JPH0259632B2 - - Google Patents
Info
- Publication number
- JPH0259632B2 JPH0259632B2 JP58169659A JP16965983A JPH0259632B2 JP H0259632 B2 JPH0259632 B2 JP H0259632B2 JP 58169659 A JP58169659 A JP 58169659A JP 16965983 A JP16965983 A JP 16965983A JP H0259632 B2 JPH0259632 B2 JP H0259632B2
- Authority
- JP
- Japan
- Prior art keywords
- silicon nitride
- nitride film
- film
- silicon oxide
- oxide film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
Landscapes
- Non-Volatile Memory (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58169659A JPS6060770A (ja) | 1983-09-14 | 1983-09-14 | 半導体記憶装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58169659A JPS6060770A (ja) | 1983-09-14 | 1983-09-14 | 半導体記憶装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6060770A JPS6060770A (ja) | 1985-04-08 |
| JPH0259632B2 true JPH0259632B2 (enrdf_load_stackoverflow) | 1990-12-13 |
Family
ID=15890551
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58169659A Granted JPS6060770A (ja) | 1983-09-14 | 1983-09-14 | 半導体記憶装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6060770A (enrdf_load_stackoverflow) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6214474A (ja) * | 1985-07-12 | 1987-01-23 | Agency Of Ind Science & Technol | 半導体不揮発性記憶装置 |
| JP2512589Y2 (ja) * | 1992-11-09 | 1996-10-02 | 工業技術院長 | 半導体不揮発性記憶装置 |
| JP4151229B2 (ja) * | 2000-10-26 | 2008-09-17 | ソニー株式会社 | 不揮発性半導体記憶装置およびその製造方法 |
| JP4734799B2 (ja) * | 2001-08-24 | 2011-07-27 | ソニー株式会社 | 不揮発性半導体メモリ装置の製造方法 |
| JP3637332B2 (ja) | 2002-05-29 | 2005-04-13 | 株式会社東芝 | 半導体装置及びその製造方法 |
| KR101402102B1 (ko) | 2007-03-23 | 2014-05-30 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체장치의 제작 방법 |
-
1983
- 1983-09-14 JP JP58169659A patent/JPS6060770A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6060770A (ja) | 1985-04-08 |
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