JPH0345380B2 - - Google Patents

Info

Publication number
JPH0345380B2
JPH0345380B2 JP60028250A JP2825085A JPH0345380B2 JP H0345380 B2 JPH0345380 B2 JP H0345380B2 JP 60028250 A JP60028250 A JP 60028250A JP 2825085 A JP2825085 A JP 2825085A JP H0345380 B2 JPH0345380 B2 JP H0345380B2
Authority
JP
Japan
Prior art keywords
resist
formula
pattern
group
forming method
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60028250A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61188539A (ja
Inventor
Haruyori Tanaka
Masao Morita
Saburo Imamura
Toshiaki Tamamura
Osamu Kogure
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP60028250A priority Critical patent/JPS61188539A/ja
Priority to US06/733,505 priority patent/US4702990A/en
Priority to KR1019850003252A priority patent/KR930009567B1/ko
Publication of JPS61188539A publication Critical patent/JPS61188539A/ja
Publication of JPH0345380B2 publication Critical patent/JPH0345380B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP60028250A 1984-05-14 1985-02-18 パタ−ン形成方法 Granted JPS61188539A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP60028250A JPS61188539A (ja) 1985-02-18 1985-02-18 パタ−ン形成方法
US06/733,505 US4702990A (en) 1984-05-14 1985-05-10 Photosensitive resin composition and process for forming photo-resist pattern using the same
KR1019850003252A KR930009567B1 (ko) 1984-05-14 1985-05-13 감광성 수지 조성물 및 그것을 사용한 광저항 패턴형성방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60028250A JPS61188539A (ja) 1985-02-18 1985-02-18 パタ−ン形成方法

Publications (2)

Publication Number Publication Date
JPS61188539A JPS61188539A (ja) 1986-08-22
JPH0345380B2 true JPH0345380B2 (enrdf_load_stackoverflow) 1991-07-10

Family

ID=12243327

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60028250A Granted JPS61188539A (ja) 1984-05-14 1985-02-18 パタ−ン形成方法

Country Status (1)

Country Link
JP (1) JPS61188539A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2692209B2 (ja) * 1988-12-19 1997-12-17 富士通株式会社 レジストパターンの形成方法
DE10101734C2 (de) * 2001-01-16 2003-04-24 Osram Opto Semiconductors Gmbh Verfahren zum Ausbilden einer Ätzmaske auf einem Substrat

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6025061B2 (ja) * 1981-12-02 1985-06-15 日立化成工業株式会社 感光性シリコ−ン樹脂組成物
JPS58207041A (ja) * 1982-05-28 1983-12-02 Nec Corp 放射線感応性高分子レジスト
JPS59198446A (ja) * 1983-04-26 1984-11-10 Nippon Telegr & Teleph Corp <Ntt> 感光性樹脂組成物及びその使用方法

Also Published As

Publication number Publication date
JPS61188539A (ja) 1986-08-22

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