JPH033389B2 - - Google Patents

Info

Publication number
JPH033389B2
JPH033389B2 JP56085909A JP8590981A JPH033389B2 JP H033389 B2 JPH033389 B2 JP H033389B2 JP 56085909 A JP56085909 A JP 56085909A JP 8590981 A JP8590981 A JP 8590981A JP H033389 B2 JPH033389 B2 JP H033389B2
Authority
JP
Japan
Prior art keywords
layer
polycrystalline silicon
silicon
semiconductor substrate
gate electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP56085909A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5732674A (en
Inventor
Gajanan Janbotsutokaa Chakurapani
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of JPS5732674A publication Critical patent/JPS5732674A/ja
Publication of JPH033389B2 publication Critical patent/JPH033389B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/01—Manufacture or treatment
    • H10D30/021—Manufacture or treatment of FETs having insulated gates [IGFET]
    • H10D30/027—Manufacture or treatment of FETs having insulated gates [IGFET] of lateral single-gate IGFETs
    • H10D30/0273—Manufacture or treatment of FETs having insulated gates [IGFET] of lateral single-gate IGFETs forming final gates or dummy gates after forming source and drain electrodes, e.g. contact first technology
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/033—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers
    • H01L21/0334—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers characterised by their size, orientation, disposition, behaviour, shape, in horizontal or vertical plane
    • H01L21/0337—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers characterised by their size, orientation, disposition, behaviour, shape, in horizontal or vertical plane characterised by the process involved to create the mask, e.g. lift-off masks, sidewalls, or to modify the mask, e.g. pre-treatment, post-treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
    • H01L21/321—After treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
    • H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
    • H01L21/7684—Smoothing; Planarisation
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/01—Manufacture or treatment
    • H10D62/021—Forming source or drain recesses by etching e.g. recessing by etching and then refilling

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Thin Film Transistor (AREA)
JP8590981A 1980-07-08 1981-06-05 Integrated circuit structure Granted JPS5732674A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/167,172 US4378627A (en) 1980-07-08 1980-07-08 Self-aligned metal process for field effect transistor integrated circuits using polycrystalline silicon gate electrodes

Publications (2)

Publication Number Publication Date
JPS5732674A JPS5732674A (en) 1982-02-22
JPH033389B2 true JPH033389B2 (en, 2012) 1991-01-18

Family

ID=22606247

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8590981A Granted JPS5732674A (en) 1980-07-08 1981-06-05 Integrated circuit structure

Country Status (4)

Country Link
US (1) US4378627A (en, 2012)
EP (1) EP0043944B1 (en, 2012)
JP (1) JPS5732674A (en, 2012)
DE (1) DE3175448D1 (en, 2012)

