JPH0428431B2 - - Google Patents

Info

Publication number
JPH0428431B2
JPH0428431B2 JP59123275A JP12327584A JPH0428431B2 JP H0428431 B2 JPH0428431 B2 JP H0428431B2 JP 59123275 A JP59123275 A JP 59123275A JP 12327584 A JP12327584 A JP 12327584A JP H0428431 B2 JPH0428431 B2 JP H0428431B2
Authority
JP
Japan
Prior art keywords
valve
system pipe
substrate
exhaust system
waste liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59123275A
Other languages
English (en)
Japanese (ja)
Other versions
JPS614576A (ja
Inventor
Kyofumi Yamada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoya Corp
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Priority to JP12327584A priority Critical patent/JPS614576A/ja
Publication of JPS614576A publication Critical patent/JPS614576A/ja
Publication of JPH0428431B2 publication Critical patent/JPH0428431B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Weting (AREA)
JP12327584A 1984-06-15 1984-06-15 スプレ−方法 Granted JPS614576A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12327584A JPS614576A (ja) 1984-06-15 1984-06-15 スプレ−方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12327584A JPS614576A (ja) 1984-06-15 1984-06-15 スプレ−方法

Publications (2)

Publication Number Publication Date
JPS614576A JPS614576A (ja) 1986-01-10
JPH0428431B2 true JPH0428431B2 (cg-RX-API-DMAC7.html) 1992-05-14

Family

ID=14856531

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12327584A Granted JPS614576A (ja) 1984-06-15 1984-06-15 スプレ−方法

Country Status (1)

Country Link
JP (1) JPS614576A (cg-RX-API-DMAC7.html)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61160933A (ja) * 1985-01-08 1986-07-21 Nec Corp 現像処理装置
JPS6314434A (ja) * 1986-07-04 1988-01-21 Dainippon Screen Mfg Co Ltd 基板表面処理方法および装置
JPH0719764B2 (ja) * 1986-07-28 1995-03-06 大日本スクリ−ン製造株式会社 表面洗浄方法
JPH0611023B2 (ja) * 1986-12-29 1994-02-09 東京エレクトロン株式会社 現像方法
JP2901364B2 (ja) * 1991-03-18 1999-06-07 山形日本電気株式会社 半導体装置の製造装置
JPH0817815A (ja) * 1994-06-30 1996-01-19 Toshiba Corp 半導体デバイスの製造方法、半導体基板の処理方法、分析方法及び製造方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56146467U (cg-RX-API-DMAC7.html) * 1980-03-28 1981-11-05

Also Published As

Publication number Publication date
JPS614576A (ja) 1986-01-10

Similar Documents

Publication Publication Date Title
US6402845B1 (en) Process liquid dispense method and apparatus
JPS60210840A (ja) スピン処理装置
JPH0428431B2 (cg-RX-API-DMAC7.html)
JPS623971B2 (cg-RX-API-DMAC7.html)
JPH0439664B2 (cg-RX-API-DMAC7.html)
US6692164B2 (en) Apparatus for cleaning a substrate on which a resist pattern is formed
JPH06182283A (ja) 薬液ノズル
KR100790253B1 (ko) 감광막 현상 장치 및 방법
JPS581144A (ja) フオトレジストの塗布方法
JPS62185322A (ja) フオトレジスト塗布装置
JPS59115763A (ja) 超音波フオグ処理装置
JPH0263289B2 (cg-RX-API-DMAC7.html)
JP3062634U (ja) レジストパタ―ン付き基板、フォトマスク、及び現像装置
JPS6334620B2 (cg-RX-API-DMAC7.html)
JPS61184824A (ja) レジスト塗布方法およびレジスト塗布装置
JPS5891637A (ja) 現像装置
JPS6161416A (ja) 半導体製造装置
US20030129544A1 (en) Method for forming resist pattern
JPH03232219A (ja) フオトレジスト塗布装置
JPH0320017A (ja) 半導体製造装置
JPH03278854A (ja) エッジビード除去機構を備えた回転塗布装置
JPH0281050A (ja) フォトレジストの表面処理方法およびその装置
JPH03190120A (ja) レジスト現像装置
JPS59202630A (ja) 半導体装置の製造方法
KR19990039616U (ko) 감광제의 접착력 증대를 위한 화합물 분무장치

Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees