JPH0259620B2 - - Google Patents

Info

Publication number
JPH0259620B2
JPH0259620B2 JP58229290A JP22929083A JPH0259620B2 JP H0259620 B2 JPH0259620 B2 JP H0259620B2 JP 58229290 A JP58229290 A JP 58229290A JP 22929083 A JP22929083 A JP 22929083A JP H0259620 B2 JPH0259620 B2 JP H0259620B2
Authority
JP
Japan
Prior art keywords
protective film
polyimide
polyimide precursor
silicon
dianhydride
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP58229290A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59107521A (ja
Inventor
Kazumasa Igarashi
Katsuhiko Yamaguchi
Kazuo Iko
Kazuyuki Miki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nitto Denko Corp
Original Assignee
Nitto Denko Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nitto Denko Corp filed Critical Nitto Denko Corp
Priority to JP58229290A priority Critical patent/JPS59107521A/ja
Publication of JPS59107521A publication Critical patent/JPS59107521A/ja
Publication of JPH0259620B2 publication Critical patent/JPH0259620B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P14/683—

Landscapes

  • Formation Of Insulating Films (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Silicon Polymers (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
JP58229290A 1983-12-05 1983-12-05 半導体素子の保護膜形成方法 Granted JPS59107521A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58229290A JPS59107521A (ja) 1983-12-05 1983-12-05 半導体素子の保護膜形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58229290A JPS59107521A (ja) 1983-12-05 1983-12-05 半導体素子の保護膜形成方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP56029240A Division JPS5813087B2 (ja) 1981-02-27 1981-02-27 シロキサン変性ポリイミド前駆体の製造方法

Publications (2)

Publication Number Publication Date
JPS59107521A JPS59107521A (ja) 1984-06-21
JPH0259620B2 true JPH0259620B2 (Direct) 1990-12-13

Family

ID=16889803

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58229290A Granted JPS59107521A (ja) 1983-12-05 1983-12-05 半導体素子の保護膜形成方法

Country Status (1)

Country Link
JP (1) JPS59107521A (Direct)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0740587B2 (ja) * 1985-12-26 1995-05-01 松下電子工業株式会社 半導体装置の製造方法
JPH0211631A (ja) * 1988-06-30 1990-01-16 Nippon Steel Chem Co Ltd 半導体保護用樹脂及び半導体
JPH0291125A (ja) * 1988-09-29 1990-03-30 Nippon Steel Chem Co Ltd シリコーンポリイミド及びその製造方法

Also Published As

Publication number Publication date
JPS59107521A (ja) 1984-06-21

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