JPH0379416B2 - - Google Patents
Info
- Publication number
- JPH0379416B2 JPH0379416B2 JP60265621A JP26562185A JPH0379416B2 JP H0379416 B2 JPH0379416 B2 JP H0379416B2 JP 60265621 A JP60265621 A JP 60265621A JP 26562185 A JP26562185 A JP 26562185A JP H0379416 B2 JPH0379416 B2 JP H0379416B2
- Authority
- JP
- Japan
- Prior art keywords
- wire
- weight
- bonding
- gold
- copper
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/50—Bond wires
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/50—Bond wires
- H10W72/551—Materials of bond wires
- H10W72/552—Materials of bond wires comprising metals or metalloids, e.g. silver
- H10W72/5522—Materials of bond wires comprising metals or metalloids, e.g. silver comprising gold [Au]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/50—Bond wires
- H10W72/551—Materials of bond wires
- H10W72/552—Materials of bond wires comprising metals or metalloids, e.g. silver
- H10W72/5525—Materials of bond wires comprising metals or metalloids, e.g. silver comprising copper [Cu]
Landscapes
- Wire Bonding (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60265621A JPS62127438A (ja) | 1985-11-26 | 1985-11-26 | 半導体素子用ボンディング線 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60265621A JPS62127438A (ja) | 1985-11-26 | 1985-11-26 | 半導体素子用ボンディング線 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62127438A JPS62127438A (ja) | 1987-06-09 |
| JPH0379416B2 true JPH0379416B2 (enExample) | 1991-12-18 |
Family
ID=17419675
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60265621A Granted JPS62127438A (ja) | 1985-11-26 | 1985-11-26 | 半導体素子用ボンディング線 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62127438A (enExample) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0785483B2 (ja) * | 1986-07-15 | 1995-09-13 | 株式会社東芝 | 半導体装置 |
| JPH0785484B2 (ja) * | 1986-07-16 | 1995-09-13 | 株式会社東芝 | 半導体装置 |
| JPH0785485B2 (ja) * | 1986-07-23 | 1995-09-13 | 株式会社東芝 | 半導体装置 |
| JPS63241127A (ja) * | 1987-03-27 | 1988-10-06 | Mitsubishi Metal Corp | 半導体装置のボンデイングワイヤ用Cu合金極細線 |
| JP2726939B2 (ja) * | 1989-03-06 | 1998-03-11 | 日鉱金属 株式会社 | 加工性,耐熱性の優れた高導電性銅合金 |
| US6455937B1 (en) | 1998-03-20 | 2002-09-24 | James A. Cunningham | Arrangement and method for improved downward scaling of higher conductivity metal-based interconnects |
| US6113761A (en) | 1999-06-02 | 2000-09-05 | Johnson Matthey Electronics, Inc. | Copper sputtering target assembly and method of making same |
| US6858102B1 (en) | 2000-11-15 | 2005-02-22 | Honeywell International Inc. | Copper-containing sputtering targets, and methods of forming copper-containing sputtering targets |
| US6551872B1 (en) | 1999-07-22 | 2003-04-22 | James A. Cunningham | Method for making integrated circuit including interconnects with enhanced electromigration resistance using doped seed layer and integrated circuits produced thereby |
| US6521532B1 (en) | 1999-07-22 | 2003-02-18 | James A. Cunningham | Method for making integrated circuit including interconnects with enhanced electromigration resistance |
| US6441492B1 (en) | 1999-09-10 | 2002-08-27 | James A. Cunningham | Diffusion barriers for copper interconnect systems |
| JP2003529206A (ja) | 1999-11-24 | 2003-09-30 | ハネウェル・インターナショナル・インコーポレーテッド | 物理蒸着ターゲット、導電性集積回路金属合金相互接続配線、電気めっきアノード、集積回路における導電性相互接続配線として用いるための金属合金 |
| JP4750112B2 (ja) | 2005-06-15 | 2011-08-17 | Jx日鉱日石金属株式会社 | 超高純度銅及びその製造方法並びに超高純度銅からなるボンディングワイヤ |
-
1985
- 1985-11-26 JP JP60265621A patent/JPS62127438A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62127438A (ja) | 1987-06-09 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |