JPH0334672B2 - - Google Patents
Info
- Publication number
- JPH0334672B2 JPH0334672B2 JP57095191A JP9519182A JPH0334672B2 JP H0334672 B2 JPH0334672 B2 JP H0334672B2 JP 57095191 A JP57095191 A JP 57095191A JP 9519182 A JP9519182 A JP 9519182A JP H0334672 B2 JPH0334672 B2 JP H0334672B2
- Authority
- JP
- Japan
- Prior art keywords
- silicon nitride
- nitride film
- film
- temperature
- silicon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/69—IGFETs having charge trapping gate insulators, e.g. MNOS transistors
Landscapes
- Non-Volatile Memory (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57095191A JPS58212180A (ja) | 1982-06-03 | 1982-06-03 | 不揮発性記憶装置およびその製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57095191A JPS58212180A (ja) | 1982-06-03 | 1982-06-03 | 不揮発性記憶装置およびその製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS58212180A JPS58212180A (ja) | 1983-12-09 |
JPH0334672B2 true JPH0334672B2 (enrdf_load_stackoverflow) | 1991-05-23 |
Family
ID=14130857
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57095191A Granted JPS58212180A (ja) | 1982-06-03 | 1982-06-03 | 不揮発性記憶装置およびその製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58212180A (enrdf_load_stackoverflow) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2649511B2 (ja) * | 1986-02-05 | 1997-09-03 | 松下電子工業株式会社 | 半導体記憶装置 |
US5168334A (en) * | 1987-07-31 | 1992-12-01 | Texas Instruments, Incorporated | Non-volatile semiconductor memory |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5893289A (ja) * | 1981-11-30 | 1983-06-02 | Seiko Epson Corp | 半導体装置の製造方法 |
-
1982
- 1982-06-03 JP JP57095191A patent/JPS58212180A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS58212180A (ja) | 1983-12-09 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US11721733B2 (en) | Memory transistor with multiple charge storing layers and a high work function gate electrode | |
US7479425B2 (en) | Method for forming high-K charge storage device | |
US9553175B2 (en) | SONOS type stacks for nonvolatile charge trap memory devices and methods to form the same | |
US20070215958A1 (en) | Semiconductor device and method of manufacturing the same | |
JP4617574B2 (ja) | 不揮発性半導体記憶装置およびその製造方法 | |
JPS6364063B2 (enrdf_load_stackoverflow) | ||
JPH0334672B2 (enrdf_load_stackoverflow) | ||
JPH0259632B2 (enrdf_load_stackoverflow) | ||
JPH0259631B2 (enrdf_load_stackoverflow) | ||
JPH061839B2 (ja) | 不揮発性記憶装置の製造方法 | |
JPH10209305A (ja) | 不揮発性半導体記憶装置 | |
JPH0422031B2 (enrdf_load_stackoverflow) | ||
JPH0665232B2 (ja) | 半導体記憶装置の製造方法 | |
JPH02277269A (ja) | 不揮発性メモリ装置の製造方法 | |
JPH07297182A (ja) | SiN系絶縁膜の形成方法 | |
JPH0888286A (ja) | 半導体記憶装置の製造方法 | |
JPS6170763A (ja) | 半導体記憶装置の製造方法 | |
JPS61288471A (ja) | 半導体記憶装置の製造方法 | |
JP2718931B2 (ja) | 半導体記憶装置の製造方法 | |
KR20080010514A (ko) | 절연막 구조물의 형성 방법 및 이를 이용한 불 휘발성메모리 소자의 형성 방법 | |
KR20080002030A (ko) | 비휘발성 메모리 장치의 게이트 구조물 형성 방법 | |
JPH01264268A (ja) | 不揮発性記憶装置の製造方法 | |
JPS61290771A (ja) | 半導体記憶装置の製造方法 | |
JPH0590602A (ja) | 半導体記憶素子およびその製法 | |
JPH02114568A (ja) | 不揮発性記憶装置の製造方法 |