JPH0363569U - - Google Patents
Info
- Publication number
- JPH0363569U JPH0363569U JP12306389U JP12306389U JPH0363569U JP H0363569 U JPH0363569 U JP H0363569U JP 12306389 U JP12306389 U JP 12306389U JP 12306389 U JP12306389 U JP 12306389U JP H0363569 U JPH0363569 U JP H0363569U
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- film forming
- forming apparatus
- evaporation source
- electron
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005566 electron beam evaporation Methods 0.000 claims description 3
- 239000000758 substrate Substances 0.000 claims description 3
- 239000010409 thin film Substances 0.000 claims 5
- 230000008020 evaporation Effects 0.000 claims 3
- 238000001704 evaporation Methods 0.000 claims 3
- 239000010408 film Substances 0.000 claims 2
- 239000000463 material Substances 0.000 claims 1
Landscapes
- Physical Vapour Deposition (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Description
図はこの考案の実施例の真空容器内の斜視図で
ある。 １……電子ビーム蒸着用電子銃、３……ルツボ
、４……電子軌道、５……基板、６……膜厚モニ
ター。
ある。 １……電子ビーム蒸着用電子銃、３……ルツボ
、４……電子軌道、５……基板、６……膜厚モニ
ター。
Claims (1)
- 【実用新案登録請求の範囲】 １ 薄膜形成材料の蒸発源を真空容器内に設置し
てなる薄膜形成装置において、薄膜が形成される
基板と膜厚モニターが前記蒸発源を含む平面に関
して対称の位置に配置されたことを特徴とする薄
膜形成装置。 ２ 蒸発源を電子ビーム蒸着用電子銃とし、基板
と膜厚モニターが、電子ビーム蒸着用電子銃の電
子軌道を含む平面に関して対称の位置に配置され
た請求項１記載の薄膜形成装置。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1989123063U JPH0523572Y2 (ja) | 1989-10-20 | 1989-10-20 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1989123063U JPH0523572Y2 (ja) | 1989-10-20 | 1989-10-20 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0363569U true JPH0363569U (ja) | 1991-06-20 |
| JPH0523572Y2 JPH0523572Y2 (ja) | 1993-06-16 |
Family
ID=31671056
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1989123063U Expired - Lifetime JPH0523572Y2 (ja) | 1989-10-20 | 1989-10-20 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0523572Y2 (ja) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009034906A (ja) * | 2007-08-01 | 2009-02-19 | Kokuyo Co Ltd | 綴じ具の取付構造及びファイル |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5397983A (en) * | 1977-02-09 | 1978-08-26 | Toshiba Corp | Controlling method and apparatus for thickness of vacuum deposited film |
| JPS61186284A (ja) * | 1985-02-13 | 1986-08-19 | Nec Corp | 分子線エピタキシ−装置 |
-
1989
- 1989-10-20 JP JP1989123063U patent/JPH0523572Y2/ja not_active Expired - Lifetime
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5397983A (en) * | 1977-02-09 | 1978-08-26 | Toshiba Corp | Controlling method and apparatus for thickness of vacuum deposited film |
| JPS61186284A (ja) * | 1985-02-13 | 1986-08-19 | Nec Corp | 分子線エピタキシ−装置 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009034906A (ja) * | 2007-08-01 | 2009-02-19 | Kokuyo Co Ltd | 綴じ具の取付構造及びファイル |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0523572Y2 (ja) | 1993-06-16 |