JPH0375855B2 - - Google Patents
Info
- Publication number
- JPH0375855B2 JPH0375855B2 JP27296788A JP27296788A JPH0375855B2 JP H0375855 B2 JPH0375855 B2 JP H0375855B2 JP 27296788 A JP27296788 A JP 27296788A JP 27296788 A JP27296788 A JP 27296788A JP H0375855 B2 JPH0375855 B2 JP H0375855B2
- Authority
- JP
- Japan
- Prior art keywords
- ion beam
- mask
- ion
- deflection electrode
- defect
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000007547 defect Effects 0.000 claims description 40
- 238000010884 ion-beam technique Methods 0.000 claims description 40
- 230000002950 deficient Effects 0.000 claims description 18
- 238000000034 method Methods 0.000 claims description 13
- 239000002245 particle Substances 0.000 claims description 6
- 230000001678 irradiating effect Effects 0.000 claims description 2
- 230000003068 static effect Effects 0.000 claims 1
- 150000002500 ions Chemical class 0.000 description 9
- 239000011521 glass Substances 0.000 description 7
- 239000000758 substrate Substances 0.000 description 7
- 206010027146 Melanoderma Diseases 0.000 description 3
- 238000012937 correction Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
Landscapes
- Engineering & Computer Science (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Chemical & Material Sciences (AREA)
- Combustion & Propulsion (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63272967A JPH01158450A (ja) | 1988-10-31 | 1988-10-31 | マスクの欠陥修正方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63272967A JPH01158450A (ja) | 1988-10-31 | 1988-10-31 | マスクの欠陥修正方法 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61213821A Division JPS6285253A (ja) | 1986-09-12 | 1986-09-12 | マスクの欠陥修正方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH01158450A JPH01158450A (ja) | 1989-06-21 |
JPH0375855B2 true JPH0375855B2 (enrdf_load_stackoverflow) | 1991-12-03 |
Family
ID=17521286
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63272967A Granted JPH01158450A (ja) | 1988-10-31 | 1988-10-31 | マスクの欠陥修正方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01158450A (enrdf_load_stackoverflow) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2025320A1 (fr) | 2007-08-10 | 2009-02-18 | L'Oréal | Ensemble de conditionnement et d'application d'un vernis à ongles de viscosité élevée |
-
1988
- 1988-10-31 JP JP63272967A patent/JPH01158450A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPH01158450A (ja) | 1989-06-21 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS627540B2 (enrdf_load_stackoverflow) | ||
EP0298495B1 (en) | Method and apparatus for correcting defects of x-ray mask | |
JPS59208830A (ja) | イオンビ−ム加工方法およびその装置 | |
JPH0456210A (ja) | 電子ビーム露光装置 | |
JPH0375855B2 (enrdf_load_stackoverflow) | ||
JPH01154064A (ja) | 微細パターンの形成方法 | |
JPS6339894B2 (enrdf_load_stackoverflow) | ||
JPH04251254A (ja) | イオンビーム加工方法 | |
JPS6237387B2 (enrdf_load_stackoverflow) | ||
JPH0512851B2 (enrdf_load_stackoverflow) | ||
JPS6251218A (ja) | 電子線描画装置 | |
JPS63155145A (ja) | マスクの白点欠陥修正方法 | |
JPS6184833A (ja) | マスクパタ−ン欠陥検査修正装置 | |
JP3168032B2 (ja) | 電子ビーム露光装置及び描画パターンを検査する方法 | |
JP2672808B2 (ja) | イオンビーム加工装置 | |
JP2898726B2 (ja) | 荷電粒子ビーム露光方法 | |
JPS59169133A (ja) | パタ−ン修正装置 | |
JP2799861B2 (ja) | パターン膜修正方法 | |
JPS6186753A (ja) | マスク欠陥修正終了検出方法 | |
JP2590703B2 (ja) | イオンビーム加工装置 | |
JP2561933B2 (ja) | パターン膜修正装置 | |
JPS59152623A (ja) | 荷電粒子線露光方法 | |
JPH0260A (ja) | イオンビーム加工装置 | |
JPS6065532A (ja) | イオンビ−ムによるマスクリペア−装置 | |
JP2525221B2 (ja) | マスク修正装置 |