JPH045259B2 - - Google Patents

Info

Publication number
JPH045259B2
JPH045259B2 JP60001170A JP117085A JPH045259B2 JP H045259 B2 JPH045259 B2 JP H045259B2 JP 60001170 A JP60001170 A JP 60001170A JP 117085 A JP117085 A JP 117085A JP H045259 B2 JPH045259 B2 JP H045259B2
Authority
JP
Japan
Prior art keywords
waste liquid
exhaust
development processing
section
piping
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60001170A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61160933A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP117085A priority Critical patent/JPS61160933A/ja
Publication of JPS61160933A publication Critical patent/JPS61160933A/ja
Publication of JPH045259B2 publication Critical patent/JPH045259B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP117085A 1985-01-08 1985-01-08 現像処理装置 Granted JPS61160933A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP117085A JPS61160933A (ja) 1985-01-08 1985-01-08 現像処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP117085A JPS61160933A (ja) 1985-01-08 1985-01-08 現像処理装置

Publications (2)

Publication Number Publication Date
JPS61160933A JPS61160933A (ja) 1986-07-21
JPH045259B2 true JPH045259B2 (enrdf_load_stackoverflow) 1992-01-30

Family

ID=11493958

Family Applications (1)

Application Number Title Priority Date Filing Date
JP117085A Granted JPS61160933A (ja) 1985-01-08 1985-01-08 現像処理装置

Country Status (1)

Country Link
JP (1) JPS61160933A (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0611023B2 (ja) * 1986-12-29 1994-02-09 東京エレクトロン株式会社 現像方法
US5088922A (en) * 1990-01-23 1992-02-18 Tokyo Electron Sagami Limited Heat-treatment apparatus having exhaust system
JP2002187249A (ja) * 2000-12-19 2002-07-02 Think Laboratory Co Ltd グラビア印刷用被製版ロールの製作・リサイクル処理・製版をマルチに行う方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5666044A (en) * 1979-11-05 1981-06-04 Toshiba Corp Semiconductor device
JPS5850738A (ja) * 1981-09-21 1983-03-25 Toshiba Corp レジストの塗布及び現像装置
JPS614576A (ja) * 1984-06-15 1986-01-10 Hoya Corp スプレ−方法

Also Published As

Publication number Publication date
JPS61160933A (ja) 1986-07-21

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term