JPH0462167B2 - - Google Patents

Info

Publication number
JPH0462167B2
JPH0462167B2 JP58022775A JP2277583A JPH0462167B2 JP H0462167 B2 JPH0462167 B2 JP H0462167B2 JP 58022775 A JP58022775 A JP 58022775A JP 2277583 A JP2277583 A JP 2277583A JP H0462167 B2 JPH0462167 B2 JP H0462167B2
Authority
JP
Japan
Prior art keywords
light
exposure
amount
photodetector
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58022775A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59149024A (ja
Inventor
Kazunori Imai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP58022775A priority Critical patent/JPS59149024A/ja
Publication of JPS59149024A publication Critical patent/JPS59149024A/ja
Publication of JPH0462167B2 publication Critical patent/JPH0462167B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Projection-Type Copiers In General (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP58022775A 1983-02-16 1983-02-16 露光装置 Granted JPS59149024A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58022775A JPS59149024A (ja) 1983-02-16 1983-02-16 露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58022775A JPS59149024A (ja) 1983-02-16 1983-02-16 露光装置

Publications (2)

Publication Number Publication Date
JPS59149024A JPS59149024A (ja) 1984-08-25
JPH0462167B2 true JPH0462167B2 (cg-RX-API-DMAC7.html) 1992-10-05

Family

ID=12092034

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58022775A Granted JPS59149024A (ja) 1983-02-16 1983-02-16 露光装置

Country Status (1)

Country Link
JP (1) JPS59149024A (cg-RX-API-DMAC7.html)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61216324A (ja) * 1985-03-20 1986-09-26 Nec Corp 縮小投影式露光装置
JPS63111617A (ja) * 1986-10-29 1988-05-16 Mitsubishi Electric Corp 縮小投影露光装置
JPH0612756B2 (ja) * 1989-04-28 1994-02-16 大日本スクリーン製造株式会社 ウエハの周辺部露光装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5068066A (cg-RX-API-DMAC7.html) * 1973-10-17 1975-06-07
JPS5942226B2 (ja) * 1976-07-31 1984-10-13 石川島播磨重工業株式会社 還元炉の抽出装置
JPS56146138A (en) * 1980-04-16 1981-11-13 Nec Corp Method and apparatus for exposing photomask
JPS57117238A (en) * 1981-01-14 1982-07-21 Nippon Kogaku Kk <Nikon> Exposing and baking device for manufacturing integrated circuit with illuminometer
JPS57182149A (en) * 1981-05-01 1982-11-09 Matsushita Electric Works Ltd Surface defect detector

Also Published As

Publication number Publication date
JPS59149024A (ja) 1984-08-25

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