JPH04219B2 - - Google Patents
Info
- Publication number
- JPH04219B2 JPH04219B2 JP58017380A JP1738083A JPH04219B2 JP H04219 B2 JPH04219 B2 JP H04219B2 JP 58017380 A JP58017380 A JP 58017380A JP 1738083 A JP1738083 A JP 1738083A JP H04219 B2 JPH04219 B2 JP H04219B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- gas
- gas detection
- substrate
- heater
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000001514 detection method Methods 0.000 claims description 75
- 239000000758 substrate Substances 0.000 claims description 32
- 239000004065 semiconductor Substances 0.000 claims description 24
- 238000005530 etching Methods 0.000 claims description 20
- 239000000463 material Substances 0.000 claims description 18
- 229910044991 metal oxide Inorganic materials 0.000 claims description 4
- 150000004706 metal oxides Chemical class 0.000 claims description 4
- 239000010408 film Substances 0.000 description 16
- 238000000034 method Methods 0.000 description 13
- 229910004298 SiO 2 Inorganic materials 0.000 description 12
- 238000010586 diagram Methods 0.000 description 11
- 238000010438 heat treatment Methods 0.000 description 7
- 238000001552 radio frequency sputter deposition Methods 0.000 description 7
- 239000000243 solution Substances 0.000 description 7
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 6
- 238000001312 dry etching Methods 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000001259 photo etching Methods 0.000 description 4
- 229910017855 NH 4 F Inorganic materials 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 239000000428 dust Substances 0.000 description 3
- 238000001179 sorption measurement Methods 0.000 description 3
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical group O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- NNPPMTNAJDCUHE-UHFFFAOYSA-N isobutane Chemical compound CC(C)C NNPPMTNAJDCUHE-UHFFFAOYSA-N 0.000 description 2
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical group [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 238000000992 sputter etching Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- 229910006404 SnO 2 Inorganic materials 0.000 description 1
- 229920000535 Tan II Polymers 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 239000011491 glass wool Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000001282 iso-butane Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/02—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance
- G01N27/04—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance
- G01N27/12—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance of a solid body in dependence upon absorption of a fluid; of a solid body in dependence upon reaction with a fluid, for detecting components in the fluid
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Or Analyzing Materials By The Use Of Fluid Adsorption Or Reactions (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1738083A JPS59143945A (ja) | 1983-02-07 | 1983-02-07 | ガス検出装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1738083A JPS59143945A (ja) | 1983-02-07 | 1983-02-07 | ガス検出装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59143945A JPS59143945A (ja) | 1984-08-17 |
| JPH04219B2 true JPH04219B2 (xx) | 1992-01-06 |
Family
ID=11942397
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1738083A Granted JPS59143945A (ja) | 1983-02-07 | 1983-02-07 | ガス検出装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59143945A (xx) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4706493A (en) * | 1985-12-13 | 1987-11-17 | General Motors Corporation | Semiconductor gas sensor having thermally isolated site |
Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4948793A (xx) * | 1972-05-04 | 1974-05-11 | ||
| JPS5374495A (en) * | 1976-12-14 | 1978-07-01 | Marukon Denshi Kk | Gas responsive element |
| JPS5521090U (xx) * | 1978-07-31 | 1980-02-09 | ||
| JPS5618752A (en) * | 1979-07-25 | 1981-02-21 | Ricoh Co Ltd | Driving method for sensor |
| JPS5618750A (en) * | 1979-07-25 | 1981-02-21 | Ricoh Co Ltd | Gas detector |
| JPS5717849A (en) * | 1980-05-21 | 1982-01-29 | Siemens Ag | Thin film gas sensor |
| JPS5723849A (en) * | 1980-07-18 | 1982-02-08 | Matsushita Electric Ind Co Ltd | Gas detector and its manufacture |
| JPS5794641A (en) * | 1980-12-04 | 1982-06-12 | Ricoh Co Ltd | Manufacture of electric heater |
| JPS58103654A (ja) * | 1981-12-16 | 1983-06-20 | Matsushita Electric Ind Co Ltd | 多機能ガスセンサ |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56109047U (xx) * | 1980-01-23 | 1981-08-24 |
-
1983
- 1983-02-07 JP JP1738083A patent/JPS59143945A/ja active Granted
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4948793A (xx) * | 1972-05-04 | 1974-05-11 | ||
| JPS5374495A (en) * | 1976-12-14 | 1978-07-01 | Marukon Denshi Kk | Gas responsive element |
| JPS5521090U (xx) * | 1978-07-31 | 1980-02-09 | ||
| JPS5618752A (en) * | 1979-07-25 | 1981-02-21 | Ricoh Co Ltd | Driving method for sensor |
| JPS5618750A (en) * | 1979-07-25 | 1981-02-21 | Ricoh Co Ltd | Gas detector |
| JPS5717849A (en) * | 1980-05-21 | 1982-01-29 | Siemens Ag | Thin film gas sensor |
| JPS5723849A (en) * | 1980-07-18 | 1982-02-08 | Matsushita Electric Ind Co Ltd | Gas detector and its manufacture |
| JPS5794641A (en) * | 1980-12-04 | 1982-06-12 | Ricoh Co Ltd | Manufacture of electric heater |
| JPS58103654A (ja) * | 1981-12-16 | 1983-06-20 | Matsushita Electric Ind Co Ltd | 多機能ガスセンサ |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59143945A (ja) | 1984-08-17 |
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