Families Citing this family (51)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4758528A (en) * 1980-07-08 1988-07-19 International Business Machines Corporation Self-aligned metal process for integrated circuit metallization
NL188550C (nl) * 1981-07-02 1992-07-16 Suwa Seikosha Kk Werkwijze voor het vervaardigen van een halfgeleidersubstraat.
FR2525029A1 (fr) * 1982-04-08 1983-10-14 Commissariat Energie Atomique Procede d'isolation d'une ligne conductrice dans un circuit integre et procede de fabrication d'un transistor mos utilisant un tel procede d'isolation
JPS58201362A (ja) * 1982-05-20 1983-11-24 Toshiba Corp 半導体装置の製造方法
FR2529714A1 (fr) * 1982-07-01 1984-01-06 Commissariat Energie Atomique Procede de realisation de l'oxyde de champ d'un circuit integre
US4545114A (en) * 1982-09-30 1985-10-08 Fujitsu Limited Method of producing semiconductor device
US4551906A (en) * 1983-12-12 1985-11-12 International Business Machines Corporation Method for making self-aligned lateral bipolar transistors
US4546535A (en) * 1983-12-12 1985-10-15 International Business Machines Corporation Method of making submicron FET structure
US4636834A (en) * 1983-12-12 1987-01-13 International Business Machines Corporation Submicron FET structure and method of making
US4583282A (en) * 1984-09-14 1986-04-22 Motorola, Inc. Process for self-aligned buried layer, field guard, and isolation
US4574469A (en) * 1984-09-14 1986-03-11 Motorola, Inc. Process for self-aligned buried layer, channel-stop, and isolation
JPS6182482A (ja) * 1984-09-29 1986-04-26 Toshiba Corp ＧａＡｓ電界効果トランジスタの製造方法
US4571817A (en) * 1985-03-15 1986-02-25 Motorola, Inc. Method of making closely spaced contacts to PN-junction using stacked polysilicon layers, differential etching and ion implantations
US4666737A (en) * 1986-02-11 1987-05-19 Harris Corporation Via metallization using metal fillets
GB2199694A (en) * 1986-12-23 1988-07-13 Philips Electronic Associated A method of manufacturing a semiconductor device
US4785337A (en) * 1986-10-17 1988-11-15 International Business Machines Corporation Dynamic ram cell having shared trench storage capacitor with sidewall-defined bridge contacts and gate electrodes
US4939154A (en) * 1987-03-25 1990-07-03 Seiko Instruments Inc. Method of fabricating an insulated gate semiconductor device having a self-aligned gate
FR2618011B1 (fr) * 1987-07-10 1992-09-18 Commissariat Energie Atomique Procede de fabrication d'une cellule de memoire
US4818713A (en) * 1987-10-20 1989-04-04 American Telephone And Telegraph Company, At&T Bell Laboratories Techniques useful in fabricating semiconductor devices having submicron features
JPH0251238A (ja) * 1988-08-12 1990-02-21 Sanyo Electric Co Ltd 半導体装置及びその製造方法
JPH0289323A (ja) * 1988-09-27 1990-03-29 Nec Corp Ｍｉｓ型電界効果トランジスタの製造方法
US5079180A (en) * 1988-12-22 1992-01-07 Texas Instruments Incorporated Method of fabricating a raised source/drain transistor
US4945070A (en) * 1989-01-24 1990-07-31 Harris Corporation Method of making cmos with shallow source and drain junctions
US5001082A (en) * 1989-04-12 1991-03-19 Mcnc Self-aligned salicide process for forming semiconductor devices and devices formed thereby
KR940005729B1 (ko) * 1989-06-13 1994-06-23 삼성전자 주식회사 디램셀의 제조방법 및 구조
US5012306A (en) * 1989-09-22 1991-04-30 Board Of Regents, The University Of Texas System Hot-carrier suppressed sub-micron MISFET device
US5093275A (en) * 1989-09-22 1992-03-03 The Board Of Regents, The University Of Texas System Method for forming hot-carrier suppressed sub-micron MISFET device
JPH03296247A (ja) * 1990-04-13 1991-12-26 Mitsubishi Electric Corp 半導体装置およびその製造方法
US5024971A (en) * 1990-08-20 1991-06-18 Motorola, Inc. Method for patterning submicron openings using an image reversal layer of material
US5071780A (en) * 1990-08-27 1991-12-10 Taiwan Semiconductor Manufacturing Company, Ltd. Reverse self-aligned transistor integrated circuit
US5028557A (en) * 1990-08-27 1991-07-02 Taiwan Semiconductor Manufacturing Co., Ltd. Method of making a reverse self-aligned BIMOS transistor integrated circuit
US5175606A (en) * 1990-08-27 1992-12-29 Taiwan Semiconductor Manufacturing Company Reverse self-aligned BiMOS transistor integrated circuit
US5235204A (en) * 1990-08-27 1993-08-10 Taiwan Semiconductor Manufacturing Company Reverse self-aligned transistor integrated circuit
US5242858A (en) * 1990-09-07 1993-09-07 Canon Kabushiki Kaisha Process for preparing semiconductor device by use of a flattening agent and diffusion
JPH04280436A (ja) * 1990-09-28 1992-10-06 Motorola Inc 相補型自己整合ｈｆｅｔの製造方法
AT404524B (de) * 1991-09-03 1998-12-28 Austria Mikrosysteme Int Verfahren zur herstellung von selbstausgerichteten, lateralen und vertikalen halbleiterbauelementen
US5212106A (en) * 1992-05-07 1993-05-18 Advanced Micro Devices, Inc. Optimizing doping control in short channel MOS
US5215937A (en) * 1992-05-07 1993-06-01 Advanced Micro Devices, Inc. Optimizing doping control in short channel MOS
US5270234A (en) * 1992-10-30 1993-12-14 International Business Machines Corporation Deep submicron transistor fabrication method
US5466615A (en) * 1993-08-19 1995-11-14 Taiwan Semiconductor Manufacturing Company Ltd. Silicon damage free process for double poly emitter and reverse MOS in BiCMOS application
US5434093A (en) * 1994-08-10 1995-07-18 Intel Corporation Inverted spacer transistor
JP2720796B2 (ja) * 1994-11-15 1998-03-04 日本電気株式会社 半導体装置の製造方法
KR19980064220A (ko) * 1996-12-20 1998-10-07 로더리히네테부쉬 Ｍｏｓ 트랜지스터
US5879998A (en) * 1997-07-09 1999-03-09 Advanced Micro Devices, Inc. Adaptively controlled, self-aligned, short channel device and method for manufacturing same
US5776821A (en) * 1997-08-22 1998-07-07 Vlsi Technology, Inc. Method for forming a reduced width gate electrode
US5970354A (en) * 1997-12-08 1999-10-19 Advanced Micro Devices, Inc. Poly recessed fabrication method for defining high performance MOSFETS
US6774001B2 (en) * 1998-10-13 2004-08-10 Stmicroelectronics, Inc. Self-aligned gate and method
US6159808A (en) * 1999-11-12 2000-12-12 United Semiconductor Corp. Method of forming self-aligned DRAM cell
TW490745B (en) * 2000-05-15 2002-06-11 Ibm Self-aligned double gate MOSFET with separate gates
US6982460B1 (en) 2000-07-07 2006-01-03 International Business Machines Corporation Self-aligned gate MOSFET with separate gates
US6902867B2 (en) * 2002-10-02 2005-06-07 Lexmark International, Inc. Ink jet printheads and methods therefor

