JPH0321213B2 - - Google Patents

Info

Publication number
JPH0321213B2
JPH0321213B2 JP57093710A JP9371082A JPH0321213B2 JP H0321213 B2 JPH0321213 B2 JP H0321213B2 JP 57093710 A JP57093710 A JP 57093710A JP 9371082 A JP9371082 A JP 9371082A JP H0321213 B2 JPH0321213 B2 JP H0321213B2
Authority
JP
Japan
Prior art keywords
temperature
low
temperature plasma
reactor
electrode plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57093710A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58210844A (ja
Inventor
Yoshikazu Santo
Tokuki Goto
Itsuo Tanaka
Hiroshi Ishidoshiro
Matsuo Namikata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SANDO TETSUKOSHO KK
YUNICHIKA KK
Original Assignee
SANDO TETSUKOSHO KK
YUNICHIKA KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SANDO TETSUKOSHO KK, YUNICHIKA KK filed Critical SANDO TETSUKOSHO KK
Priority to JP57093710A priority Critical patent/JPS58210844A/ja
Publication of JPS58210844A publication Critical patent/JPS58210844A/ja
Publication of JPH0321213B2 publication Critical patent/JPH0321213B2/ja
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/14—Surface shaping of articles, e.g. embossing; Apparatus therefor by plasma treatment
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/14—Surface shaping of articles, e.g. embossing; Apparatus therefor by plasma treatment
    • B29C2059/147—Low pressure plasma; Glow discharge plasma
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2313/00—Use of textile products or fabrics as reinforcement

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Plasma Technology (AREA)
  • Treatment Of Fiber Materials (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Chemical Vapour Deposition (AREA)
  • Chemical Or Physical Treatment Of Fibers (AREA)
JP57093710A 1982-06-01 1982-06-01 低温プラズマ雰囲気中の被処理物温度制御方法及びその装置 Granted JPS58210844A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57093710A JPS58210844A (ja) 1982-06-01 1982-06-01 低温プラズマ雰囲気中の被処理物温度制御方法及びその装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57093710A JPS58210844A (ja) 1982-06-01 1982-06-01 低温プラズマ雰囲気中の被処理物温度制御方法及びその装置

Publications (2)

Publication Number Publication Date
JPS58210844A JPS58210844A (ja) 1983-12-08
JPH0321213B2 true JPH0321213B2 (OSRAM) 1991-03-22

Family

ID=14089968

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57093710A Granted JPS58210844A (ja) 1982-06-01 1982-06-01 低温プラズマ雰囲気中の被処理物温度制御方法及びその装置

Country Status (1)

Country Link
JP (1) JPS58210844A (OSRAM)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012059872A (ja) * 2010-09-08 2012-03-22 Hitachi High-Technologies Corp 熱処理装置

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6119343A (ja) * 1984-07-05 1986-01-28 Shin Etsu Chem Co Ltd タイヤコ−ド平織状物の低温プラズマ処理方法
JPS6328967A (ja) * 1986-07-18 1988-02-06 ユニチカ株式会社 繊維製品の低温プラズマ処理方法及びその装置
JP4914713B2 (ja) * 2003-05-05 2012-04-11 コモンウェルス サイエンティフィック アンド インダストリアル リサーチ オーガニゼイション プラズマ処理装置および方法
JP2011222404A (ja) * 2010-04-13 2011-11-04 Akitoshi Okino プラズマ処理方法およびプラズマ処理装置ならびにプラズマ処理された処理対象物

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6039088B2 (ja) * 1977-12-08 1985-09-04 東レ株式会社 高分子樹脂の放電処理方法
JPS5718737A (en) * 1980-06-21 1982-01-30 Shin Etsu Chem Co Ltd Apparatus for continuous plasma treatment

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012059872A (ja) * 2010-09-08 2012-03-22 Hitachi High-Technologies Corp 熱処理装置

Also Published As

Publication number Publication date
JPS58210844A (ja) 1983-12-08

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