JPH0450263B2 - - Google Patents
Info
- Publication number
- JPH0450263B2 JPH0450263B2 JP32562688A JP32562688A JPH0450263B2 JP H0450263 B2 JPH0450263 B2 JP H0450263B2 JP 32562688 A JP32562688 A JP 32562688A JP 32562688 A JP32562688 A JP 32562688A JP H0450263 B2 JPH0450263 B2 JP H0450263B2
- Authority
- JP
- Japan
- Prior art keywords
- quartz glass
- glass
- synthetic quartz
- nitrogen
- silica
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 50
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 18
- 229910021529 ammonia Inorganic materials 0.000 claims description 9
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 239000002245 particle Substances 0.000 claims description 2
- 239000002994 raw material Substances 0.000 claims description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 25
- 229910052757 nitrogen Inorganic materials 0.000 description 11
- 230000000704 physical effect Effects 0.000 description 7
- 239000011521 glass Substances 0.000 description 6
- 230000007062 hydrolysis Effects 0.000 description 5
- 238000006460 hydrolysis reaction Methods 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 238000009792 diffusion process Methods 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 239000000377 silicon dioxide Substances 0.000 description 4
- 238000003980 solgel method Methods 0.000 description 4
- 229910001873 dinitrogen Inorganic materials 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 235000012239 silicon dioxide Nutrition 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 2
- 238000000137 annealing Methods 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 229910001882 dioxygen Inorganic materials 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 230000003301 hydrolyzing effect Effects 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 235000011114 ammonium hydroxide Nutrition 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 239000006148 magnetic separator Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 239000005373 porous glass Substances 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 229910021642 ultra pure water Inorganic materials 0.000 description 1
- 239000012498 ultrapure water Substances 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
Landscapes
- Glass Melting And Manufacturing (AREA)
- Glass Compositions (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP32562688A JPH02172832A (ja) | 1988-12-22 | 1988-12-22 | 合成石英ガラスおよびその製造方法 |
| US07/404,585 US4979973A (en) | 1988-09-13 | 1989-09-08 | Preparation of fused silica glass by hydrolysis of methyl silicate |
| EP89402471A EP0360659B1 (en) | 1988-09-13 | 1989-09-11 | Synthetic fused silica glass and method for the preparation thereof |
| DE8989402471T DE68905735T2 (de) | 1988-09-13 | 1989-09-11 | Synthetisches geschmolzenes quarzglas und verfahren zu dessen herstellung. |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP32562688A JPH02172832A (ja) | 1988-12-22 | 1988-12-22 | 合成石英ガラスおよびその製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02172832A JPH02172832A (ja) | 1990-07-04 |
| JPH0450263B2 true JPH0450263B2 (enrdf_load_stackoverflow) | 1992-08-13 |
Family
ID=18178958
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP32562688A Granted JPH02172832A (ja) | 1988-09-13 | 1988-12-22 | 合成石英ガラスおよびその製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02172832A (enrdf_load_stackoverflow) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0394843A (ja) * | 1989-09-04 | 1991-04-19 | Shin Etsu Chem Co Ltd | 合成石英ガラスるつぼおよびその製造方法 |
| JPH085683B2 (ja) * | 1989-07-06 | 1996-01-24 | 信越石英株式会社 | 耐熱性及び加工性の優れた合成石英ガラス部材の製造方法 |
| TWI221486B (en) * | 1998-07-31 | 2004-10-01 | Shinetsu Handotai Kk | Quartz glass crucible for pulling silicon single crystal and production process for such |
-
1988
- 1988-12-22 JP JP32562688A patent/JPH02172832A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH02172832A (ja) | 1990-07-04 |
Similar Documents
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