JPH0260051B2 - - Google Patents

Info

Publication number
JPH0260051B2
JPH0260051B2 JP59139777A JP13977784A JPH0260051B2 JP H0260051 B2 JPH0260051 B2 JP H0260051B2 JP 59139777 A JP59139777 A JP 59139777A JP 13977784 A JP13977784 A JP 13977784A JP H0260051 B2 JPH0260051 B2 JP H0260051B2
Authority
JP
Japan
Prior art keywords
mercury lamp
mercury
semiconductor wafer
exposure
power consumption
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59139777A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6120326A (ja
Inventor
Takehiro Kira
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ushio Denki KK
Original Assignee
Ushio Denki KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ushio Denki KK filed Critical Ushio Denki KK
Priority to JP59139777A priority Critical patent/JPS6120326A/ja
Priority to US06/705,645 priority patent/US4606997A/en
Priority to FR858502944A priority patent/FR2567282B1/fr
Priority to GB08506125A priority patent/GB2161286B/en
Priority to DE3510480A priority patent/DE3510480C2/de
Priority to NLAANVRAGE8501935,A priority patent/NL190496C/xx
Publication of JPS6120326A publication Critical patent/JPS6120326A/ja
Publication of JPH0260051B2 publication Critical patent/JPH0260051B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70016—Production of exposure light, i.e. light sources by discharge lamps
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/82—Lamps with high-pressure unconstricted discharge having a cold pressure > 400 Torr
    • H01J61/822—High-pressure mercury lamps

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Discharge Lamp (AREA)
JP59139777A 1984-07-07 1984-07-07 水銀灯による半導体ウエハ−材料の露光方法 Granted JPS6120326A (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP59139777A JPS6120326A (ja) 1984-07-07 1984-07-07 水銀灯による半導体ウエハ−材料の露光方法
US06/705,645 US4606997A (en) 1984-07-07 1985-02-26 Exposure method of semiconductor wafer by mercury-vapor lamp
FR858502944A FR2567282B1 (fr) 1984-07-07 1985-02-28 Procede d'exposition d'une pastille de semiconducteur par une lampe a vapeur de mercure
GB08506125A GB2161286B (en) 1984-07-07 1985-03-08 Method of exposing a semiconductor wafer to light from a mercury-vapor
DE3510480A DE3510480C2 (de) 1984-07-07 1985-03-22 Verfahren zur nacheinanderfolgenden Belichtung kleiner Abschnitte eines Halbleiterwafers
NLAANVRAGE8501935,A NL190496C (nl) 1984-07-07 1985-07-05 Belichtingsstelsel voor het achtereenvolgens belichten van halfgeleiderplakken.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59139777A JPS6120326A (ja) 1984-07-07 1984-07-07 水銀灯による半導体ウエハ−材料の露光方法

Publications (2)

Publication Number Publication Date
JPS6120326A JPS6120326A (ja) 1986-01-29
JPH0260051B2 true JPH0260051B2 (cg-RX-API-DMAC7.html) 1990-12-14

Family

ID=15253173

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59139777A Granted JPS6120326A (ja) 1984-07-07 1984-07-07 水銀灯による半導体ウエハ−材料の露光方法

Country Status (6)

Country Link
US (1) US4606997A (cg-RX-API-DMAC7.html)
JP (1) JPS6120326A (cg-RX-API-DMAC7.html)
DE (1) DE3510480C2 (cg-RX-API-DMAC7.html)
FR (1) FR2567282B1 (cg-RX-API-DMAC7.html)
GB (1) GB2161286B (cg-RX-API-DMAC7.html)
NL (1) NL190496C (cg-RX-API-DMAC7.html)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS622443A (ja) * 1985-06-28 1987-01-08 Ushio Inc フオトリソグラフイ
JP2915362B2 (ja) * 1996-09-27 1999-07-05 ウシオ電機株式会社 ショートアーク型水銀ランプ
CN1650393A (zh) * 2001-06-25 2005-08-03 皇家菲利浦电子有限公司 高压气体放电灯及其制造方法
JP2024077101A (ja) * 2022-11-28 2024-06-07 ウシオ電機株式会社 照明光学系、露光装置、照射方法、及び部品の製造方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2247176A (en) * 1931-05-13 1941-06-24 Gen Electric Gaseous electric discharge device
US2422280A (en) * 1944-07-24 1947-06-17 Curtis Helene Ind Inc Fluorescent illumination
US4040736A (en) * 1973-09-12 1977-08-09 Kasper Instruments, Inc. Step-and-repeat projection alignment and exposure system
US4024428A (en) * 1975-05-19 1977-05-17 Optical Associates, Incorporated Radiation-sensitive control circuit for driving lamp at various power levels
DE2535921A1 (de) * 1975-08-12 1977-03-03 Patra Patent Treuhand Quecksilberdampf-hochdruckentladungslampe mit zusatz von metallhalogeniden fuer horizontale brennlage
JPS54108478A (en) * 1978-02-14 1979-08-25 Ushio Electric Inc Printing or transcribing method of semiconductor and discharge lamp suitable for printing or transcription
GB2014335B (en) * 1978-02-14 1982-06-03 Kasper Instruments Apparatus for prolonging lamp life by minimizing power requirement levels
DE2845603C2 (de) * 1978-10-19 1982-12-09 Censor Patent- und Versuchs-Anstalt, 9490 Vaduz Verfahren und Einrichtung zum Projektionskopieren
US4226522A (en) * 1978-11-17 1980-10-07 Energy Conversion Devices, Inc. Imaging device
US4226523A (en) * 1978-11-17 1980-10-07 Energy Conversion Devices, Inc. Imaging device
GB2069228B (en) * 1979-01-02 1983-02-23 Gen Electric Stabilised high intensity discharge lamp
EP0080820A3 (en) * 1981-11-27 1983-12-14 Thorn Emi Plc Improvements in or relating to discharge lamps

Also Published As

Publication number Publication date
GB2161286A (en) 1986-01-08
JPS6120326A (ja) 1986-01-29
NL8501935A (nl) 1986-02-03
GB8506125D0 (en) 1985-04-11
DE3510480A1 (de) 1986-01-16
NL190496C (nl) 1994-03-16
GB2161286B (en) 1988-12-14
US4606997A (en) 1986-08-19
FR2567282B1 (fr) 1990-12-28
FR2567282A1 (fr) 1986-01-10
DE3510480C2 (de) 1993-12-23
NL190496B (nl) 1993-10-18

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees