sealed rectangular casing through the supply port, so that the processing liquid containing ice microparticles is rectangular. The fine particles of ice containing microbubbles in the rectangular housing by being loaded into the rectangular housing filled with the processing liquid containing fine particles of ice through the slit-shaped substrate carry-in port. The substrate cleaning process is performed by contacting the main surface of the substrate while the processing liquid containing the fluid flows. Then, the used processing liquid is discharged from the rectangular housing through the discharge port, and the substrate after the cleaning process is unloaded from the rectangular housing through the slit-shaped substrate unloading port.

  In the substrate processing apparatus of the invention according to claim 11, the processing liquid containing fine particles of ice containing microbubbles is continuously supplied into the container by the processing liquid distribution means, flows in the container, and is discharged from the container. At the same time, the substrate is carried into the container by the substrate transport means, transported through the container and unloaded from the container, so that the processing liquid containing fine particles of ice containing microbubbles flows in the container while the main substrate is flowing. The substrate is cleaned in contact with the surface.

  In the substrate processing apparatus of the invention according to claim 12, the processing liquid circulates between the liquid storage tank and the bubble generating means, whereby microbubbles are generated in the processing liquid by the bubble generating means, and the liquid storage tank By circulating the processing liquid between the ice making means, ice fine particles are generated in the processing liquid by the ice making means. And the process liquid containing the microparticles | fine-particles of the ice containing the microbubble is stored in a liquid storage tank.

DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, the best embodiment of the present invention will be described with reference to the drawings.
FIG. 1 is a schematic diagram showing a schematic configuration of a substrate processing apparatus according to an embodiment of the present invention.

  The substrate processing apparatus includes a cleaning processing unit 10 for cleaning a substrate, a liquid storage tank 12 for storing a liquid containing fine particles of ice containing microbubbles, for example, pure water (hereinafter referred to as “ice slurry”), pure water A bubble generating unit 14 for pressurizing water and dissolving a gas such as clean air or oxygen in pure water to generate microbubbles in pure water, and cooling pure water to ice in pure water The ice making unit 16 for generating the fine particles is provided. The cleaning processing unit 10 includes a chamber 18, and a roller conveyor including a plurality of transport rollers 20 for supporting the substrate W and transporting it in a horizontal direction (a direction perpendicular to the paper surface) is disposed in the chamber 18. A nozzle head tube 22 provided with a plurality of nozzles arranged in parallel in the width direction of the substrate W is provided in the transport path of the substrate W.

The liquid storage tank 12 is provided with a first liquid outlet 24 and a first liquid inlet 26. The first liquid outlet 24 of the liquid storage tank 12 is connected to the liquid inlet 28 of the bubble generating unit 14 through a flow path, and the first liquid inlet 26 of the liquid storage tank 12 is connected to the bubble generating unit 14. The liquid outlet 30 is connected to the flow path, and low-temperature pure water is circulated between the liquid storage tank 12 and the bubble generating unit 14. The bubble generating unit 14 is formed with an internal flow path 32, an aspirator 34 is provided in the middle of the internal flow path 32, and a pressure pump 36 is provided upstream of the aspirator 34 in the internal flow path 32. It is inserted. In the bubble generating unit 14, when pure water pressurized to about 9 kgf / cm ² passes through the aspirator, a swirling flow is formed, and gas, for example, clean air is sucked into the swirling flow. The air is crushed in the swirling flow. And the pure water containing the bubble which flowed out from the bubble generation unit 14 spouts into the ice slurry in the liquid storage tank 12 of an atmospheric pressure state, and thereby microbubbles are generated in the pure water. The generated microbubbles stay for several minutes without disappearing in pure water. The method for generating microbubbles in pure water is not limited to the cavitation method using an aspirator, and various methods may be used. The gas that generates microbubbles and is contained in the ice particles of the ice slurry is not limited to air or oxygen, but may be carbon dioxide, ozone, hydrogen peroxide, or the like.

  Further, the liquid storage tank 12 is provided with a second liquid outlet 38 and a second liquid inlet 40. The second liquid outlet 38 of the liquid storage tank 12 is connected to the liquid inlet 42 of the ice making unit 16 and the second liquid inlet 40 of the liquid storage tank 12 is connected to the liquid flow of the ice making unit 16. Low temperature pure water (or ice slurry) is circulated between the liquid storage tank 12 and the ice making unit 16 while being connected to the outlet 44 and the flow path. The ice making unit 16 is provided with a cooler (not shown). Pure water is cooled by the cooler to generate fine particles of ice in the pure water, and the ice slurry is returned to the liquid storage tank 12. It is like that. Various methods may be used as a method of producing ice slurry by generating fine particles of ice in pure water, for example, a method of releasing the supercooling after the pure water is brought into a supercooled state, or containing pure water. What is necessary is just to use the system etc. which cool the wall surface of a container and scrape off the ice which adheres and produced | generated to the inner wall surface with a screw blade.

  As described above, low temperature pure water is circulated between the liquid storage tank 12 and the bubble generating unit 14 to continuously generate microbubbles in the pure water, and the liquid storage tank 12 and the ice making unit 16 By circulating low temperature pure water (or ice slurry) at a temperature of, for example, around −5 ° C., a microbubble-containing ice slurry in which microbubbles are confined in ice particles is generated. The generated microbubble-containing ice slurry is stored in the liquid storage tank 12.

  The liquid storage tank 12 is provided with a liquid outlet 46, and an ice particle supply pipe 48 is connected to the liquid outlet 46. The ice grain supply pipe 48 is connected to the nozzle head pipe 22 of the cleaning processing unit 10, and the microbubble-containing ice slurry is transferred from the liquid storage tank 12 to the nozzle head pipe 22 in the middle of the ice grain supply pipe 48. A pump 50 for feeding is provided. Further, a dehydration processing unit 52 for removing water from the microbubble-containing ice slurry is provided in the middle of the ice particle supply pipe 48. While the microbubble-containing ice slurry passes through the dehydration processing section 52, the liquid portion is reduced or only ice fine particles (solid) containing microbubbles are formed.

  In addition, a carrier fluid, for example, liquefied nitrogen supply tube 54 is connected to the nozzle head tube 22 through a flow path. The liquefied nitrogen is supplied to the nozzle head tube 22 through the liquefied nitrogen supply pipe 54, and ice fine particles containing microbubbles are supplied to the nozzle head pipe 22 through the ice particle supply pipe 48, so that the nozzle head Inside the tube 22, ice particles and liquefied nitrogen are mixed. Then, the mixed fluid is ejected from a plurality of nozzles of the nozzle head tube 22, whereby ice fine particles containing microbubbles are sprayed onto the main surface of the substrate W together with nitrogen gas.

  When performing a substrate cleaning process using the substrate processing apparatus having the above-described configuration, the substrate W is carried into the chamber 18 of the substrate processing unit 12, and the substrate W is horizontally moved by a roller conveyor including a plurality of transfer rollers 20. Transport to. Then, ice fine particles containing microbubbles are sprayed together with nitrogen gas from the plurality of nozzles of the nozzle head tube 22 onto the main surface of the substrate W supported by the roller conveyor and transported in the chamber 18. As a result, contaminants such as particles present in the recesses on the surface of the substrate W are scraped out by the fine particles of ice, and flow out of the main surface of the substrate W together with the melted water and nitrogen gas of the ice particles to be removed. In this way, the substrate W is cleaned. Since the microparticles of ice contain microbubbles, when the ice microparticles are dissolved on the main surface of the substrate W, The cleaning effect of the substrate W is further enhanced by the energy released when the contained microbubbles are destroyed and disappear. In addition, since microbubbles are contained in the ice microparticles, the ice microparticles are softer than ordinary ice microparticles that do not contain bubbles such as microbubbles. Therefore, when ice fine particles are sprayed on the main surface of the substrate W together with nitrogen gas, there is some unevenness in energy when the ice fine particles collide with the surface of the substrate W depending on the position on the surface of the substrate W. However, it is prevented that the coating such as the metal film is partially damaged.

  In the above-described embodiment, the dehydration processing unit 52 is provided in the middle of the ice particle supply pipe 48 to supply the fine particles of ice containing microbubbles to the nozzle head tube 22. Without providing, the microbubble-containing ice slurry is supplied to the nozzle head tube 22, and the microbubble-containing ice slurry from the nozzle of the nozzle head tube 22 together with nitrogen gas (and thus as a three-phase flow) is applied to the main surface of the substrate W. You may make it spray on. In the above-described embodiment, nitrogen gas is supplied to the nozzle head tube 22 instead of liquefied nitrogen as a carrier fluid, and a part of ice fine particles containing microbubbles are dissolved inside the nozzle head tube 22. Alternatively, ice fine particles containing microbubbles may be sprayed from the nozzles of the nozzle head tube 22 onto the main surface of the substrate W together with nitrogen gas.

  Further, when the bubble generating unit 14 generates ozone or hydrogen peroxide microbubbles instead of air or oxygen, ice fine particles containing ozone or hydrogen peroxide microbubbles together with nitrogen gas are formed on the substrate. It will be sprayed against the main surface of W. Thereby, ice fine particles are dissolved on the main surface of the substrate W, ozone and hydrogen peroxide are supplied to the main surface of the substrate W, and organic substances are decomposed and removed by the oxidizing action of ozone and hydrogen peroxide. For this reason, when the degree of organic contamination of the substrate is not so large, the organic contamination removal step can be omitted in a series of substrate cleaning processes. Furthermore, there is also an effect of suppressing the generation of bacteria by the bactericidal action of ozone and hydrogen peroxide.

Next, FIG. 2 shows another embodiment of the present invention and is a schematic perspective view showing a configuration example of a substrate cleaning section of a cleaning processing unit in the substrate processing apparatus.
The substrate cleaning unit 56 includes a cleaning tank 58 formed of a sealed rectangular housing in which the substrate W is cleaned. The planar shape of the cleaning tank 58 is a rectangular shape having a width dimension larger than the width of the substrate W and a length dimension smaller than the length of the substrate W in the transport direction. In the cleaning tank 58, a substrate carry-in port 60 and a substrate carry-out port 62 are formed on a pair of side surfaces facing each other, and an ice slurry supply port 64 and a discharge port 66 are formed on the other pair of side surfaces facing each other. It is formed. The substrate carry-in port 60 and the substrate carry-out port 62 have a lateral dimension slightly larger than the width of the substrate W and a vertical dimension slightly larger than the thickness of the substrate W, and are opened in a slit shape. The substrate cleaning unit 56 configured as described above is arranged in the middle of the transfer path of the substrate W of the cleaning processing unit, and although not shown, the substrate W is continuously placed in the horizontal direction before and after the cleaning tank 58. A plurality of transport rollers that are transported and carried into the cleaning tank 58 through the substrate carry-in port 60 and carried out from the cleaning tank 58 through the substrate carry-out port 62 are arranged. The cleaning tank 58 and the plurality of transport rollers are provided so as to be inclined in a direction orthogonal to the transport direction of the substrate W, respectively.

  As shown in FIG. 1, the introduction pipe portion 68 communicated with the supply port 64 of the cleaning tank 58 is connected to the liquid outlet 46 of the liquid storage tank 12 in which the microbubble-containing ice slurry is stored. The formed ice slurry supply pipe is connected in communication. However, the ice slurry supply pipe is not provided with the dehydration processing section 52 as shown in FIG. 1, and the microbubble-containing ice slurry is supplied from the liquid storage tank 12 through the ice slurry supply pipe to the introduction pipe section 68. To be. Although not shown, a recovery pipe is connected to the outlet pipe portion 70 communicating with the discharge port 66 of the cleaning tank 58, and a part of the ice slurry is stored through the recovery pipe and through a filter or the like. It is returned to the tank 12. A partition member 72 formed by a mesh, a punching plate having a large number of small holes, a slit plate having a large number of slits, etc. is provided in the outlet pipe portion 70 so as to partition the flow channel. Has been. The partition member 72 allows water in the ice slurry in the cleaning tank 58 to pass through easily, while restricting the passage of ice fine particles.

