JPH0455526B2 - - Google Patents

Info

Publication number
JPH0455526B2
JPH0455526B2 JP61099006A JP9900686A JPH0455526B2 JP H0455526 B2 JPH0455526 B2 JP H0455526B2 JP 61099006 A JP61099006 A JP 61099006A JP 9900686 A JP9900686 A JP 9900686A JP H0455526 B2 JPH0455526 B2 JP H0455526B2
Authority
JP
Japan
Prior art keywords
film
sio
sin
thickness
sin film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61099006A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62254434A (ja
Inventor
Hisakazu Myatake
Ryunosuke Goto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP9900686A priority Critical patent/JPS62254434A/ja
Publication of JPS62254434A publication Critical patent/JPS62254434A/ja
Publication of JPH0455526B2 publication Critical patent/JPH0455526B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Formation Of Insulating Films (AREA)
JP9900686A 1986-04-28 1986-04-28 ＳｉＯ↓２／ＳｉＮ／ＳｉＯ↓２膜の成膜方法 Granted JPS62254434A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9900686A JPS62254434A (ja) 1986-04-28 1986-04-28 ＳｉＯ↓２／ＳｉＮ／ＳｉＯ↓２膜の成膜方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9900686A JPS62254434A (ja) 1986-04-28 1986-04-28 ＳｉＯ↓２／ＳｉＮ／ＳｉＯ↓２膜の成膜方法

Publications (2)

Publication Number Publication Date
JPS62254434A JPS62254434A (ja) 1987-11-06
JPH0455526B2 true JPH0455526B2 (enExample) 1992-09-03

Family

ID=14234949

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9900686A Granted JPS62254434A (ja) 1986-04-28 1986-04-28 ＳｉＯ↓２／ＳｉＮ／ＳｉＯ↓２膜の成膜方法

Country Status (1)

Country Link
JP (1) JPS62254434A (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01145821A (ja) * 1987-12-01 1989-06-07 Nec Corp 半導体集積回路の製造方法
DE60143541D1 (de) * 2000-09-19 2011-01-05 Mattson Tech Inc Verfahren zur ausbildung dielektrischer filme

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4998182A (enExample) * 1973-01-19 1974-09-17
JPS60121724A (ja) * 1983-12-06 1985-06-29 Nec Kyushu Ltd 半導体装置の製造方法

Also Published As

Publication number Publication date
JPS62254434A (ja) 1987-11-06

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term