JPH0353393B2 - - Google Patents
Info
- Publication number
- JPH0353393B2 JPH0353393B2 JP5362583A JP5362583A JPH0353393B2 JP H0353393 B2 JPH0353393 B2 JP H0353393B2 JP 5362583 A JP5362583 A JP 5362583A JP 5362583 A JP5362583 A JP 5362583A JP H0353393 B2 JPH0353393 B2 JP H0353393B2
- Authority
- JP
- Japan
- Prior art keywords
- etching
- substrate
- etching solution
- workpiece
- liquid tank
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000005530 etching Methods 0.000 claims description 39
- 238000003486 chemical etching Methods 0.000 claims description 12
- 239000007788 liquid Substances 0.000 claims description 10
- 238000005192 partition Methods 0.000 claims description 8
- 238000003756 stirring Methods 0.000 claims description 7
- 239000000758 substrate Substances 0.000 description 27
- 239000013078 crystal Substances 0.000 description 15
- 238000000034 method Methods 0.000 description 10
- 239000010453 quartz Substances 0.000 description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 7
- 150000001875 compounds Chemical class 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 230000000737 periodic effect Effects 0.000 description 3
- 230000007547 defect Effects 0.000 description 2
- 235000012431 wafers Nutrition 0.000 description 2
- BGPVFRJUHWVFKM-UHFFFAOYSA-N N1=C2C=CC=CC2=[N+]([O-])C1(CC1)CCC21N=C1C=CC=CC1=[N+]2[O-] Chemical compound N1=C2C=CC=CC2=[N+]([O-])C1(CC1)CCC21N=C1C=CC=CC1=[N+]2[O-] BGPVFRJUHWVFKM-UHFFFAOYSA-N 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Landscapes
- ing And Chemical Polishing (AREA)
- Weting (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5362583A JPS59179788A (ja) | 1983-03-31 | 1983-03-31 | ケミカルエッチング装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5362583A JPS59179788A (ja) | 1983-03-31 | 1983-03-31 | ケミカルエッチング装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59179788A JPS59179788A (ja) | 1984-10-12 |
| JPH0353393B2 true JPH0353393B2 (de) | 1991-08-14 |
Family
ID=12948085
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5362583A Granted JPS59179788A (ja) | 1983-03-31 | 1983-03-31 | ケミカルエッチング装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59179788A (de) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63162527U (de) * | 1987-04-09 | 1988-10-24 | ||
| JP3077140B2 (ja) * | 1988-09-12 | 2000-08-14 | 日本電気株式会社 | 半導体装置の製造装置 |
| CN103762160B (zh) * | 2014-01-28 | 2017-05-10 | 北京华力创通科技股份有限公司 | 深硅刻蚀方法 |
| CN111379009B (zh) * | 2020-04-30 | 2022-04-29 | 中国电子科技集团公司第五十五研究所 | 一种薄膜铌酸锂光波导芯片抛光装置的抛光方法 |
| KR102417059B1 (ko) * | 2021-12-22 | 2022-07-06 | 램테크놀러지 주식회사 | 식각액 검증을 위한 배치형 식각 장치 |
-
1983
- 1983-03-31 JP JP5362583A patent/JPS59179788A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59179788A (ja) | 1984-10-12 |
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