JPH0363739B2 - - Google Patents

Info

Publication number
JPH0363739B2
JPH0363739B2 JP57212617A JP21261782A JPH0363739B2 JP H0363739 B2 JPH0363739 B2 JP H0363739B2 JP 57212617 A JP57212617 A JP 57212617A JP 21261782 A JP21261782 A JP 21261782A JP H0363739 B2 JPH0363739 B2 JP H0363739B2
Authority
JP
Japan
Prior art keywords
photosensitive resin
polyvinyl acetate
polymerization
photosensitive
partially saponified
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57212617A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59102228A (ja
Inventor
Junichi Fujikawa
Shigetora Kashio
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Priority to JP21261782A priority Critical patent/JPS59102228A/ja
Publication of JPS59102228A publication Critical patent/JPS59102228A/ja
Publication of JPH0363739B2 publication Critical patent/JPH0363739B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G03F7/0955Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer one of the photosensitive systems comprising a non-macromolecular photopolymerisable compound having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP21261782A 1982-12-06 1982-12-06 感光性樹脂版材 Granted JPS59102228A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21261782A JPS59102228A (ja) 1982-12-06 1982-12-06 感光性樹脂版材

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21261782A JPS59102228A (ja) 1982-12-06 1982-12-06 感光性樹脂版材

Publications (2)

Publication Number Publication Date
JPS59102228A JPS59102228A (ja) 1984-06-13
JPH0363739B2 true JPH0363739B2 (de) 1991-10-02

Family

ID=16625638

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21261782A Granted JPS59102228A (ja) 1982-12-06 1982-12-06 感光性樹脂版材

Country Status (1)

Country Link
JP (1) JPS59102228A (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61103150A (ja) * 1984-10-26 1986-05-21 Toray Ind Inc 感光性樹脂組成物
EP3346333B1 (de) * 2015-09-03 2020-03-18 Toray Industries, Inc. Lichtempfindlicher harzdruckplattenvorläufer und verfahren zur herstellung einer druckplatte
JPWO2022054427A1 (de) * 2020-09-14 2022-03-17

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5245402A (en) * 1975-10-07 1977-04-09 Murakami Screen Kk Photoosensitive composition and photoosensitive film for screen plate
JPS5785048A (en) * 1980-11-17 1982-05-27 Daicel Chem Ind Ltd Exposed photosensitive diazo film for making screen plate

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5245402A (en) * 1975-10-07 1977-04-09 Murakami Screen Kk Photoosensitive composition and photoosensitive film for screen plate
JPS5785048A (en) * 1980-11-17 1982-05-27 Daicel Chem Ind Ltd Exposed photosensitive diazo film for making screen plate

Also Published As

Publication number Publication date
JPS59102228A (ja) 1984-06-13

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