JPS57197454A - X-ray analysing apparatus - Google Patents

X-ray analysing apparatus

Info

Publication number
JPS57197454A
JPS57197454A JP8317281A JP8317281A JPS57197454A JP S57197454 A JPS57197454 A JP S57197454A JP 8317281 A JP8317281 A JP 8317281A JP 8317281 A JP8317281 A JP 8317281A JP S57197454 A JPS57197454 A JP S57197454A
Authority
JP
Japan
Prior art keywords
collimator
point
ray
irradiated
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8317281A
Other languages
Japanese (ja)
Inventor
Toyoji Yamano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rigaku Corp
Original Assignee
Rigaku Industrial Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rigaku Industrial Corp filed Critical Rigaku Industrial Corp
Priority to JP8317281A priority Critical patent/JPS57197454A/en
Publication of JPS57197454A publication Critical patent/JPS57197454A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/223—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/07—Investigating materials by wave or particle radiation secondary emission
    • G01N2223/076—X-ray fluorescence

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

PURPOSE:To show a position of X-rays irradiation accurately and to make an accurate analysis of desired part of an extremely minute area, by irradiating a visible ray of light through X-ray collimator. CONSTITUTION:An irradiation means 10 of a visible ray of light is provided between an X-ray tube 4 and a collimator 5 and X-rays are irradiated to a point P on a sample 2 through the collimator 5 and are detected by a proportional counter tube 7. On one hand, the visible ray of light irradiated from the means 10 to the same collimator 5 irradiates the point P and the position of irradiated point is watched by a magnification projector 3. Accordingly, the position of analysis is specified by bringing specified part of the sample 2 to the point P.
JP8317281A 1981-05-29 1981-05-29 X-ray analysing apparatus Pending JPS57197454A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8317281A JPS57197454A (en) 1981-05-29 1981-05-29 X-ray analysing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8317281A JPS57197454A (en) 1981-05-29 1981-05-29 X-ray analysing apparatus

Publications (1)

Publication Number Publication Date
JPS57197454A true JPS57197454A (en) 1982-12-03

Family

ID=13794854

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8317281A Pending JPS57197454A (en) 1981-05-29 1981-05-29 X-ray analysing apparatus

Country Status (1)

Country Link
JP (1) JPS57197454A (en)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5975109A (en) * 1982-10-23 1984-04-27 ヘルミユ−ト・フイツシヤ−・ゲ−エムベ−ハ−・ウント・コンパニ−・インステイテユ−ト・フユア・エレクトロニ−ク・ウント・メステヒニ−ク Measuring device for thickness of thin layer
JPS6053048U (en) * 1983-09-20 1985-04-13 セイコーインスツルメンツ株式会社 Guide mark on X-ray analyzer
JPS60218845A (en) * 1984-04-16 1985-11-01 Hitachi Ltd Apparatus for testing foreign matter
EP0318012A2 (en) * 1987-11-27 1989-05-31 Hitachi, Ltd. X-ray analyzer
JPH01147513A (en) * 1987-12-04 1989-06-09 Hitachi Ltd Foreign matter analyzer
JP2003028815A (en) * 2001-07-13 2003-01-29 Horiba Ltd X-ray analyzer and x-ray conduit used in the same
JP2013221744A (en) * 2012-04-12 2013-10-28 Horiba Ltd X-ray detection device
JP2021071400A (en) * 2019-10-31 2021-05-06 パルステック工業株式会社 X-ray diffraction measurement device
JP2021071401A (en) * 2019-10-31 2021-05-06 パルステック工業株式会社 X-ray diffraction measurement device
JP2021081277A (en) * 2019-11-18 2021-05-27 パルステック工業株式会社 X-ray diffraction measurement device

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51121388A (en) * 1975-04-16 1976-10-23 Nec Corp Apparatus for adjusting a specimen for x-ray diffration camera
JPS534433A (en) * 1976-07-02 1978-01-17 Dainippon Printing Co Ltd Xy matrix display panel and method of driving same
JPS55159143A (en) * 1979-05-31 1980-12-11 Agency Of Ind Science & Technol Metal surface flaw detector

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51121388A (en) * 1975-04-16 1976-10-23 Nec Corp Apparatus for adjusting a specimen for x-ray diffration camera
JPS534433A (en) * 1976-07-02 1978-01-17 Dainippon Printing Co Ltd Xy matrix display panel and method of driving same
JPS55159143A (en) * 1979-05-31 1980-12-11 Agency Of Ind Science & Technol Metal surface flaw detector

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0244363B2 (en) * 1982-10-23 1990-10-03 Fischer Gmbh & Co Helmut
JPS5975109A (en) * 1982-10-23 1984-04-27 ヘルミユ−ト・フイツシヤ−・ゲ−エムベ−ハ−・ウント・コンパニ−・インステイテユ−ト・フユア・エレクトロニ−ク・ウント・メステヒニ−ク Measuring device for thickness of thin layer
JPS6053048U (en) * 1983-09-20 1985-04-13 セイコーインスツルメンツ株式会社 Guide mark on X-ray analyzer
JPS60218845A (en) * 1984-04-16 1985-11-01 Hitachi Ltd Apparatus for testing foreign matter
JPH0458622B2 (en) * 1984-04-16 1992-09-18 Hitachi Ltd
EP0318012A2 (en) * 1987-11-27 1989-05-31 Hitachi, Ltd. X-ray analyzer
JPH01147513A (en) * 1987-12-04 1989-06-09 Hitachi Ltd Foreign matter analyzer
JP2003028815A (en) * 2001-07-13 2003-01-29 Horiba Ltd X-ray analyzer and x-ray conduit used in the same
JP4731749B2 (en) * 2001-07-13 2011-07-27 株式会社堀場製作所 X-ray analyzer
JP2013221744A (en) * 2012-04-12 2013-10-28 Horiba Ltd X-ray detection device
JP2021071400A (en) * 2019-10-31 2021-05-06 パルステック工業株式会社 X-ray diffraction measurement device
JP2021071401A (en) * 2019-10-31 2021-05-06 パルステック工業株式会社 X-ray diffraction measurement device
JP2021081277A (en) * 2019-11-18 2021-05-27 パルステック工業株式会社 X-ray diffraction measurement device

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