FR2274073B1 - - Google Patents
Info
- Publication number
- FR2274073B1 FR2274073B1 FR7514031A FR7514031A FR2274073B1 FR 2274073 B1 FR2274073 B1 FR 2274073B1 FR 7514031 A FR7514031 A FR 7514031A FR 7514031 A FR7514031 A FR 7514031A FR 2274073 B1 FR2274073 B1 FR 2274073B1
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Projection-Type Copiers In General (AREA)
- Automatic Focus Adjustment (AREA)
- Focusing (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19742427323 DE2427323C2 (en) | 1974-06-06 | Method for the automatic positioning of the image and / or object surfaces in optical copying devices |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2274073A1 FR2274073A1 (en) | 1976-01-02 |
| FR2274073B1 true FR2274073B1 (en) | 1977-07-08 |
Family
ID=5917467
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7514031A Granted FR2274073A1 (en) | 1974-06-06 | 1975-04-29 | PROCESS FOR AUTOMATICALLY POSITIONING IMAGE AND / OR OBJECT SURFACES IN OPTICAL COPIERS |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JPS5925212B2 (en) |
| CA (1) | CA1032382A (en) |
| FR (1) | FR2274073A1 (en) |
| GB (1) | GB1501908A (en) |
| IT (1) | IT1037606B (en) |
Families Citing this family (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS607764B2 (en) * | 1976-04-28 | 1985-02-27 | キヤノン株式会社 | Scanning photodetector |
| JPS53135653A (en) * | 1977-05-01 | 1978-11-27 | Canon Inc | Photoelectric detecting optical device |
| JPS5532662A (en) * | 1978-08-30 | 1980-03-07 | Bando Chem Ind Ltd | Stamp compound |
| DE2845603C2 (en) * | 1978-10-19 | 1982-12-09 | Censor Patent- und Versuchs-Anstalt, 9490 Vaduz | Method and device for projection copying |
| FR2450470A1 (en) * | 1979-02-27 | 1980-09-26 | Thomson Csf | OPTICAL PROJECTION SYSTEM IN PHOTOREPETITION |
| EP0097380A3 (en) * | 1979-04-02 | 1984-08-29 | Eaton-Optimetrix Inc. | A system for positioning a utilization device |
| US4540278A (en) * | 1979-04-02 | 1985-09-10 | Optimetrix Corporation | Optical focusing system |
| US4232969A (en) * | 1979-05-30 | 1980-11-11 | International Business Machines Corporation | Projection optical system for aligning an image on a surface |
| JPS5817446A (en) * | 1981-07-24 | 1983-02-01 | Hitachi Ltd | Projection exposing method and its device |
| JPS59100406A (en) * | 1982-11-30 | 1984-06-09 | Asahi Optical Co Ltd | Automatic focusing device of microscope system |
| JPS6021051A (en) * | 1983-07-14 | 1985-02-02 | Nippon Telegr & Teleph Corp <Ntt> | Lens projection and exposure method and its device |
| JPS6174338A (en) * | 1984-09-20 | 1986-04-16 | Hitachi Ltd | Optical alignment device |
| JPS61221716A (en) * | 1985-01-22 | 1986-10-02 | ケイエルエイ・インストラメンツ・コ−ポレ−シヨン | Automatic focusing unit for optical inspector using microscope |
| JP2622841B2 (en) * | 1987-09-24 | 1997-06-25 | 旭光学工業株式会社 | Exposure equipment |
| US5276725A (en) * | 1988-05-10 | 1994-01-04 | Canon Kabushiki Kaisha | Exposure system |
| JP2799570B2 (en) * | 1988-05-10 | 1998-09-17 | キヤノン株式会社 | Exposure equipment |
| JP2501053B2 (en) * | 1991-10-04 | 1996-05-29 | 株式会社日立製作所 | Projection type exposure method using ultraviolet pulse laser |
| JPH0712019B2 (en) * | 1992-03-13 | 1995-02-08 | 株式会社日立製作所 | Projection exposure method and projection exposure apparatus |
| JP2530423B2 (en) * | 1994-04-22 | 1996-09-04 | 株式会社日立製作所 | Pattern marking device |
| GB2414294B (en) | 2004-05-20 | 2006-08-02 | Teraview Ltd | Apparatus and method for investigating a sample |
| CN109947140B (en) * | 2019-04-03 | 2023-08-22 | 辽宁科技大学 | 5-degree-of-freedom laser collimation fine adjustment device and adjustment method thereof |
-
1975
- 1975-04-24 IT IT2270575A patent/IT1037606B/en active
- 1975-04-29 FR FR7514031A patent/FR2274073A1/en active Granted
- 1975-05-07 GB GB1908675A patent/GB1501908A/en not_active Expired
- 1975-05-21 CA CA227,456A patent/CA1032382A/en not_active Expired
- 1975-06-04 JP JP50066647A patent/JPS5925212B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| DE2427323B1 (en) | 1975-09-25 |
| FR2274073A1 (en) | 1976-01-02 |
| IT1037606B (en) | 1979-11-20 |
| DE2427323A1 (en) | 1975-09-25 |
| CA1032382A (en) | 1978-06-06 |
| GB1501908A (en) | 1978-02-22 |
| JPS5925212B2 (en) | 1984-06-15 |
| JPS516565A (en) | 1976-01-20 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |