JPH0315068A - パターン修正方法 - Google Patents

パターン修正方法

Info

Publication number
JPH0315068A
JPH0315068A JP2143699A JP14369990A JPH0315068A JP H0315068 A JPH0315068 A JP H0315068A JP 2143699 A JP2143699 A JP 2143699A JP 14369990 A JP14369990 A JP 14369990A JP H0315068 A JPH0315068 A JP H0315068A
Authority
JP
Japan
Prior art keywords
charged particle
ion beam
pattern
defect
org
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2143699A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0458015B2 (enExample
Inventor
Masahiro Yamamoto
昌宏 山本
Yoshitomo Nakagawa
良知 中川
Takashi Minafuji
孝 皆藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Instruments Inc
Original Assignee
Seiko Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Instruments Inc filed Critical Seiko Instruments Inc
Priority to JP2143699A priority Critical patent/JPH0315068A/ja
Publication of JPH0315068A publication Critical patent/JPH0315068A/ja
Publication of JPH0458015B2 publication Critical patent/JPH0458015B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP2143699A 1990-06-01 1990-06-01 パターン修正方法 Granted JPH0315068A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2143699A JPH0315068A (ja) 1990-06-01 1990-06-01 パターン修正方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2143699A JPH0315068A (ja) 1990-06-01 1990-06-01 パターン修正方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP58201764A Division JPS6094728A (ja) 1983-10-27 1983-10-27 荷電粒子ビームを用いた加工方法およびその装置

Publications (2)

Publication Number Publication Date
JPH0315068A true JPH0315068A (ja) 1991-01-23
JPH0458015B2 JPH0458015B2 (enExample) 1992-09-16

Family

ID=15344911

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2143699A Granted JPH0315068A (ja) 1990-06-01 1990-06-01 パターン修正方法

Country Status (1)

Country Link
JP (1) JPH0315068A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0658481A (ja) * 1991-11-26 1994-03-01 Kojima Seisakusho:Kk システム継手
WO2022153793A1 (ja) * 2021-01-15 2022-07-21 株式会社ブイ・テクノロジー フォトマスク修正装置およびフォトマスクの修正方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0658481A (ja) * 1991-11-26 1994-03-01 Kojima Seisakusho:Kk システム継手
WO2022153793A1 (ja) * 2021-01-15 2022-07-21 株式会社ブイ・テクノロジー フォトマスク修正装置およびフォトマスクの修正方法
JP2022109566A (ja) * 2021-01-15 2022-07-28 株式会社ブイ・テクノロジー フォトマスク修正装置およびフォトマスクの修正方法

Also Published As

Publication number Publication date
JPH0458015B2 (enExample) 1992-09-16

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