JPH0355973B2 - - Google Patents
Info
- Publication number
- JPH0355973B2 JPH0355973B2 JP57227602A JP22760282A JPH0355973B2 JP H0355973 B2 JPH0355973 B2 JP H0355973B2 JP 57227602 A JP57227602 A JP 57227602A JP 22760282 A JP22760282 A JP 22760282A JP H0355973 B2 JPH0355973 B2 JP H0355973B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- etching
- photoresist
- semiconductor substrate
- mark
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Electron Beam Exposure (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57227602A JPS59121836A (ja) | 1982-12-28 | 1982-12-28 | 位置合せマ−クの形成方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57227602A JPS59121836A (ja) | 1982-12-28 | 1982-12-28 | 位置合せマ−クの形成方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59121836A JPS59121836A (ja) | 1984-07-14 |
| JPH0355973B2 true JPH0355973B2 (enrdf_load_stackoverflow) | 1991-08-27 |
Family
ID=16863503
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57227602A Granted JPS59121836A (ja) | 1982-12-28 | 1982-12-28 | 位置合せマ−クの形成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59121836A (enrdf_load_stackoverflow) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2767594B2 (ja) * | 1988-11-16 | 1998-06-18 | 富士通株式会社 | 半導体装置の製造方法 |
| JPH02230718A (ja) * | 1989-03-03 | 1990-09-13 | Nec Corp | 目合わせマークおよびその作製方法 |
-
1982
- 1982-12-28 JP JP57227602A patent/JPS59121836A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59121836A (ja) | 1984-07-14 |
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