JPH0458622B2 - - Google Patents
Info
- Publication number
- JPH0458622B2 JPH0458622B2 JP7495184A JP7495184A JPH0458622B2 JP H0458622 B2 JPH0458622 B2 JP H0458622B2 JP 7495184 A JP7495184 A JP 7495184A JP 7495184 A JP7495184 A JP 7495184A JP H0458622 B2 JPH0458622 B2 JP H0458622B2
- Authority
- JP
- Japan
- Prior art keywords
- foreign
- foreign matter
- foreign object
- inspected
- sample stage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000001514 detection method Methods 0.000 claims description 28
- 238000007689 inspection Methods 0.000 claims description 27
- 238000003860 storage Methods 0.000 claims description 17
- 238000010894 electron beam technology Methods 0.000 claims description 11
- 239000002245 particle Substances 0.000 claims description 11
- 230000001678 irradiating effect Effects 0.000 claims 2
- 235000012431 wafers Nutrition 0.000 description 53
- 238000004458 analytical method Methods 0.000 description 8
- 239000000126 substance Substances 0.000 description 8
- 238000010586 diagram Methods 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- 230000003287 optical effect Effects 0.000 description 5
- 230000007246 mechanism Effects 0.000 description 4
- 230000015654 memory Effects 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 238000000921 elemental analysis Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000011109 contamination Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 230000010287 polarization Effects 0.000 description 2
- 102100023817 26S proteasome complex subunit SEM1 Human genes 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 101000684297 Homo sapiens 26S proteasome complex subunit SEM1 Proteins 0.000 description 1
- 101000873438 Homo sapiens Putative protein SEM1, isoform 2 Proteins 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000000619 electron energy-loss spectrum Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 238000001878 scanning electron micrograph Methods 0.000 description 1
- 238000005211 surface analysis Methods 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000011179 visual inspection Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59074951A JPS60218845A (ja) | 1984-04-16 | 1984-04-16 | 異物検査装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59074951A JPS60218845A (ja) | 1984-04-16 | 1984-04-16 | 異物検査装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60218845A JPS60218845A (ja) | 1985-11-01 |
| JPH0458622B2 true JPH0458622B2 (ko) | 1992-09-18 |
Family
ID=13562139
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59074951A Granted JPS60218845A (ja) | 1984-04-16 | 1984-04-16 | 異物検査装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60218845A (ko) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2609594B2 (ja) * | 1986-11-28 | 1997-05-14 | 株式会社日立製作所 | 欠陥検査装置 |
| JPH0718805B2 (ja) * | 1987-01-20 | 1995-03-06 | 日本電信電話株式会社 | 異物を検査する方法 |
| JPH01147513A (ja) * | 1987-12-04 | 1989-06-09 | Hitachi Ltd | 異物解析装置 |
| JP3130222B2 (ja) | 1995-02-14 | 2001-01-31 | 三菱電機株式会社 | 微小異物の分析方法、分析装置およびこれらを用いる半導体素子もしくは液晶表示素子の製法 |
| JP2813147B2 (ja) * | 1995-02-14 | 1998-10-22 | 三菱電機株式会社 | 微小異物の分析方法、分析装置およびこれらを用いる半導体素子もしくは液晶表示素子の製法 |
| JP2008215940A (ja) | 2007-03-01 | 2008-09-18 | Canon Inc | 異物検査装置及びこれを用いた異物検査方法 |
| JP5592299B2 (ja) * | 2011-03-24 | 2014-09-17 | Ｈｏｙａ株式会社 | マスクブランクの欠陥分析方法 |
| JP6402440B2 (ja) * | 2013-10-28 | 2018-10-10 | 凸版印刷株式会社 | 検査装置 |
| JP6119785B2 (ja) * | 2015-03-17 | 2017-04-26 | 大日本印刷株式会社 | 異物検査装置、異物検査方法 |
| CN110337707B (zh) | 2017-02-13 | 2021-09-28 | 株式会社日立高新技术 | 带电粒子线装置 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5364092A (en) * | 1976-11-19 | 1978-06-08 | Hitachi Ltd | Element analyzer |
| JPS57113227A (en) * | 1980-12-19 | 1982-07-14 | Ibm | Method and device for inspecting article to be inspected with pattern |
| JPS57197454A (en) * | 1981-05-29 | 1982-12-03 | Rigaku Denki Kogyo Kk | X-ray analysing apparatus |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58112909U (ja) * | 1982-01-28 | 1983-08-02 | セイコーインスツルメンツ株式会社 | Ｘ線膜厚装置 |
-
1984
- 1984-04-16 JP JP59074951A patent/JPS60218845A/ja active Granted
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5364092A (en) * | 1976-11-19 | 1978-06-08 | Hitachi Ltd | Element analyzer |
| JPS57113227A (en) * | 1980-12-19 | 1982-07-14 | Ibm | Method and device for inspecting article to be inspected with pattern |
| JPS57197454A (en) * | 1981-05-29 | 1982-12-03 | Rigaku Denki Kogyo Kk | X-ray analysing apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60218845A (ja) | 1985-11-01 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |