JPH0259619B2 - - Google Patents

Info

Publication number
JPH0259619B2
JPH0259619B2 JP58229293A JP22929383A JPH0259619B2 JP H0259619 B2 JPH0259619 B2 JP H0259619B2 JP 58229293 A JP58229293 A JP 58229293A JP 22929383 A JP22929383 A JP 22929383A JP H0259619 B2 JPH0259619 B2 JP H0259619B2
Authority
JP
Japan
Prior art keywords
solution
polyimide
siloxane
precursor
silicon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP58229293A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59107524A (ja
Inventor
Kazumasa Igarashi
Katsuhiko Yamaguchi
Kazuo Iko
Kazuyuki Miki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nitto Denko Corp
Original Assignee
Nitto Denko Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nitto Denko Corp filed Critical Nitto Denko Corp
Priority to JP58229293A priority Critical patent/JPS59107524A/ja
Publication of JPS59107524A publication Critical patent/JPS59107524A/ja
Publication of JPH0259619B2 publication Critical patent/JPH0259619B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P14/683—

Landscapes

  • Silicon Polymers (AREA)
  • Local Oxidation Of Silicon (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Formation Of Insulating Films (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
JP58229293A 1983-12-05 1983-12-05 半導体素子の層間絶縁膜形成方法 Granted JPS59107524A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58229293A JPS59107524A (ja) 1983-12-05 1983-12-05 半導体素子の層間絶縁膜形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58229293A JPS59107524A (ja) 1983-12-05 1983-12-05 半導体素子の層間絶縁膜形成方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP56029241A Division JPS5813088B2 (ja) 1981-02-27 1981-02-27 シロキサン変性ポリイミド前駆体の製造法

Publications (2)

Publication Number Publication Date
JPS59107524A JPS59107524A (ja) 1984-06-21
JPH0259619B2 true JPH0259619B2 (Direct) 1990-12-13

Family

ID=16889856

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58229293A Granted JPS59107524A (ja) 1983-12-05 1983-12-05 半導体素子の層間絶縁膜形成方法

Country Status (1)

Country Link
JP (1) JPS59107524A (Direct)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0211631A (ja) * 1988-06-30 1990-01-16 Nippon Steel Chem Co Ltd 半導体保護用樹脂及び半導体
JPH05331446A (ja) * 1992-06-04 1993-12-14 Sumitomo Bakelite Co Ltd 高分子量ポリイミド樹脂フィルム接着剤
JPH05331283A (ja) * 1992-06-04 1993-12-14 Sumitomo Bakelite Co Ltd ポリイミド樹脂
JP6881705B2 (ja) 2016-05-11 2021-06-02 シーメンス・ヘルスケア・ダイアグノスティックス・インコーポレーテッドＳｉｅｍｅｎｓ Ｈｅａｌｔｈｃａｒｅ Ｄｉａｇｎｏｓｔｉｃｓ Ｉｎｃ． 液面検出機能付き計測プローブのクイック接続構造

Also Published As

Publication number Publication date
JPS59107524A (ja) 1984-06-21

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