JPH033212B2 - - Google Patents

Info

Publication number
JPH033212B2
JPH033212B2 JP54096570A JP9657079A JPH033212B2 JP H033212 B2 JPH033212 B2 JP H033212B2 JP 54096570 A JP54096570 A JP 54096570A JP 9657079 A JP9657079 A JP 9657079A JP H033212 B2 JPH033212 B2 JP H033212B2
Authority
JP
Japan
Prior art keywords
weight
film
photosensitive
parts
resin composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP54096570A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5619752A (en
Inventor
Hajime Kakumaru
Nobuyuki Hayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP9657079A priority Critical patent/JPS5619752A/ja
Priority to GB8023351A priority patent/GB2059982B/en
Priority to DE19803028136 priority patent/DE3028136A1/de
Publication of JPS5619752A publication Critical patent/JPS5619752A/ja
Publication of JPH033212B2 publication Critical patent/JPH033212B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Laminated Bodies (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP9657079A 1979-07-27 1979-07-27 Photosensitive resin composition laminate Granted JPS5619752A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP9657079A JPS5619752A (en) 1979-07-27 1979-07-27 Photosensitive resin composition laminate
GB8023351A GB2059982B (en) 1979-07-27 1980-07-17 Photosentisive composition and photosensitive laminate developable with aqueous alkali
DE19803028136 DE3028136A1 (de) 1979-07-27 1980-07-24 Lichtempfindliche masse und damit gebildetes lichtempfindliches element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9657079A JPS5619752A (en) 1979-07-27 1979-07-27 Photosensitive resin composition laminate

Publications (2)

Publication Number Publication Date
JPS5619752A JPS5619752A (en) 1981-02-24
JPH033212B2 true JPH033212B2 (enrdf_load_stackoverflow) 1991-01-18

Family

ID=14168654

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9657079A Granted JPS5619752A (en) 1979-07-27 1979-07-27 Photosensitive resin composition laminate

Country Status (3)

Country Link
JP (1) JPS5619752A (enrdf_load_stackoverflow)
DE (1) DE3028136A1 (enrdf_load_stackoverflow)
GB (1) GB2059982B (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1998004407A1 (fr) * 1996-07-30 1998-02-05 Hitachi Chemical Co., Ltd. Fabrication d'une couche mince stratifiee et d'une carte a circuit imprime

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3120052A1 (de) * 1981-05-20 1982-12-09 Hoechst Ag, 6000 Frankfurt Durch strahlung polymerisierbares gemisch und damit hergestelltes kopiermaterial
JPS581142A (ja) * 1981-06-25 1983-01-06 Hitachi Chem Co Ltd 感光性樹脂組成物及び感光性樹脂組成物積層体
JPS5888741A (ja) * 1981-11-20 1983-05-26 Hitachi Chem Co Ltd 感光性樹脂組成物及び感光性樹脂組成物積層体
US4752553A (en) * 1982-04-01 1988-06-21 M&T Chemicals Inc. High resolution solder mask photopolymers for screen coating over circuit traces
DE3223104A1 (de) * 1982-06-21 1983-12-22 Hoechst Ag, 6230 Frankfurt Photopolymerisierbares gemisch und damit hergestelltes photopolymerisierbares kopiermaterial
DE3427519A1 (de) * 1984-07-26 1986-02-06 Hoechst Ag, 6230 Frankfurt Durch strahlung polymerisierbares gemisch, darin enthaltenes mischpolymerisat und verfahren zur herstellung des mischpolymerisats
JPS6318692A (ja) * 1986-07-11 1988-01-26 日立化成工業株式会社 印刷配線板の製造方法
JP2536540B2 (ja) * 1987-08-26 1996-09-18 日立化成工業株式会社 感光性樹脂組成物
JPH01159637A (ja) * 1987-12-16 1989-06-22 Daicel Chem Ind Ltd 感光性硬化組成物
US5182187A (en) * 1988-02-24 1993-01-26 Hoechst Aktiengesellschaft Radiation-polymerizable composition and recording material prepared from this composition
JP2678761B2 (ja) * 1988-02-27 1997-11-17 日本合成化学工業株式会社 画像形成方法
JP2776522B2 (ja) * 1988-12-15 1998-07-16 ダイセル化学工業株式会社 光重合性組成物
JP2856746B2 (ja) * 1988-12-15 1999-02-10 ダイセル化学工業株式会社 光重合性組成物
US4985343A (en) * 1989-02-09 1991-01-15 Mitsubishi Rayon Co., Ltd. Crosslinking-curable resin composition
US12023710B2 (en) * 2020-06-09 2024-07-02 University Of North Texas Fluorinated polymers for corrosion protection of metal

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA923358A (en) * 1969-08-01 1973-03-27 Fuji Photo Film Co. Light-sensitive stencil printing material
ZA72345B (en) * 1971-02-04 1973-03-28 Dynachem Corp Polymerization compositions and processes
JPS48100201A (enrdf_load_stackoverflow) * 1972-04-04 1973-12-18
JPS498281A (enrdf_load_stackoverflow) * 1972-05-11 1974-01-24
GB1507704A (en) * 1974-04-23 1978-04-19 Du Pont Photopolymerisable compositions
JPS51123140A (en) * 1975-04-19 1976-10-27 Nippon Paint Co Ltd Photosensitive compositions and processing method thereof

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1998004407A1 (fr) * 1996-07-30 1998-02-05 Hitachi Chemical Co., Ltd. Fabrication d'une couche mince stratifiee et d'une carte a circuit imprime

Also Published As

Publication number Publication date
DE3028136A1 (de) 1981-02-12
GB2059982A (en) 1981-04-29
GB2059982B (en) 1983-05-18
DE3028136C2 (enrdf_load_stackoverflow) 1989-02-16
JPS5619752A (en) 1981-02-24

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