JPH0320808B2 - - Google Patents
Info
- Publication number
- JPH0320808B2 JPH0320808B2 JP7117584A JP7117584A JPH0320808B2 JP H0320808 B2 JPH0320808 B2 JP H0320808B2 JP 7117584 A JP7117584 A JP 7117584A JP 7117584 A JP7117584 A JP 7117584A JP H0320808 B2 JPH0320808 B2 JP H0320808B2
- Authority
- JP
- Japan
- Prior art keywords
- resist
- magnetic
- thin film
- magnetic pole
- magnetic head
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000010409 thin film Substances 0.000 claims description 37
- 238000000034 method Methods 0.000 claims description 14
- 239000010408 film Substances 0.000 claims description 11
- 229910010272 inorganic material Inorganic materials 0.000 claims description 9
- 239000000758 substrate Substances 0.000 claims description 8
- 238000004544 sputter deposition Methods 0.000 claims description 6
- 239000011147 inorganic material Substances 0.000 claims description 5
- 239000011368 organic material Substances 0.000 claims description 5
- 150000002484 inorganic compounds Chemical class 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 229910052751 metal Inorganic materials 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 4
- 238000010030 laminating Methods 0.000 claims description 2
- 150000002739 metals Chemical class 0.000 claims 1
- 239000007788 liquid Substances 0.000 description 5
- 238000005530 etching Methods 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 239000000696 magnetic material Substances 0.000 description 3
- 239000004642 Polyimide Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 150000002902 organometallic compounds Chemical class 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 229910000702 sendust Inorganic materials 0.000 description 2
- 238000000992 sputter etching Methods 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- QZPSXPBJTPJTSZ-UHFFFAOYSA-N aqua regia Chemical compound Cl.O[N+]([O-])=O QZPSXPBJTPJTSZ-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 229910000889 permalloy Inorganic materials 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Magnetic Heads (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7117584A JPS60214408A (ja) | 1984-04-10 | 1984-04-10 | 磁気ヘッドの製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7117584A JPS60214408A (ja) | 1984-04-10 | 1984-04-10 | 磁気ヘッドの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60214408A JPS60214408A (ja) | 1985-10-26 |
JPH0320808B2 true JPH0320808B2 (enrdf_load_stackoverflow) | 1991-03-20 |
Family
ID=13453060
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7117584A Granted JPS60214408A (ja) | 1984-04-10 | 1984-04-10 | 磁気ヘッドの製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60214408A (enrdf_load_stackoverflow) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01243212A (ja) * | 1988-03-24 | 1989-09-27 | Fujitsu Ltd | 薄膜磁気ヘッドの製造方法 |
-
1984
- 1984-04-10 JP JP7117584A patent/JPS60214408A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS60214408A (ja) | 1985-10-26 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |