JPH0349102B2 - - Google Patents
Info
- Publication number
- JPH0349102B2 JPH0349102B2 JP58171592A JP17159283A JPH0349102B2 JP H0349102 B2 JPH0349102 B2 JP H0349102B2 JP 58171592 A JP58171592 A JP 58171592A JP 17159283 A JP17159283 A JP 17159283A JP H0349102 B2 JPH0349102 B2 JP H0349102B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- resist
- resist film
- etched
- patterned
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/094—Multilayer resist systems, e.g. planarising layers
Landscapes
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17159283A JPS6063534A (ja) | 1983-09-17 | 1983-09-17 | 微細加工方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17159283A JPS6063534A (ja) | 1983-09-17 | 1983-09-17 | 微細加工方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6063534A JPS6063534A (ja) | 1985-04-11 |
| JPH0349102B2 true JPH0349102B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1991-07-26 |
Family
ID=15926013
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17159283A Granted JPS6063534A (ja) | 1983-09-17 | 1983-09-17 | 微細加工方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6063534A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5645759A (en) * | 1979-09-20 | 1981-04-25 | Matsushita Electric Ind Co Ltd | Preparation of vapor growth film |
| JPS57136931A (en) * | 1981-02-17 | 1982-08-24 | Seiko Epson Corp | Photochemical reaction device |
-
1983
- 1983-09-17 JP JP17159283A patent/JPS6063534A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6063534A (ja) | 1985-04-11 |