JPH0563930B2 - - Google Patents

Info

Publication number
JPH0563930B2
JPH0563930B2 JP14369890A JP14369890A JPH0563930B2 JP H0563930 B2 JPH0563930 B2 JP H0563930B2 JP 14369890 A JP14369890 A JP 14369890A JP 14369890 A JP14369890 A JP 14369890A JP H0563930 B2 JPH0563930 B2 JP H0563930B2
Authority
JP
Japan
Prior art keywords
sample
charged particle
ion beam
organic gas
beam irradiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP14369890A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0316112A (ja
Inventor
Masahiro Yamamoto
Yoshitomo Nakagawa
Takashi Minafuji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Instruments Inc
Original Assignee
Seiko Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Instruments Inc filed Critical Seiko Instruments Inc
Priority to JP2143698A priority Critical patent/JPH0316112A/ja
Publication of JPH0316112A publication Critical patent/JPH0316112A/ja
Publication of JPH0563930B2 publication Critical patent/JPH0563930B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Electron Beam Exposure (AREA)
JP2143698A 1990-06-01 1990-06-01 イオンビーム加工装置 Granted JPH0316112A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2143698A JPH0316112A (ja) 1990-06-01 1990-06-01 イオンビーム加工装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2143698A JPH0316112A (ja) 1990-06-01 1990-06-01 イオンビーム加工装置

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP58201764A Division JPS6094728A (ja) 1983-10-27 1983-10-27 荷電粒子ビームを用いた加工方法およびその装置

Publications (2)

Publication Number Publication Date
JPH0316112A JPH0316112A (ja) 1991-01-24
JPH0563930B2 true JPH0563930B2 (enExample) 1993-09-13

Family

ID=15344887

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2143698A Granted JPH0316112A (ja) 1990-06-01 1990-06-01 イオンビーム加工装置

Country Status (1)

Country Link
JP (1) JPH0316112A (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10229285A (ja) * 1997-02-13 1998-08-25 Uniden Corp 電子部品ホルダー
JP2022109566A (ja) * 2021-01-15 2022-07-28 株式会社ブイ・テクノロジー フォトマスク修正装置およびフォトマスクの修正方法

Also Published As

Publication number Publication date
JPH0316112A (ja) 1991-01-24

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