JPH0425693B2 - - Google Patents
Info
- Publication number
- JPH0425693B2 JPH0425693B2 JP58031212A JP3121283A JPH0425693B2 JP H0425693 B2 JPH0425693 B2 JP H0425693B2 JP 58031212 A JP58031212 A JP 58031212A JP 3121283 A JP3121283 A JP 3121283A JP H0425693 B2 JPH0425693 B2 JP H0425693B2
- Authority
- JP
- Japan
- Prior art keywords
- fine pattern
- organic silicon
- silicon compound
- film
- photosensitive film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000000034 method Methods 0.000 claims description 15
- 150000003377 silicon compounds Chemical class 0.000 claims description 9
- 239000004065 semiconductor Substances 0.000 claims description 7
- 239000000463 material Substances 0.000 claims description 6
- 239000000758 substrate Substances 0.000 claims description 4
- 238000005530 etching Methods 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims description 3
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 229940126543 compound 14 Drugs 0.000 description 4
- 230000018109 developmental process Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 2
- 150000003961 organosilicon compounds Chemical class 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Weting (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58031212A JPS59155929A (ja) | 1983-02-25 | 1983-02-25 | 微細パタ−ンの形成方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58031212A JPS59155929A (ja) | 1983-02-25 | 1983-02-25 | 微細パタ−ンの形成方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59155929A JPS59155929A (ja) | 1984-09-05 |
| JPH0425693B2 true JPH0425693B2 (enrdf_load_stackoverflow) | 1992-05-01 |
Family
ID=12325121
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58031212A Granted JPS59155929A (ja) | 1983-02-25 | 1983-02-25 | 微細パタ−ンの形成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59155929A (enrdf_load_stackoverflow) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60218843A (ja) * | 1984-04-13 | 1985-11-01 | Nippon Telegr & Teleph Corp <Ntt> | パタン形成方法 |
| US5330879A (en) * | 1992-07-16 | 1994-07-19 | Micron Technology, Inc. | Method for fabrication of close-tolerance lines and sharp emission tips on a semiconductor wafer |
-
1983
- 1983-02-25 JP JP58031212A patent/JPS59155929A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59155929A (ja) | 1984-09-05 |
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