JPH0263A - フォトマスクカバー - Google Patents
フォトマスクカバーInfo
- Publication number
- JPH0263A JPH0263A JP1089136A JP8913689A JPH0263A JP H0263 A JPH0263 A JP H0263A JP 1089136 A JP1089136 A JP 1089136A JP 8913689 A JP8913689 A JP 8913689A JP H0263 A JPH0263 A JP H0263A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- photomask
- plasticizer
- thickness
- cellulose
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1089136A JPH0263A (ja) | 1989-04-07 | 1989-04-07 | フォトマスクカバー |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1089136A JPH0263A (ja) | 1989-04-07 | 1989-04-07 | フォトマスクカバー |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57103488A Division JPS58219023A (ja) | 1982-06-15 | 1982-06-15 | 樹脂薄膜の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0263A true JPH0263A (ja) | 1990-01-05 |
| JPH0544017B2 JPH0544017B2 (enExample) | 1993-07-05 |
Family
ID=13962464
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1089136A Granted JPH0263A (ja) | 1989-04-07 | 1989-04-07 | フォトマスクカバー |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0263A (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001201845A (ja) * | 1999-11-09 | 2001-07-27 | Asahi Kasei Electronics Co Ltd | 大型ペリクル |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI288443B (en) | 2002-05-17 | 2007-10-11 | Semiconductor Energy Lab | SiN film, semiconductor device, and the manufacturing method thereof |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5480082A (en) * | 1977-12-05 | 1979-06-26 | Ibm | Mask for projecting print |
| JPS5544841A (en) * | 1978-09-26 | 1980-03-29 | Mitsubishi Gas Chem Co Inc | Method of producing laminated plates |
| JPS58196501A (ja) * | 1981-12-02 | 1983-11-16 | アドバンスド セミコンダクタ プロダクツ | 光学的薄膜体の製造方法 |
-
1989
- 1989-04-07 JP JP1089136A patent/JPH0263A/ja active Granted
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5480082A (en) * | 1977-12-05 | 1979-06-26 | Ibm | Mask for projecting print |
| JPS5544841A (en) * | 1978-09-26 | 1980-03-29 | Mitsubishi Gas Chem Co Inc | Method of producing laminated plates |
| JPS58196501A (ja) * | 1981-12-02 | 1983-11-16 | アドバンスド セミコンダクタ プロダクツ | 光学的薄膜体の製造方法 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001201845A (ja) * | 1999-11-09 | 2001-07-27 | Asahi Kasei Electronics Co Ltd | 大型ペリクル |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0544017B2 (enExample) | 1993-07-05 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS6325932B2 (enExample) | ||
| US4861402A (en) | Method of making a cellulose acetate butyrate pellicle | |
| JP4686846B2 (ja) | 偏光板用保護フィルム及びそれを用いた偏光板並びに表示装置 | |
| US5008156A (en) | Photochemically stable mid and deep ultraviolet pellicles | |
| JPH0262A (ja) | フォトマスクカバー | |
| JPH0264A (ja) | フォトマスクカバーの製造方法 | |
| US5883169A (en) | Lens wafers with removable coating | |
| JPH0544017B2 (enExample) | ||
| JPS6038130A (ja) | 枠に接着固定されたポリマ−薄膜の製造方法 | |
| KR100346062B1 (ko) | 반도체 장치의 제조방법 | |
| US4796973A (en) | Pellicle structure for transmission of mid ultraviolet light | |
| JP2790946B2 (ja) | ペリクル膜の製造方法 | |
| JPH0465764B2 (enExample) | ||
| JP4371458B2 (ja) | ペリクルの製造方法 | |
| GB2165545A (en) | Pellicle structure for transmission of mid ultraviolet light | |
| JPS6035733A (ja) | フオトマスク用防塵カバ−の製造方法 | |
| JPH0768576A (ja) | フッ素樹脂薄膜の製造方法 | |
| JPH06222551A (ja) | 離型性成膜用基板およびペリクル膜の製造方法 | |
| JPH01166045A (ja) | ペリクルの剥離法 | |
| DE69227210T2 (de) | Gleichmässig beschichtete Photolackzusammensetzung | |
| JPH0477739A (ja) | ペリクルの製造方法 | |
| BE820396A (fr) | Pellicules revetues | |
| JPH02230245A (ja) | リソグラフイー用ペリクル | |
| JP2790850B2 (ja) | ペリクル用セルロース薄膜 | |
| JPH09509749A (ja) | 除去可能なコーティングを有するレンズウエハ |