GB1501908A - Automatic positioning of image and/or object surfaces in optical apparatus - Google Patents
Automatic positioning of image and/or object surfaces in optical apparatusInfo
- Publication number
- GB1501908A GB1501908A GB1908675A GB1908675A GB1501908A GB 1501908 A GB1501908 A GB 1501908A GB 1908675 A GB1908675 A GB 1908675A GB 1908675 A GB1908675 A GB 1908675A GB 1501908 A GB1501908 A GB 1501908A
- Authority
- GB
- United Kingdom
- Prior art keywords
- mask
- wafer
- focus
- laser beam
- processing unit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Focusing (AREA)
- Projection-Type Copiers In General (AREA)
- Automatic Focus Adjustment (AREA)
Abstract
1501908 Automatic position control INTERNATIONAL BUSINESS MACHINES CORP 7 May 1975 [6 June 1974] 19086/75 Heading G3R In a device for aligning a mask 18 with a semiconductor wafer 21 coated with a photo-resist film, the mask 18 and wafer 21 are scanned along a circular path by a laser beam. The circular scan is formed by passing the laser beam through a rotating prism 15, lenses 16, 19, 20 and a beam divider 17. The lenses are such as to bring the beam into focus in the "nominal plane" of the mask 18 and the wafer 21. The laser beam is of a wavelength that will not react with the photoresistive layer. The beam reaches the wafer 21 through the gaps in the mask 18. The reflected radiation is directed back as shown via beam dividers 17 and 14 and lens 22 to a focusing detector 30. The detector 30 detects whether or not the beam is in focus on the mask 18 or the wafers 21 surface at that instant. The output from the focusing detector 30 is fed along with signals from a prism position indicator device 15A to a processing unit 32. The processing unit 32 separates the signals originating from radiation reflected off the mask from radiation reflected off the wafer, and the unit determines how the mask and wafer are out of true. The processing unit supplies control signals along lines 33, 34 to adjust the position of the mask and the wafer with the aid of movable rod shaped elements. The mask and wafer may be moved along the optical axis O, or, tilted about the "X" or "Y" axis. Other elements, (not shown) rotate the mask and/ or wafer or move them in the "X" or "Y" direction. When both the mask and wafer are correctly aligned an exposing flash lamp 50 is activated. If the laser beam is in focus it will be reflected back to be in focus on the apertures of two "pin-hole" diaphragms 25 and 26. However an "out of focus" condition will be detected by photo-detectors 27, 28 which will register a decrease in incident intensity.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19742427323 DE2427323C2 (en) | 1974-06-06 | Method for the automatic positioning of the image and / or object surfaces in optical copying devices |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1501908A true GB1501908A (en) | 1978-02-22 |
Family
ID=5917467
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB1908675A Expired GB1501908A (en) | 1974-06-06 | 1975-05-07 | Automatic positioning of image and/or object surfaces in optical apparatus |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JPS5925212B2 (en) |
| CA (1) | CA1032382A (en) |
| FR (1) | FR2274073A1 (en) |
| GB (1) | GB1501908A (en) |
| IT (1) | IT1037606B (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4540278A (en) * | 1979-04-02 | 1985-09-10 | Optimetrix Corporation | Optical focusing system |
| US5276725A (en) * | 1988-05-10 | 1994-01-04 | Canon Kabushiki Kaisha | Exposure system |
| WO2005114295A1 (en) | 2004-05-20 | 2005-12-01 | Teraview Limited | Apparatus and method for investigating a sample |
| CN109947140A (en) * | 2019-04-03 | 2019-06-28 | 辽宁科技大学 | A kind of 5DOF laser alignment micromatic setting and its adjusting method |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS607764B2 (en) * | 1976-04-28 | 1985-02-27 | キヤノン株式会社 | Scanning photodetector |
| JPS53135653A (en) * | 1977-05-01 | 1978-11-27 | Canon Inc | Photoelectric detecting optical device |
| JPS5532662A (en) * | 1978-08-30 | 1980-03-07 | Bando Chem Ind Ltd | Stamp compound |
| DE2845603C2 (en) * | 1978-10-19 | 1982-12-09 | Censor Patent- und Versuchs-Anstalt, 9490 Vaduz | Method and device for projection copying |
| FR2450470A1 (en) * | 1979-02-27 | 1980-09-26 | Thomson Csf | OPTICAL PROJECTION SYSTEM IN PHOTOREPETITION |
| EP0017044B1 (en) * | 1979-04-02 | 1985-07-03 | Eaton-Optimetrix Inc. | A system for positioning a utilization device |
| US4232969A (en) * | 1979-05-30 | 1980-11-11 | International Business Machines Corporation | Projection optical system for aligning an image on a surface |
| JPS5817446A (en) * | 1981-07-24 | 1983-02-01 | Hitachi Ltd | Projection exposing method and its device |
| JPS59100406A (en) * | 1982-11-30 | 1984-06-09 | Asahi Optical Co Ltd | Automatic focusing device of microscope system |
| JPS6021051A (en) * | 1983-07-14 | 1985-02-02 | Nippon Telegr & Teleph Corp <Ntt> | Lens projection and exposure method and its device |
| JPS6174338A (en) * | 1984-09-20 | 1986-04-16 | Hitachi Ltd | Optical alignment device |
| JPS61221716A (en) * | 1985-01-22 | 1986-10-02 | ケイエルエイ・インストラメンツ・コ−ポレ−シヨン | Automatic focusing unit for optical inspector using microscope |
| JP2622841B2 (en) * | 1987-09-24 | 1997-06-25 | 旭光学工業株式会社 | Exposure equipment |
| JP2799570B2 (en) * | 1988-05-10 | 1998-09-17 | キヤノン株式会社 | Exposure equipment |
| JP2501053B2 (en) * | 1991-10-04 | 1996-05-29 | 株式会社日立製作所 | Projection type exposure method using ultraviolet pulse laser |
| JPH0712019B2 (en) * | 1992-03-13 | 1995-02-08 | 株式会社日立製作所 | Projection exposure method and projection exposure apparatus |
| JP2530423B2 (en) * | 1994-04-22 | 1996-09-04 | 株式会社日立製作所 | Pattern marking device |
-
1975
- 1975-04-24 IT IT2270575A patent/IT1037606B/en active
- 1975-04-29 FR FR7514031A patent/FR2274073A1/en active Granted
- 1975-05-07 GB GB1908675A patent/GB1501908A/en not_active Expired
- 1975-05-21 CA CA227,456A patent/CA1032382A/en not_active Expired
- 1975-06-04 JP JP50066647A patent/JPS5925212B2/en not_active Expired
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4540278A (en) * | 1979-04-02 | 1985-09-10 | Optimetrix Corporation | Optical focusing system |
| US5276725A (en) * | 1988-05-10 | 1994-01-04 | Canon Kabushiki Kaisha | Exposure system |
| WO2005114295A1 (en) | 2004-05-20 | 2005-12-01 | Teraview Limited | Apparatus and method for investigating a sample |
| US7777187B2 (en) | 2004-05-20 | 2010-08-17 | Teraview Limited | Apparatus and method for investigating a sample |
| US8373126B2 (en) | 2004-05-20 | 2013-02-12 | Teraview Limited | Apparatus and method for investigating a sample |
| CN109947140A (en) * | 2019-04-03 | 2019-06-28 | 辽宁科技大学 | A kind of 5DOF laser alignment micromatic setting and its adjusting method |
| CN109947140B (en) * | 2019-04-03 | 2023-08-22 | 辽宁科技大学 | 5-degree-of-freedom laser collimation fine adjustment device and adjustment method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5925212B2 (en) | 1984-06-15 |
| FR2274073B1 (en) | 1977-07-08 |
| DE2427323A1 (en) | 1975-09-25 |
| DE2427323B1 (en) | 1975-09-25 |
| FR2274073A1 (en) | 1976-01-02 |
| IT1037606B (en) | 1979-11-20 |
| JPS516565A (en) | 1976-01-20 |
| CA1032382A (en) | 1978-06-06 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed | ||
| PCNP | Patent ceased through non-payment of renewal fee |