JPH0371779B2 - - Google Patents

Info

Publication number
JPH0371779B2
JPH0371779B2 JP6609082A JP6609082A JPH0371779B2 JP H0371779 B2 JPH0371779 B2 JP H0371779B2 JP 6609082 A JP6609082 A JP 6609082A JP 6609082 A JP6609082 A JP 6609082A JP H0371779 B2 JPH0371779 B2 JP H0371779B2
Authority
JP
Japan
Prior art keywords
foreign matter
foreign
inspected
mask
removal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP6609082A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58182826A (ja
Inventor
Kazunori Imamura
Shoichi Tanimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Kogaku KK filed Critical Nippon Kogaku KK
Priority to JP57066090A priority Critical patent/JPS58182826A/ja
Publication of JPS58182826A publication Critical patent/JPS58182826A/ja
Publication of JPH0371779B2 publication Critical patent/JPH0371779B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass

Landscapes

  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP57066090A 1982-04-20 1982-04-20 異物の自動除去装置 Granted JPS58182826A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57066090A JPS58182826A (ja) 1982-04-20 1982-04-20 異物の自動除去装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57066090A JPS58182826A (ja) 1982-04-20 1982-04-20 異物の自動除去装置

Publications (2)

Publication Number Publication Date
JPS58182826A JPS58182826A (ja) 1983-10-25
JPH0371779B2 true JPH0371779B2 (enExample) 1991-11-14

Family

ID=13305809

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57066090A Granted JPS58182826A (ja) 1982-04-20 1982-04-20 異物の自動除去装置

Country Status (1)

Country Link
JP (1) JPS58182826A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20220299882A1 (en) * 2021-03-19 2022-09-22 Taiwan Semiconductor Manufacturing Co., Ltd. System and method for cleaning an euv mask within a scanner

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60110194A (ja) * 1983-11-18 1985-06-15 株式会社ニコン 基板の洗浄装置
JPH10260027A (ja) * 1997-03-17 1998-09-29 Sumitomo Electric Ind Ltd 絶縁テープの異物検出・除去装置
JP3998790B2 (ja) * 1998-01-16 2007-10-31 大日本印刷株式会社 マスク準備装置
JP2002076569A (ja) * 2000-08-30 2002-03-15 Dainippon Screen Mfg Co Ltd プリント基板の検査装置
JP4118082B2 (ja) * 2002-05-08 2008-07-16 株式会社きもと フォトマスク用保護膜修正方法
JP2008105015A (ja) * 2006-09-29 2008-05-08 Nitto Denko Corp ワーククリーニング用のテープカートリッジ
JP2008109096A (ja) * 2006-09-29 2008-05-08 Nitto Denko Corp ワーククリーニング方法
JP2011081282A (ja) * 2009-10-09 2011-04-21 Hoya Corp フォトマスク用欠陥修正方法、フォトマスク用欠陥修正装置、フォトマスク用欠陥修正ヘッド、及びフォトマスク用欠陥検査装置、並びにフォトマスクの製造方法
JP5164178B2 (ja) * 2009-12-25 2013-03-13 レーザーテック株式会社 基板検査装置、異物除去装置および異物除去方法
WO2014032887A1 (en) * 2012-08-31 2014-03-06 Asml Netherlands B.V. Reticle cleaning by means of sticky surface
JP2014220495A (ja) * 2013-04-12 2014-11-20 レーザーテック株式会社 異物除去装置
JP6064831B2 (ja) 2013-08-08 2017-01-25 三菱電機株式会社 試験装置、試験方法
JP6554864B2 (ja) * 2015-03-30 2019-08-07 大日本印刷株式会社 ペリクル接着剤除去装置及びペリクル接着剤除去方法
US10416575B2 (en) * 2016-11-16 2019-09-17 Suss Microtec Photomask Equipment Gmbh & Co. Kg Apparatus and method for cleaning a partial area of a substrate
JP2018195852A (ja) * 2018-08-30 2018-12-06 大日本印刷株式会社 異物除去用基板
US11017996B2 (en) * 2019-04-05 2021-05-25 Asm Technology Singapore Pte Ltd Automated particle removal system
CN110756465B (zh) * 2019-09-16 2022-05-10 苏州筹策智能科技有限公司 Pcb板检测擦拭一体机

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20220299882A1 (en) * 2021-03-19 2022-09-22 Taiwan Semiconductor Manufacturing Co., Ltd. System and method for cleaning an euv mask within a scanner
US12650650B2 (en) * 2021-03-19 2026-06-09 Taiwan Semiconductor Manufacturing Co., Ltd. System and method for cleaning an EUV mask within a scanner

Also Published As

Publication number Publication date
JPS58182826A (ja) 1983-10-25

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