JPH0459630B2 - - Google Patents

Info

Publication number
JPH0459630B2
JPH0459630B2 JP61254832A JP25483286A JPH0459630B2 JP H0459630 B2 JPH0459630 B2 JP H0459630B2 JP 61254832 A JP61254832 A JP 61254832A JP 25483286 A JP25483286 A JP 25483286A JP H0459630 B2 JPH0459630 B2 JP H0459630B2
Authority
JP
Japan
Prior art keywords
composition
propylene glycol
acetate
resin
weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61254832A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62105137A (ja
Inventor
Daahamu Dana
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CNA Holdings LLC
Original Assignee
Hoechst Celanese Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Celanese Corp filed Critical Hoechst Celanese Corp
Publication of JPS62105137A publication Critical patent/JPS62105137A/ja
Publication of JPH0459630B2 publication Critical patent/JPH0459630B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
JP61254832A 1985-10-28 1986-10-28 放射感光性ポジティブ型フォトレジスト組成物及びその製法 Granted JPS62105137A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US79188085A 1985-10-28 1985-10-28
US791880 1985-10-28

Publications (2)

Publication Number Publication Date
JPS62105137A JPS62105137A (ja) 1987-05-15
JPH0459630B2 true JPH0459630B2 (en, 2012) 1992-09-22

Family

ID=25155071

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61254832A Granted JPS62105137A (ja) 1985-10-28 1986-10-28 放射感光性ポジティブ型フォトレジスト組成物及びその製法

Country Status (6)

Country Link
EP (1) EP0220645B1 (en, 2012)
JP (1) JPS62105137A (en, 2012)
KR (1) KR950001004B1 (en, 2012)
AT (1) ATE56545T1 (en, 2012)
DE (1) DE3674141D1 (en, 2012)
HK (1) HK80091A (en, 2012)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USRE50238E1 (en) 2008-07-11 2024-12-17 Nkt Photonics A/S Supercontinuum light source

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2719912B2 (ja) * 1987-05-07 1998-02-25 コニカ株式会社 感光性平版印刷版
JPS63303343A (ja) * 1987-06-03 1988-12-09 Konica Corp 感光性組成物及び感光性平版印刷版
JPS63276047A (ja) * 1987-05-07 1988-11-14 Konica Corp 感光性組成物及び感光性平版印刷版
JPS6477051A (en) * 1987-06-03 1989-03-23 Konishiroku Photo Ind Photosensitive composition and photosensitive planographic printing plate
JP2806474B2 (ja) * 1987-07-28 1998-09-30 三菱化学株式会社 感光性組成物
JPH01116537A (ja) * 1987-10-29 1989-05-09 Konica Corp 感光性組成物
JPH01250945A (ja) * 1988-03-30 1989-10-05 Sumitomo Chem Co Ltd ポジ型レジスト組成物
JPH0229750A (ja) * 1988-07-20 1990-01-31 Mitsubishi Kasei Corp 感光性組成物および感光性平版印刷版
JP2947519B2 (ja) * 1988-10-03 1999-09-13 コニカ株式会社 感光性平版印刷版
JP2584311B2 (ja) * 1989-03-20 1997-02-26 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
US5558227A (en) * 1991-07-18 1996-09-24 Hakamada; Ikuhiro Sealed container having a calendar function
JP4209297B2 (ja) * 2003-10-06 2009-01-14 東京応化工業株式会社 吐出ノズル式塗布法用ポジ型ホトレジスト組成物及びレジストパターンの形成方法
JP5329999B2 (ja) * 2009-01-29 2013-10-30 ＡｚエレクトロニックマテリアルズＩｐ株式会社 パターン形成方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3040156A1 (de) * 1980-10-24 1982-06-03 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch und damit hergestelltes lichtempfindliches kopiermaterial
DE3584316D1 (de) * 1984-06-01 1991-11-14 Rohm & Haas Lichtempfindliche beschichtungszusammensetzung, aus diesem hergestellte thermisch stabile beschichtungen und verfahren zur herstellung von thermisch stabilen polymerbildern.
EP0164083B1 (de) * 1984-06-07 1991-05-02 Hoechst Aktiengesellschaft Positiv arbeitende strahlungsempfindliche Beschichtungslösung
DE3421160A1 (de) * 1984-06-07 1985-12-12 Hoechst Ag, 6230 Frankfurt Positiv arbeitende strahlungsempfindliche beschichtungsloesung
US4550069A (en) * 1984-06-11 1985-10-29 American Hoechst Corporation Positive photoresist compositions with o-quinone diazide, novolak, and propylene glycol alkyl ether acetate
DE3437687A1 (de) * 1984-10-15 1986-04-17 Hoechst Ag, 6230 Frankfurt Verfahren zum herstellen negativer kopien mittels eines materials auf basis von 1,2-chinondiaziden
DE3666638D1 (en) * 1985-03-11 1989-11-30 Hoechst Celanese Corp Process for the production of photoresist patterns

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USRE50238E1 (en) 2008-07-11 2024-12-17 Nkt Photonics A/S Supercontinuum light source

Also Published As

Publication number Publication date
KR950001004B1 (ko) 1995-02-06
EP0220645A3 (en) 1987-08-26
JPS62105137A (ja) 1987-05-15
EP0220645A2 (de) 1987-05-06
KR870004334A (ko) 1987-05-08
HK80091A (en) 1991-10-18
ATE56545T1 (de) 1990-09-15
EP0220645B1 (de) 1990-09-12
DE3674141D1 (de) 1990-10-18

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