  In the substrate cleaning unit 56 shown in FIG. 2, the substrate W is transported in the horizontal direction by the roller conveyor, and the substrate W is sent into the cleaning tank 58 of the substrate cleaning unit 56. On the other hand, ice slurry containing microbubbles in ice particles is continuously supplied from the storage tank 12 through the ice slurry supply pipe into the cleaning tank 58, and the ice slurry flows in the cleaning tank 58. Then, it is discharged from the cleaning tank 58 through the recovery pipe. Then, while the substrate W is loaded into the cleaning tank 58, passes through the cleaning tank 58 and is unloaded from the cleaning tank 58, the ice slurry flows in the cleaning tank 58 from the supply port 64 toward the discharge port 66. Makes contact with the main surface of the substrate W, so that contaminants such as particles present in the recesses on the surface of the substrate W are scraped out by the fine particles of ice in the ice slurry, and the contaminants together with the water in the ice slurry are mixed with the substrate W. It flows out from the main surface and is removed. In this way, the substrate W is cleaned. Since the ice particles of the ice slurry contain microbubbles, they are contained in the ice particles when the ice particles in the ice slurry are dissolved. The cleaning effect of the substrate W is further enhanced by the energy released when the microbubbles that have been destroyed are destroyed and disappear. The substrate W only contacts with the ice slurry, and the entire surface of the substrate W contacts with the ice slurry evenly, so that a uniform cleaning process is performed without causing processing unevenness. The formed film such as a metal film is not damaged.

  When the ice particles in the ice slurry are dissolved, the microbubbles contained in the ice particles are released into the pure water. For this reason, even if an attempt is made to refreeze around the substrate W after the fine particles of ice around the substrate W being transported are dissolved in the cleaning tank 58, the microbubbles released into the pure water around the substrate W An air layer is generated around the substrate W, and re-freezing of pure water is prevented by this air layer. Therefore, it is possible to prevent the transfer of the substrate W from being hindered by re-freezing around the substrate W, and the transfer of the substrate W in the cleaning tank 58 can be performed stably.

  In the above-described embodiment shown in FIG. 2, while the ice slurry is continuously supplied into the cleaning tank 58 and continuously discharged from the cleaning tank 58, the substrate W is continuously transferred and the inside of the cleaning tank 58 is discharged. The ice slurry is brought into contact with the main surface of the substrate W so as to pass through, but the ice slurry is transferred to the substrate W in the cleaning tank 58 without continuously feeding the substrate W while continuously supplying the ice slurry. Any method may be used as long as it can be brought into contact with the main surface of the substrate W while relatively flowing. For example, the substrate W is intermittently conveyed while the ice slurry is continuously supplied into the cleaning tank 58 and continuously discharged from the cleaning tank 58, or the ice slurry is intermittently supplied into the cleaning tank 58. The substrate W may be continuously transported and passed through the cleaning tank 58 while being supplied and intermittently discharged from the cleaning tank 58. In addition, while the ice slurry is intermittently supplied into the cleaning tank 58 and intermittently discharged from the cleaning tank 58, the substrate W is intermittently transported and passed through the cleaning tank 58, and the substrate W is stopped. During the operation, the ice slurry is supplied into the cleaning tank 58 and discharged from the cleaning tank 58, or the substrate W is transported when the supply of the ice slurry into the cleaning tank 58 is stopped. Good. Further, the substrate W is stopped, and the ice slurry is continuously or intermittently supplied into the cleaning tank 58 and discharged continuously or intermittently from the cleaning tank 58, while the cleaning tank 58 is discharged from the substrate W. You may make it move. In the above-described embodiment, the cleaning tank 58 is tilted and the substrate W is supported in an inclined posture and transported in the horizontal direction. However, the cleaning tank 58 is held horizontally and the substrate W is supported in a horizontal posture. Then, the substrate W may be transported in the horizontal direction, and after the cleaning process by the cleaning tank 58, the substrate W may be inclined and washed with water.

Next, FIG. 3 is a perspective view showing a schematic configuration of a substrate processing apparatus according to still another embodiment of the present invention.
Although not shown, this substrate processing apparatus is composed of a plurality of transport rollers arranged in parallel to each other, supports the substrate W in an inclined posture, and moves the substrate W in a direction perpendicular to the inclined direction and in the horizontal direction. A roller conveyor for conveying and a nozzle 74 for supplying ice slurry containing microbubbles in ice particles to the main surface of the substrate W conveyed by the roller conveyor are provided. The nozzle 74 has a length substantially equal to the dimension in the width direction orthogonal to the transport direction of the substrate W, and intersects the substrate transport direction at a position directly above the substrate W and along the inclination of the substrate W. It is arranged like this. A slit-like discharge port is formed in the lower end surface of the nozzle 74 in the longitudinal direction, and ice slurry is discharged from the slit-like discharge port with an appropriate pressure. A piping 76 is connected to the nozzle 74 so as to communicate with a flow path formed therein, and the nozzle 74 is connected to a liquid storage tank (see FIG. 1) through the piping 76, although not shown. The flow path is connected. Then, microbubble-containing ice slurry is pressurized from a liquid storage tank by a pump (not shown) and supplied to the nozzle 74, and is conveyed from the slit-like discharge port of the nozzle 74 in a horizontal direction in an inclined posture by a roller conveyor. An ice slurry containing microbubbles in ice particles is discharged onto the main surface of the substrate W.

  In the substrate processing apparatus having the configuration shown in FIG. 3, the ice slurry is discharged from the slit-shaped discharge port of the nozzle 74 to the main surface of the substrate W, so that particles or the like present in the recesses on the surface of the substrate W can be obtained. Contaminants are scraped off by the fine particles of ice in the ice slurry, and the contaminants flow down along the inclination of the substrate W from the main surface of the substrate W together with the ice slurry and its molten water and are removed. And since the microbubbles are contained in the ice particles of the ice slurry, when the ice microparticles are dissolved on the main surface of the substrate W, the microbubbles contained in the ice microparticles are destroyed. The cleaning effect of the substrate W is further enhanced by the energy released when it disappears. For this reason, the cleaning process of the substrate W can be performed without increasing the discharge pressure of the ice slurry discharged from the slit-shaped discharge port of the nozzle 74. Further, the fine particles of ice in the ice slurry are softer than ordinary fine particles of ice that do not contain bubbles such as microbubbles due to the inclusion of microbubbles therein. Therefore, a uniform cleaning process can be performed without causing process unevenness, and a film such as a metal film formed on the substrate W is not damaged.

FIG. 4 is a schematic front view showing a configuration of a main part of a substrate processing apparatus (spin scrubber) which is still another embodiment of the present invention.
The substrate processing apparatus includes a spin chuck 78 that holds the substrate W in a horizontal posture. The spin chuck 78 is rotatably supported around the vertical axis by the rotation support shaft 80, and is rotated around the vertical axis by a motor (not shown) connected to the rotation support shaft 80. Although not shown, a cup for collecting ice slurry scattered from the substrate W to the periphery is disposed around the substrate W held by the spin chuck 78 so as to surround the substrate W. Yes. Disposed above the substrate W held by the spin chuck 78 is a discharge nozzle 82 for discharging ice slurry containing microbubbles in ice particles to the surface of the substrate W. The discharge nozzle 82 is connected to a pipe 84 for feeding ice slurry. Although not shown, the discharge nozzle 82 is connected to the liquid storage tank (see FIG. 1) through the pipe 84. . Then, ice slurry containing microbubbles in ice particles is pressurized from a liquid storage tank by a pump (not shown) and supplied to the discharge nozzle 82, and is horizontally oriented from the discharge port of the discharge nozzle 82 by the spin chuck 78. The microbubble-containing ice slurry is discharged onto the surface of the substrate W supported by the substrate and rotating about the vertical axis.

