JPH0453419B2 - - Google Patents

Info

Publication number
JPH0453419B2
JPH0453419B2 JP61051533A JP5153386A JPH0453419B2 JP H0453419 B2 JPH0453419 B2 JP H0453419B2 JP 61051533 A JP61051533 A JP 61051533A JP 5153386 A JP5153386 A JP 5153386A JP H0453419 B2 JPH0453419 B2 JP H0453419B2
Authority
JP
Japan
Prior art keywords
resist
polymer
copolymer
film
styrene
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61051533A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62240953A (ja
Inventor
Kyoshi Oguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP61051533A priority Critical patent/JPS62240953A/ja
Publication of JPS62240953A publication Critical patent/JPS62240953A/ja
Publication of JPH0453419B2 publication Critical patent/JPH0453419B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP61051533A 1986-03-11 1986-03-11 レジスト Granted JPS62240953A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61051533A JPS62240953A (ja) 1986-03-11 1986-03-11 レジスト

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61051533A JPS62240953A (ja) 1986-03-11 1986-03-11 レジスト

Publications (2)

Publication Number Publication Date
JPS62240953A JPS62240953A (ja) 1987-10-21
JPH0453419B2 true JPH0453419B2 (en, 2012) 1992-08-26

Family

ID=12889658

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61051533A Granted JPS62240953A (ja) 1986-03-11 1986-03-11 レジスト

Country Status (1)

Country Link
JP (1) JPS62240953A (en, 2012)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4207264B4 (de) * 1992-03-07 2005-07-28 Clariant Gmbh Negativ arbeitendes strahlungsempfindliches Gemisch und damit hergestelltes Aufzeichnungsmaterial
AU1603101A (en) 1999-11-17 2001-05-30 E.I. Du Pont De Nemours And Company Nitrile/fluoroalcohol-containing photoresists and associated processes for microlithography
US6951705B2 (en) 2000-05-05 2005-10-04 E. I. Du Pont De Nemours And Company Polymers for photoresist compositions for microlithography
JP4586318B2 (ja) * 2000-09-11 2010-11-24 住友化学株式会社 ポジ型レジスト組成物
US6794109B2 (en) * 2001-02-23 2004-09-21 Massachusetts Institute Of Technology Low abosorbing resists for 157 nm lithography
JP4575479B2 (ja) 2008-07-11 2010-11-04 信越化学工業株式会社 化学増幅型ポジ型レジスト組成物及びパターン形成方法
JP5385017B2 (ja) 2008-07-11 2014-01-08 信越化学工業株式会社 レジストパターン形成方法及びフォトマスクの製造方法

Also Published As

Publication number Publication date
JPS62240953A (ja) 1987-10-21

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