JPH0435062B2 - - Google Patents

Info

Publication number
JPH0435062B2
JPH0435062B2 JP60041699A JP4169985A JPH0435062B2 JP H0435062 B2 JPH0435062 B2 JP H0435062B2 JP 60041699 A JP60041699 A JP 60041699A JP 4169985 A JP4169985 A JP 4169985A JP H0435062 B2 JPH0435062 B2 JP H0435062B2
Authority
JP
Japan
Prior art keywords
compound
photosensitive composition
vinyl
molecule
weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60041699A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61200536A (ja
Inventor
Noboru Sugasawa
Nobuyuki Hayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP4169985A priority Critical patent/JPS61200536A/ja
Publication of JPS61200536A publication Critical patent/JPS61200536A/ja
Publication of JPH0435062B2 publication Critical patent/JPH0435062B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
JP4169985A 1985-03-01 1985-03-01 感光性組成物 Granted JPS61200536A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4169985A JPS61200536A (ja) 1985-03-01 1985-03-01 感光性組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4169985A JPS61200536A (ja) 1985-03-01 1985-03-01 感光性組成物

Publications (2)

Publication Number Publication Date
JPS61200536A JPS61200536A (ja) 1986-09-05
JPH0435062B2 true JPH0435062B2 (de) 1992-06-09

Family

ID=12615662

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4169985A Granted JPS61200536A (ja) 1985-03-01 1985-03-01 感光性組成物

Country Status (1)

Country Link
JP (1) JPS61200536A (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61264341A (ja) * 1985-05-20 1986-11-22 Hitachi Chem Co Ltd 感光性樹脂組成物
JPS61264340A (ja) * 1985-05-20 1986-11-22 Hitachi Chem Co Ltd 感光性樹脂組成物
DE3619130A1 (de) * 1986-06-06 1987-12-10 Basf Ag Lichtempfindliches aufzeichnungselement

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5755914A (en) * 1980-09-19 1982-04-03 Hitachi Chem Co Ltd Photopolymer composition and photosensitive element
JPS5936246A (ja) * 1975-12-19 1984-02-28 バイエル・アクチエンゲゼルシヤフト 樹脂組成物
JPS60188413A (ja) * 1984-03-09 1985-09-25 Toyobo Co Ltd 光重合性樹脂組成物
JPS60195171A (ja) * 1984-03-19 1985-10-03 Mitsubishi Rayon Co Ltd 紫外線硬化型インキ組成物
JPS61130946A (ja) * 1984-11-29 1986-06-18 Hitachi Chem Co Ltd 感光性樹脂組成物

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5936246A (ja) * 1975-12-19 1984-02-28 バイエル・アクチエンゲゼルシヤフト 樹脂組成物
JPS5755914A (en) * 1980-09-19 1982-04-03 Hitachi Chem Co Ltd Photopolymer composition and photosensitive element
JPS60188413A (ja) * 1984-03-09 1985-09-25 Toyobo Co Ltd 光重合性樹脂組成物
JPS60195171A (ja) * 1984-03-19 1985-10-03 Mitsubishi Rayon Co Ltd 紫外線硬化型インキ組成物
JPS61130946A (ja) * 1984-11-29 1986-06-18 Hitachi Chem Co Ltd 感光性樹脂組成物

Also Published As

Publication number Publication date
JPS61200536A (ja) 1986-09-05

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