  In the substrate processing apparatus having the configuration shown in FIG. 4, the ice slurry is discharged from the discharge port of the discharge nozzle 82 onto the surface of the substrate W, thereby causing contaminants such as particles present in the recesses on the surface of the substrate W. Is scraped off by the fine particles of ice and flows out from the surface of the substrate W together with the ice slurry to be removed. In this case, since the ice bubbles of the ice slurry discharged from the discharge nozzle 82 onto the surface of the substrate W contain microbubbles, the ice particles are dissolved when the ice particles are dissolved on the main surface of the substrate W. The cleaning effect of the substrate W is further enhanced by the energy released when the microbubbles contained in the fine particles are destroyed and disappeared. For this reason, the cleaning process of the substrate W can be performed without increasing the discharge pressure of the ice slurry discharged from the discharge port of the discharge nozzle 82 so much. Therefore, a uniform cleaning process can be performed without causing process unevenness, and a film such as a metal film formed on the substrate W is not damaged. Further, the fine particles of ice in the ice slurry are softer than ordinary fine particles of ice that do not contain bubbles such as microbubbles due to the inclusion of microbubbles therein. For this reason, on the surface of the substrate W, even if there is some unevenness in the energy when the ice fine particles in the ice slurry discharged from the discharge nozzle 82 collide with the surface of the substrate W, they are formed on the surface of the substrate W. This prevents the patterned metal film or the like from being partially damaged.

It is a schematic diagram which shows one example of embodiment of this invention and shows schematic structure of a substrate processing apparatus. FIG. 5 is a schematic perspective view showing another embodiment of the present invention and showing a configuration example of a substrate cleaning section of a cleaning processing unit in a substrate processing apparatus. It is a principal part perspective view which shows schematic structure of the substrate processing apparatus which is another embodiment of this invention. It is a schematic front view which shows the structure of the principal part of the substrate processing apparatus which is another embodiment of this invention.

Explanation of symbols

DESCRIPTION OF SYMBOLS 10 Cleaning processing unit 12 Liquid storage tank 14 Bubble generation unit 16 Ice making unit 18 Chamber 20 Conveying roller 22 Nozzle head pipe 24 1st liquid outflow port 26 of a liquid storage tank 26 1st liquid inflow port of a liquid storage tank 28 Bubble generation unit Liquid inlet 30 Liquid outlet of bubble generating unit 32 Internal flow path 34 Aspirator 36 Pressure pump 38 Second liquid outlet of storage tank 40 Second liquid inlet of storage tank 42 Liquid flow of ice making unit Inlet 44 Liquid outlet of ice making unit 46 Liquid outlet of storage tank 48 Ice grain supply pipe 50 Pump 52 Dehydration processing part 54 Liquefied nitrogen supply pipe 56 Substrate cleaning part 58 Cleaning tank 60 Substrate carry-in inlet 62 Substrate outlet 64 Ice slurry Supply port 66 Ice slurry discharge port 74 Nozzle 76, 84 Piping 78 Spin chuck 82 Discharge nozzle W Substrate

Claims (12)

