JPH0421184B2 - - Google Patents

Info

Publication number
JPH0421184B2
JPH0421184B2 JP59120567A JP12056784A JPH0421184B2 JP H0421184 B2 JPH0421184 B2 JP H0421184B2 JP 59120567 A JP59120567 A JP 59120567A JP 12056784 A JP12056784 A JP 12056784A JP H0421184 B2 JPH0421184 B2 JP H0421184B2
Authority
JP
Japan
Prior art keywords
acid
photopolymerizable
photosensitive
water
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59120567A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60263141A (ja
Inventor
Mitsuru Koike
Kesanao Kobayashi
Tadao Toyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP12056784A priority Critical patent/JPS60263141A/ja
Publication of JPS60263141A publication Critical patent/JPS60263141A/ja
Publication of JPH0421184B2 publication Critical patent/JPH0421184B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
JP12056784A 1984-06-12 1984-06-12 光重合性感光材料 Granted JPS60263141A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12056784A JPS60263141A (ja) 1984-06-12 1984-06-12 光重合性感光材料

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12056784A JPS60263141A (ja) 1984-06-12 1984-06-12 光重合性感光材料

Publications (2)

Publication Number Publication Date
JPS60263141A JPS60263141A (ja) 1985-12-26
JPH0421184B2 true JPH0421184B2 (en, 2012) 1992-04-08

Family

ID=14789499

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12056784A Granted JPS60263141A (ja) 1984-06-12 1984-06-12 光重合性感光材料

Country Status (1)

Country Link
JP (1) JPS60263141A (en, 2012)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62223747A (ja) * 1986-03-25 1987-10-01 Toyobo Co Ltd 画像形成板
GB8700599D0 (en) * 1987-01-12 1987-02-18 Vickers Plc Printing plate precursors
EP0497819B1 (en) * 1989-10-31 1996-04-10 E.I. Du Pont De Nemours And Company A release layer for an aqueous or semi-aqueous processible flexographic printing plate
US5677108A (en) * 1995-04-28 1997-10-14 Polaroid Corporation On-press removable quenching overcoat for lithographic plates
US5786127A (en) * 1996-08-15 1998-07-28 Western Litho Plate & Supply Co. Photosensitive element having an overcoat which increases photo-speed and is substantially impermeable to oxygen
JP3851594B2 (ja) * 2002-07-04 2006-11-29 Ａｚエレクトロニックマテリアルズ株式会社 反射防止コーティング用組成物およびパターン形成方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5034966B2 (en, 2012) * 1972-07-24 1975-11-12
JPS5133619A (en) * 1974-09-17 1976-03-22 Asahi Chemical Ind Reriifunosakuseihoho
JPS5260615A (en) * 1975-11-14 1977-05-19 Asahi Chemical Ind Photosensitive resin forming element
JPS52109926A (en) * 1976-02-25 1977-09-14 Fuji Photo Film Co Ltd Metallic image forming material

Also Published As

Publication number Publication date
JPS60263141A (ja) 1985-12-26

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