JPH0360914B2 - - Google Patents
Info
- Publication number
- JPH0360914B2 JPH0360914B2 JP59186072A JP18607284A JPH0360914B2 JP H0360914 B2 JPH0360914 B2 JP H0360914B2 JP 59186072 A JP59186072 A JP 59186072A JP 18607284 A JP18607284 A JP 18607284A JP H0360914 B2 JPH0360914 B2 JP H0360914B2
- Authority
- JP
- Japan
- Prior art keywords
- powder
- silicon
- molybdenum silicide
- molybdenum
- target
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 63
- YXTPWUNVHCYOSP-UHFFFAOYSA-N bis($l^{2}-silanylidene)molybdenum Chemical compound [Si]=[Mo]=[Si] YXTPWUNVHCYOSP-UHFFFAOYSA-N 0.000 claims description 44
- 229910021344 molybdenum silicide Inorganic materials 0.000 claims description 42
- 229910052710 silicon Inorganic materials 0.000 claims description 42
- 239000010703 silicon Substances 0.000 claims description 42
- 239000000843 powder Substances 0.000 claims description 25
- 238000005245 sintering Methods 0.000 claims description 25
- 239000011863 silicon-based powder Substances 0.000 claims description 23
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 22
- 239000000203 mixture Substances 0.000 claims description 18
- 238000002844 melting Methods 0.000 claims description 12
- 230000008018 melting Effects 0.000 claims description 11
- 229910052750 molybdenum Inorganic materials 0.000 claims description 11
- 239000011733 molybdenum Substances 0.000 claims description 11
- 238000001354 calcination Methods 0.000 claims description 9
- 238000004544 sputter deposition Methods 0.000 claims description 9
- 229910045601 alloy Inorganic materials 0.000 claims description 7
- 239000000956 alloy Substances 0.000 claims description 7
- 238000004519 manufacturing process Methods 0.000 claims description 7
- 239000011812 mixed powder Substances 0.000 claims description 4
- 239000011261 inert gas Substances 0.000 claims description 3
- 238000010298 pulverizing process Methods 0.000 claims description 3
- 229910001182 Mo alloy Inorganic materials 0.000 claims description 2
- 238000000034 method Methods 0.000 description 21
- 238000007731 hot pressing Methods 0.000 description 8
- 238000000465 moulding Methods 0.000 description 8
- 229910016006 MoSi Inorganic materials 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 239000011148 porous material Substances 0.000 description 6
- 238000001272 pressureless sintering Methods 0.000 description 5
- 239000007791 liquid phase Substances 0.000 description 4
- 229910021332 silicide Inorganic materials 0.000 description 4
- 239000002245 particle Substances 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 description 3
- 239000000463 material Substances 0.000 description 2
- 239000007790 solid phase Substances 0.000 description 2
- 238000004891 communication Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000011978 dissolution method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- -1 molybdenum silicide Chemical compound 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 150000003376 silicon Chemical class 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Landscapes
- Ceramic Products (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59186072A JPS6176664A (ja) | 1984-09-05 | 1984-09-05 | スパツタリング装置用タ−ゲツト及びその製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59186072A JPS6176664A (ja) | 1984-09-05 | 1984-09-05 | スパツタリング装置用タ−ゲツト及びその製造方法 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63323064A Division JPH0666288B2 (ja) | 1988-12-21 | 1988-12-21 | スパッタリング装置用ターゲット |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6176664A JPS6176664A (ja) | 1986-04-19 |
| JPH0360914B2 true JPH0360914B2 (ru) | 1991-09-18 |
Family
ID=16181892
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59186072A Granted JPS6176664A (ja) | 1984-09-05 | 1984-09-05 | スパツタリング装置用タ−ゲツト及びその製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6176664A (ru) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61179534A (ja) * | 1985-01-16 | 1986-08-12 | Mitsubishi Metal Corp | スパツタリング装置用複合タ−ゲツト |
| JPS6270270A (ja) * | 1985-09-25 | 1987-03-31 | 日本鉱業株式会社 | 高融点金属シリサイド製ターゲットの製造方法 |
| JPS62171911A (ja) * | 1986-01-27 | 1987-07-28 | Nippon Mining Co Ltd | モリプデン或いはタングステンシリサイドの製造方法 |
| JP2997075B2 (ja) * | 1991-02-05 | 2000-01-11 | 株式会社 ジャパンエナジー | スパッタリング用シリサイドターゲット |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5880835A (ja) * | 1981-11-09 | 1983-05-16 | Toshiba Corp | 高融点金属シリサイドの形成方法 |
-
1984
- 1984-09-05 JP JP59186072A patent/JPS6176664A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5880835A (ja) * | 1981-11-09 | 1983-05-16 | Toshiba Corp | 高融点金属シリサイドの形成方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6176664A (ja) | 1986-04-19 |
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