JPH0312452B2 - - Google Patents
Info
- Publication number
- JPH0312452B2 JPH0312452B2 JP19786781A JP19786781A JPH0312452B2 JP H0312452 B2 JPH0312452 B2 JP H0312452B2 JP 19786781 A JP19786781 A JP 19786781A JP 19786781 A JP19786781 A JP 19786781A JP H0312452 B2 JPH0312452 B2 JP H0312452B2
- Authority
- JP
- Japan
- Prior art keywords
- ray
- layer
- membrane film
- ray absorption
- absorption layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000010521 absorption reaction Methods 0.000 claims description 14
- 239000012528 membrane Substances 0.000 claims description 14
- 239000012535 impurity Substances 0.000 claims description 7
- 239000000758 substrate Substances 0.000 claims description 4
- 230000005855 radiation Effects 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 description 8
- 238000000034 method Methods 0.000 description 7
- 238000005530 etching Methods 0.000 description 6
- 238000000059 patterning Methods 0.000 description 6
- 239000004642 Polyimide Substances 0.000 description 5
- 239000010408 film Substances 0.000 description 5
- 238000010884 ion-beam technique Methods 0.000 description 5
- 229920001721 polyimide Polymers 0.000 description 5
- 239000010409 thin film Substances 0.000 description 4
- 238000010894 electron beam technology Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 238000005468 ion implantation Methods 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000002164 ion-beam lithography Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56197867A JPS5898923A (ja) | 1981-12-09 | 1981-12-09 | Ｘ線露光ホトマスク |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56197867A JPS5898923A (ja) | 1981-12-09 | 1981-12-09 | Ｘ線露光ホトマスク |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5898923A JPS5898923A (ja) | 1983-06-13 |
| JPH0312452B2 true JPH0312452B2 (de) | 1991-02-20 |
Family
ID=16381647
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56197867A Granted JPS5898923A (ja) | 1981-12-09 | 1981-12-09 | Ｘ線露光ホトマスク |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5898923A (de) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2010023911A1 (ja) | 2008-08-29 | 2010-03-04 | オイレス工業株式会社 | 複層摺動部材及びそれを用いた自動車のラックピニオン式舵取装置におけるラックガイド |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA1313792C (en) * | 1986-02-28 | 1993-02-23 | Junji Hirokane | Method of manufacturing photo-mask and photo-mask manufactured thereby |
| JPH063791B2 (ja) * | 1989-06-30 | 1994-01-12 | 工業技術院長 | Ｘ線マスクおよびその製造方法 |
-
1981
- 1981-12-09 JP JP56197867A patent/JPS5898923A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2010023911A1 (ja) | 2008-08-29 | 2010-03-04 | オイレス工業株式会社 | 複層摺動部材及びそれを用いた自動車のラックピニオン式舵取装置におけるラックガイド |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5898923A (ja) | 1983-06-13 |
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