JPH0334672B2 - - Google Patents

Info

Publication number
JPH0334672B2
JPH0334672B2 JP57095191A JP9519182A JPH0334672B2 JP H0334672 B2 JPH0334672 B2 JP H0334672B2 JP 57095191 A JP57095191 A JP 57095191A JP 9519182 A JP9519182 A JP 9519182A JP H0334672 B2 JPH0334672 B2 JP H0334672B2
Authority
JP
Japan
Prior art keywords
silicon nitride
nitride film
film
temperature
silicon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57095191A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58212180A (ja
Inventor
Kazuo Sato
Ichizo Kamei
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electronics Corp filed Critical Matsushita Electronics Corp
Priority to JP57095191A priority Critical patent/JPS58212180A/ja
Publication of JPS58212180A publication Critical patent/JPS58212180A/ja
Publication of JPH0334672B2 publication Critical patent/JPH0334672B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/69IGFETs having charge trapping gate insulators, e.g. MNOS transistors

Landscapes

  • Non-Volatile Memory (AREA)
JP57095191A 1982-06-03 1982-06-03 不揮発性記憶装置およびその製造方法 Granted JPS58212180A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57095191A JPS58212180A (ja) 1982-06-03 1982-06-03 不揮発性記憶装置およびその製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57095191A JPS58212180A (ja) 1982-06-03 1982-06-03 不揮発性記憶装置およびその製造方法

Publications (2)

Publication Number Publication Date
JPS58212180A JPS58212180A (ja) 1983-12-09
JPH0334672B2 true JPH0334672B2 (enrdf_load_stackoverflow) 1991-05-23

Family

ID=14130857

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57095191A Granted JPS58212180A (ja) 1982-06-03 1982-06-03 不揮発性記憶装置およびその製造方法

Country Status (1)

Country Link
JP (1) JPS58212180A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2649511B2 (ja) * 1986-02-05 1997-09-03 松下電子工業株式会社 半導体記憶装置
US5168334A (en) * 1987-07-31 1992-12-01 Texas Instruments, Incorporated Non-volatile semiconductor memory

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5893289A (ja) * 1981-11-30 1983-06-02 Seiko Epson Corp 半導体装置の製造方法

Also Published As

Publication number Publication date
JPS58212180A (ja) 1983-12-09

Similar Documents

Publication Publication Date Title
US11721733B2 (en) Memory transistor with multiple charge storing layers and a high work function gate electrode
US7479425B2 (en) Method for forming high-K charge storage device
US9553175B2 (en) SONOS type stacks for nonvolatile charge trap memory devices and methods to form the same
US20070215958A1 (en) Semiconductor device and method of manufacturing the same
JP4617574B2 (ja) 不揮発性半導体記憶装置およびその製造方法
JPS6364063B2 (enrdf_load_stackoverflow)
JPH0334672B2 (enrdf_load_stackoverflow)
JPH0259632B2 (enrdf_load_stackoverflow)
JPH0259631B2 (enrdf_load_stackoverflow)
JPH061839B2 (ja) 不揮発性記憶装置の製造方法
JPH10209305A (ja) 不揮発性半導体記憶装置
JPH0422031B2 (enrdf_load_stackoverflow)
JPH0665232B2 (ja) 半導体記憶装置の製造方法
JPH02277269A (ja) 不揮発性メモリ装置の製造方法
JPH07297182A (ja) SiN系絶縁膜の形成方法
JPH0888286A (ja) 半導体記憶装置の製造方法
JPS6170763A (ja) 半導体記憶装置の製造方法
JPS61288471A (ja) 半導体記憶装置の製造方法
JP2718931B2 (ja) 半導体記憶装置の製造方法
KR20080010514A (ko) 절연막 구조물의 형성 방법 및 이를 이용한 불 휘발성메모리 소자의 형성 방법
KR20080002030A (ko) 비휘발성 메모리 장치의 게이트 구조물 형성 방법
JPH01264268A (ja) 不揮発性記憶装置の製造方法
JPS61290771A (ja) 半導体記憶装置の製造方法
JPH0590602A (ja) 半導体記憶素子およびその製法
JPH02114568A (ja) 不揮発性記憶装置の製造方法