GB2059982B - Photosentisive composition and photosensitive laminate developable with aqueous alkali - Google Patents

Photosentisive composition and photosensitive laminate developable with aqueous alkali

Info

Publication number
GB2059982B
GB2059982B GB8023351A GB8023351A GB2059982B GB 2059982 B GB2059982 B GB 2059982B GB 8023351 A GB8023351 A GB 8023351A GB 8023351 A GB8023351 A GB 8023351A GB 2059982 B GB2059982 B GB 2059982B
Authority
GB
United Kingdom
Prior art keywords
photosentisive
developable
composition
aqueous alkali
photosensitive laminate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB8023351A
Other languages
English (en)
Other versions
GB2059982A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Publication of GB2059982A publication Critical patent/GB2059982A/en
Application granted granted Critical
Publication of GB2059982B publication Critical patent/GB2059982B/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Laminated Bodies (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
GB8023351A 1979-07-27 1980-07-17 Photosentisive composition and photosensitive laminate developable with aqueous alkali Expired GB2059982B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9657079A JPS5619752A (en) 1979-07-27 1979-07-27 Photosensitive resin composition laminate

Publications (2)

Publication Number Publication Date
GB2059982A GB2059982A (en) 1981-04-29
GB2059982B true GB2059982B (en) 1983-05-18

Family

ID=14168654

Family Applications (1)

Application Number Title Priority Date Filing Date
GB8023351A Expired GB2059982B (en) 1979-07-27 1980-07-17 Photosentisive composition and photosensitive laminate developable with aqueous alkali

Country Status (3)

Country Link
JP (1) JPS5619752A (enrdf_load_stackoverflow)
DE (1) DE3028136A1 (enrdf_load_stackoverflow)
GB (1) GB2059982B (enrdf_load_stackoverflow)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3120052A1 (de) * 1981-05-20 1982-12-09 Hoechst Ag, 6000 Frankfurt Durch strahlung polymerisierbares gemisch und damit hergestelltes kopiermaterial
JPS581142A (ja) * 1981-06-25 1983-01-06 Hitachi Chem Co Ltd 感光性樹脂組成物及び感光性樹脂組成物積層体
JPS5888741A (ja) * 1981-11-20 1983-05-26 Hitachi Chem Co Ltd 感光性樹脂組成物及び感光性樹脂組成物積層体
US4752553A (en) * 1982-04-01 1988-06-21 M&T Chemicals Inc. High resolution solder mask photopolymers for screen coating over circuit traces
DE3223104A1 (de) * 1982-06-21 1983-12-22 Hoechst Ag, 6230 Frankfurt Photopolymerisierbares gemisch und damit hergestelltes photopolymerisierbares kopiermaterial
DE3427519A1 (de) * 1984-07-26 1986-02-06 Hoechst Ag, 6230 Frankfurt Durch strahlung polymerisierbares gemisch, darin enthaltenes mischpolymerisat und verfahren zur herstellung des mischpolymerisats
JPS6318692A (ja) * 1986-07-11 1988-01-26 日立化成工業株式会社 印刷配線板の製造方法
JP2536540B2 (ja) * 1987-08-26 1996-09-18 日立化成工業株式会社 感光性樹脂組成物
JPH01159637A (ja) * 1987-12-16 1989-06-22 Daicel Chem Ind Ltd 感光性硬化組成物
US5182187A (en) * 1988-02-24 1993-01-26 Hoechst Aktiengesellschaft Radiation-polymerizable composition and recording material prepared from this composition
JP2678761B2 (ja) * 1988-02-27 1997-11-17 日本合成化学工業株式会社 画像形成方法
JP2776522B2 (ja) * 1988-12-15 1998-07-16 ダイセル化学工業株式会社 光重合性組成物
JP2856746B2 (ja) * 1988-12-15 1999-02-10 ダイセル化学工業株式会社 光重合性組成物
US4985343A (en) * 1989-02-09 1991-01-15 Mitsubishi Rayon Co., Ltd. Crosslinking-curable resin composition
CN1226200A (zh) * 1996-07-30 1999-08-18 日立化成工业株式会社 叠层薄膜及印刷线路板的制备方法
US12023710B2 (en) * 2020-06-09 2024-07-02 University Of North Texas Fluorinated polymers for corrosion protection of metal

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA923358A (en) * 1969-08-01 1973-03-27 Fuji Photo Film Co. Light-sensitive stencil printing material
ZA72345B (en) * 1971-02-04 1973-03-28 Dynachem Corp Polymerization compositions and processes
JPS48100201A (enrdf_load_stackoverflow) * 1972-04-04 1973-12-18
JPS498281A (enrdf_load_stackoverflow) * 1972-05-11 1974-01-24
GB1507704A (en) * 1974-04-23 1978-04-19 Du Pont Photopolymerisable compositions
JPS51123140A (en) * 1975-04-19 1976-10-27 Nippon Paint Co Ltd Photosensitive compositions and processing method thereof

Also Published As

Publication number Publication date
DE3028136A1 (de) 1981-02-12
GB2059982A (en) 1981-04-29
JPH033212B2 (enrdf_load_stackoverflow) 1991-01-18
DE3028136C2 (enrdf_load_stackoverflow) 1989-02-16
JPS5619752A (en) 1981-02-24

Similar Documents

Publication Publication Date Title
GB2037660B (en) Multilayered film
GB2059616B (en) Aqueous photographic colour developing solutions
GB2059982B (en) Photosentisive composition and photosensitive laminate developable with aqueous alkali
GB2049011B (en) Wall construction unit with integral corner portion
JPS5530994A (en) Laminated film construction
TR21616A (tr) Kahplanmis kompozit atese dayanikh parcalar
JPS5684954A (en) Filmmpaper laminate and its manufacture
GB2050247B (en) Laminated film
JPS5579010A (en) Laminated film and its use
JPS55117655A (en) Laminate and its preparation
JPS56100347A (en) Laserrexpanded xxray absorption fineestructure
JPS5610453A (en) Fireeresisting laminate and its manufacture
DE3169226D1 (en) Aqueous developable photosensitive composition and printing plate
JPS55120027A (en) Film resist
JPS5689944A (en) Thermoocontractive film and its manufacture
GB2035223B (en) Aperture stop
JPS55111500A (en) Sodium alumoglucoheptonate and its manufacture
JPS5515848A (en) Laminate and its preparation
JPS5515898A (en) Formmlike film and its preparation
JPS5615626A (en) Agricutural film
JPS54101883A (en) Multilayer construction
JPS55108586A (en) Shutter with panels on both sides
JPS5689945A (en) Thermoocontractive cylindrical laminated film and its manufacture
JPS55149410A (en) Parts fitting structure
JPS543180A (en) Incombustible film

Legal Events

Date Code Title Description
PE20 Patent expired after termination of 20 years

Effective date: 20000716