In a substrate processing method for processing a substrate using fine particles of ice,
An ice particle generation process for generating fine particles of ice containing ultrafine bubbles;
An ice particle supply step of supplying the fine particles of ice generated in the ice particle generation step together with a fluid to the main surface of the substrate to clean the main surface of the substrate;
A substrate processing method comprising: The substrate processing method according to claim 1,
A substrate processing method comprising spraying fine particles of ice containing ultrafine bubbles together with a gas onto the main surface of the substrate in the ice grain supply step. The substrate processing method according to claim 1,
A substrate processing method, comprising: supplying a processing liquid containing fine particles of ice containing ultrafine bubbles to the main surface of the substrate in the ice particle supplying step. The substrate processing method according to claim 3,
A substrate characterized in that a processing liquid containing fine particles of ice containing ultrafine bubbles is stored in a container, and the processing liquid is brought into contact with the main surface of the substrate while flowing relatively to the substrate in the container. Processing method. The substrate processing method according to claim 4,
While the processing liquid containing fine particles of ice containing ultrafine bubbles is continuously supplied into a fixed container, the substrate is allowed to flow in the container and discharged from the container, and the substrate is carried into the container and then stored in the container. The substrate processing method characterized by carrying out and carrying out from a container. In a substrate processing apparatus for processing a substrate using fine particles of ice,
Ice particle generating means for generating fine particles of ice containing ultrafine bubbles;
Ice particle supply means for supplying ice particles generated by the ice particle generation means together with a fluid to the main surface of the substrate to clean the main surface of the substrate;
A substrate processing apparatus comprising: The substrate processing apparatus according to claim 6,
The substrate processing apparatus is characterized in that the ice particle supply means is a gas spraying means for spraying ice fine particles containing ultrafine bubbles onto a main surface of the substrate together with a gas. The substrate processing apparatus according to claim 6,
The substrate processing apparatus, wherein the ice particle supply means is a processing liquid supply means for supplying a processing liquid containing fine particles of ice containing ultrafine bubbles to the main surface of the substrate. The substrate processing apparatus according to claim 8,
A container for storing a processing liquid containing fine particles of ice containing ultrafine bubbles;
Substrate loading means for loading the substrate into the container;
The processing liquid supply means supplies a processing liquid containing fine particles of ice containing ultrafine bubbles into the container, and the processing liquid containing fine particles of ice containing ultrafine bubbles in the container is applied to the substrate. A substrate processing apparatus, wherein the substrate processing apparatus is brought into contact with the main surface of the substrate while relatively flowing. The substrate processing apparatus according to claim 9,
A substrate processing apparatus, wherein the container is a sealed rectangular housing having a slit-shaped substrate carry-in port, a slit-shaped substrate carry-out port, and a supply port and a discharge port for a treatment liquid containing fine particles of ice. In the substrate processing apparatus of Claim 9 or Claim 10,
The container is fixed;
The processing liquid supply means is a processing liquid distribution means for continuously supplying a processing liquid containing fine particles of ice containing ultrafine bubbles into the container and flowing the liquid in the container to discharge it from the container.
The substrate processing apparatus, wherein the substrate carrying means is a substrate carrying means for carrying a substrate into the container, carrying the inside of the container, and carrying out the inside of the container. 12. The substrate processing apparatus according to claim 6, wherein:
The ice grain generating means is
A reservoir for storing a liquid containing fine particles of ice containing ultrafine bubbles;
The liquid tank has a liquid inlet connected to the first liquid outlet and the liquid outlet connected to the first liquid inlet of the liquid tank and the liquid outlet connected to the liquid tank. A bubble generating means that circulates the liquid and pressurizes the liquid flowing from the liquid storage tank through the liquid inlet and dissolves the gas in the liquid to generate ultrafine bubbles in the liquid;
A liquid inlet that is connected to the second liquid outlet of the liquid storage tank and a liquid outlet that is connected to the second liquid inlet of the liquid storage tank; The liquid is circulated in order to cool the liquid that has flowed in from the liquid storage tank through the liquid inlet to generate ice fine particles in the liquid, and the liquid containing the generated ice fine particles is discharged from the liquid outlet. Ice making means for draining and returning to the reservoir;
A substrate processing apparatus, comprising:

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