JPH0436726B2 - - Google Patents
Info
- Publication number
- JPH0436726B2 JPH0436726B2 JP61205883A JP20588386A JPH0436726B2 JP H0436726 B2 JPH0436726 B2 JP H0436726B2 JP 61205883 A JP61205883 A JP 61205883A JP 20588386 A JP20588386 A JP 20588386A JP H0436726 B2 JPH0436726 B2 JP H0436726B2
- Authority
- JP
- Japan
- Prior art keywords
- exhaust gas
- gas
- reaction
- introduction pipe
- shower
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Incineration Of Waste (AREA)
- Treating Waste Gases (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61205883A JPS6362528A (ja) | 1986-09-03 | 1986-09-03 | 排気ガス処理装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61205883A JPS6362528A (ja) | 1986-09-03 | 1986-09-03 | 排気ガス処理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6362528A JPS6362528A (ja) | 1988-03-18 |
| JPH0436726B2 true JPH0436726B2 (OSRAM) | 1992-06-17 |
Family
ID=16514305
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61205883A Granted JPS6362528A (ja) | 1986-09-03 | 1986-09-03 | 排気ガス処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6362528A (OSRAM) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05154334A (ja) * | 1991-12-11 | 1993-06-22 | Fujitsu Ltd | 半導体製造装置の排気ポンプシステム |
| DE4320044A1 (de) * | 1993-06-17 | 1994-12-22 | Das Duennschicht Anlagen Sys | Verfahren und Einrichtung zur Reinigung von Abgasen |
| TW342436B (en) | 1996-08-14 | 1998-10-11 | Nippon Oxygen Co Ltd | Combustion type harm removal apparatus (1) |
| US5955037A (en) | 1996-12-31 | 1999-09-21 | Atmi Ecosys Corporation | Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gases |
| DE69921853T2 (de) * | 1998-12-01 | 2005-12-08 | Ebara Corp. | Vorrichtung zur behandlung von abgas |
| JP2002166126A (ja) * | 2000-12-04 | 2002-06-11 | Sumitomo Seika Chem Co Ltd | 燃焼排ガスの処理装置 |
| GB0505852D0 (en) * | 2005-03-22 | 2005-04-27 | Boc Group Plc | Method of treating a gas stream |
| JP4755526B2 (ja) * | 2006-04-20 | 2011-08-24 | 田島応用化工株式会社 | 防水材 |
| JP7285167B2 (ja) * | 2019-08-22 | 2023-06-01 | 株式会社荏原製作所 | 排ガス処理装置 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59193522U (ja) * | 1983-06-08 | 1984-12-22 | 日本電気株式会社 | 廃ガス洗浄処理装置 |
-
1986
- 1986-09-03 JP JP61205883A patent/JPS6362528A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6362528A (ja) | 1988-03-18 |
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