JPH0343614B2 - - Google Patents

Info

Publication number
JPH0343614B2
JPH0343614B2 JP57190545A JP19054582A JPH0343614B2 JP H0343614 B2 JPH0343614 B2 JP H0343614B2 JP 57190545 A JP57190545 A JP 57190545A JP 19054582 A JP19054582 A JP 19054582A JP H0343614 B2 JPH0343614 B2 JP H0343614B2
Authority
JP
Japan
Prior art keywords
ultraviolet rays
diazide
resist pattern
forming
positive resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57190545A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5979249A (ja
Inventor
Yoichi Nakamura
Cho Yamamoto
Takashi Komine
Akira Yokota
Hisashi Nakane
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Priority to JP57190545A priority Critical patent/JPS5979249A/ja
Priority to DE19833337315 priority patent/DE3337315A1/de
Publication of JPS5979249A publication Critical patent/JPS5979249A/ja
Priority to US07/161,213 priority patent/US4797348A/en
Publication of JPH0343614B2 publication Critical patent/JPH0343614B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP57190545A 1982-10-13 1982-10-29 パタ−ン形成方法 Granted JPS5979249A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP57190545A JPS5979249A (ja) 1982-10-29 1982-10-29 パタ−ン形成方法
DE19833337315 DE3337315A1 (de) 1982-10-13 1983-10-13 Zweifach-lichtempfindliche zusammensetzungen und verfahren zur erzeugung bildmustergemaesser photoresistschichten
US07/161,213 US4797348A (en) 1982-10-13 1988-02-17 Method of forming a positive resist pattern in photoresist of o-naphthoquinone diazide and bisazide with UV imaging exposure and far UV overall exposure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57190545A JPS5979249A (ja) 1982-10-29 1982-10-29 パタ−ン形成方法

Publications (2)

Publication Number Publication Date
JPS5979249A JPS5979249A (ja) 1984-05-08
JPH0343614B2 true JPH0343614B2 (c_deeref_Disk_and_Scratch_Disk_Pools_and_Their_Defaults.html) 1991-07-03

Family

ID=16259859

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57190545A Granted JPS5979249A (ja) 1982-10-13 1982-10-29 パタ−ン形成方法

Country Status (1)

Country Link
JP (1) JPS5979249A (c_deeref_Disk_and_Scratch_Disk_Pools_and_Their_Defaults.html)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IE57143B1 (en) * 1984-06-01 1992-05-06 Rohm & Haas Photosensitive coating compositions,thermally stable coating prepared from them,and the use of such coatings in forming thermally stable polymer images
JPS62100751A (ja) * 1985-10-24 1987-05-11 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション 自己整合パタ−ンの形成方法
JP2573996B2 (ja) * 1988-05-11 1997-01-22 日本電信電話株式会社 パターン形成材料
JPH0285857A (ja) * 1988-09-22 1990-03-27 Toshiba Corp 感光性樹脂組成物
US6190829B1 (en) * 1996-09-16 2001-02-20 International Business Machines Corporation Low “K” factor hybrid photoresist
JP4622282B2 (ja) * 2003-03-26 2011-02-02 住友ベークライト株式会社 ポジ型感光性樹脂組成物並びに半導体装置及び表示素子

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1588417A (en) * 1977-03-15 1981-04-23 Agfa Gevaert Photoresist materials
JPS6029936B2 (ja) * 1979-12-27 1985-07-13 富士通株式会社 パタ−ン形成法

Also Published As

Publication number Publication date
JPS5979249A (ja) 1984-05-08

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