JPS4998182A - - Google Patents
Info
- Publication number
- JPS4998182A JPS4998182A JP48008328A JP832873A JPS4998182A JP S4998182 A JPS4998182 A JP S4998182A JP 48008328 A JP48008328 A JP 48008328A JP 832873 A JP832873 A JP 832873A JP S4998182 A JPS4998182 A JP S4998182A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Formation Of Insulating Films (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP48008328A JPS4998182A (enExample) | 1973-01-19 | 1973-01-19 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP48008328A JPS4998182A (enExample) | 1973-01-19 | 1973-01-19 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS4998182A true JPS4998182A (enExample) | 1974-09-17 |
Family
ID=11690102
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP48008328A Pending JPS4998182A (enExample) | 1973-01-19 | 1973-01-19 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS4998182A (enExample) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5255386A (en) * | 1975-10-30 | 1977-05-06 | Sony Corp | Production of semiconductor integrated circuit |
| JPS57169249A (en) * | 1981-04-09 | 1982-10-18 | Nec Corp | Manufacture of semiconductor device |
| JPS62254434A (ja) * | 1986-04-28 | 1987-11-06 | Sharp Corp | ＳｉＯ↓２／ＳｉＮ／ＳｉＯ↓２膜の成膜方法 |
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1973
- 1973-01-19 JP JP48008328A patent/JPS4998182A/ja active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5255386A (en) * | 1975-10-30 | 1977-05-06 | Sony Corp | Production of semiconductor integrated circuit |
| JPS57169249A (en) * | 1981-04-09 | 1982-10-18 | Nec Corp | Manufacture of semiconductor device |
| JPS62254434A (ja) * | 1986-04-28 | 1987-11-06 | Sharp Corp | ＳｉＯ↓２／ＳｉＮ／ＳｉＯ↓２膜の成膜方法 |