JPH0365538B2 - - Google Patents

Info

Publication number
JPH0365538B2
JPH0365538B2 JP12473584A JP12473584A JPH0365538B2 JP H0365538 B2 JPH0365538 B2 JP H0365538B2 JP 12473584 A JP12473584 A JP 12473584A JP 12473584 A JP12473584 A JP 12473584A JP H0365538 B2 JPH0365538 B2 JP H0365538B2
Authority
JP
Japan
Prior art keywords
pattern
light
photosensitive resin
original pattern
semi
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP12473584A
Other languages
English (en)
Japanese (ja)
Other versions
JPS614063A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP59124735A priority Critical patent/JPS614063A/ja
Publication of JPS614063A publication Critical patent/JPS614063A/ja
Publication of JPH0365538B2 publication Critical patent/JPH0365538B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP59124735A 1984-06-18 1984-06-18 感光性樹脂層の凹凸成型方法、それに用いる半遮光性材料及び該材料を張り付けた原稿パタ−ン Granted JPS614063A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59124735A JPS614063A (ja) 1984-06-18 1984-06-18 感光性樹脂層の凹凸成型方法、それに用いる半遮光性材料及び該材料を張り付けた原稿パタ−ン

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59124735A JPS614063A (ja) 1984-06-18 1984-06-18 感光性樹脂層の凹凸成型方法、それに用いる半遮光性材料及び該材料を張り付けた原稿パタ−ン

Publications (2)

Publication Number Publication Date
JPS614063A JPS614063A (ja) 1986-01-09
JPH0365538B2 true JPH0365538B2 (ko) 1991-10-14

Family

ID=14892812

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59124735A Granted JPS614063A (ja) 1984-06-18 1984-06-18 感光性樹脂層の凹凸成型方法、それに用いる半遮光性材料及び該材料を張り付けた原稿パタ−ン

Country Status (1)

Country Link
JP (1) JPS614063A (ko)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001188354A (ja) * 1999-12-28 2001-07-10 Asahi Kasei Corp 感光性樹脂凸版の製造方法、及びその製造装置
JP4698044B2 (ja) * 2001-03-09 2011-06-08 旭化成イーマテリアルズ株式会社 感光性樹脂凸版の製造方法、装置
JP4080839B2 (ja) * 2002-10-21 2008-04-23 シャープ株式会社 フレキソ印刷版の製造方法および印刷物の製造方法
JP2006167937A (ja) * 2004-12-13 2006-06-29 Toppan Printing Co Ltd パターン毎に版深が異なる刷版用凹版及びその製造方法
US9720326B2 (en) * 2009-10-01 2017-08-01 David A. Recchia Method of improving print performance in flexographic printing plates

Also Published As

Publication number Publication date
JPS614063A (ja) 1986-01-09

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