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3750268A (en) * 1971-09-10 1973-08-07 Motorola Inc Poly-silicon electrodes for c-igfets
JPS555709B2 (en, 2012) * 1971-11-16 1980-02-08
US3984822A (en) * 1974-12-30 1976-10-05 Intel Corporation Double polycrystalline silicon gate memory device
JPS51118381A (en) * 1975-04-10 1976-10-18 Matsushita Electric Ind Co Ltd Manufacturing process for semiconductor unit
GB1527894A (en) * 1975-10-15 1978-10-11 Mullard Ltd Methods of manufacturing electronic devices
JPS5265683A (en) * 1975-11-28 1977-05-31 Hitachi Ltd Production of insulated gate type mis semiconductor device
JPS52141578A (en) * 1976-05-20 1977-11-25 Matsushita Electric Ind Co Ltd Manufacture of mos-type semiconductor device
JPS5951152B2 (ja) * 1976-07-31 1984-12-12 松下電器産業株式会社 半導体装置の製造方法
US4070501A (en) * 1976-10-28 1978-01-24 Ibm Corporation Forming self-aligned via holes in thin film interconnection systems
GB2003660A (en) 1977-08-19 1979-03-14 Plessey Co Ltd Deposition of material on a substrate
US4157269A (en) * 1978-06-06 1979-06-05 International Business Machines Corporation Utilizing polysilicon diffusion sources and special masking techniques
US4209349A (en) * 1978-11-03 1980-06-24 International Business Machines Corporation Method for forming a narrow dimensioned mask opening on a silicon body utilizing reactive ion etching
US4256514A (en) * 1978-11-03 1981-03-17 International Business Machines Corporation Method for forming a narrow dimensioned region on a body
US4234362A (en) * 1978-11-03 1980-11-18 International Business Machines Corporation Method for forming an insulator between layers of conductive material
CA1131367A (en) * 1978-11-13 1982-09-07 Keming W. Yeh Self-aligned mesfet having reduced series resistance
US4236294A (en) * 1979-03-16 1980-12-02 International Business Machines Corporation High performance bipolar device and method for making same
US4252582A (en) * 1980-01-25 1981-02-24 International Business Machines Corporation Self aligned method for making bipolar transistor having minimum base to emitter contact spacing
US4318751A (en) * 1980-03-13 1982-03-09 International Business Machines Corporation Self-aligned process for providing an improved high performance bipolar transistor
US4287661A (en) * 1980-03-26 1981-09-08 International Business Machines Corporation Method for making an improved polysilicon conductor structure utilizing reactive-ion etching and thermal oxidation
US4322883A (en) * 1980-07-08 1982-04-06 International Business Machines Corporation Self-aligned metal process for integrated injection logic integrated circuits

Also Published As

Publication number Publication date
DE3175448D1 (en) 1986-11-13
EP0043944A2 (en) 1982-01-20
US4378627A (en) 1983-04-05
JPS5732674A (en) 1982-02-22
EP0043944A3 (en) 1983-07-06
EP0043944B1 (en) 1986-10-08

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