JPH0259615B2 - - Google Patents
Info
- Publication number
- JPH0259615B2 JPH0259615B2 JP58217790A JP21779083A JPH0259615B2 JP H0259615 B2 JPH0259615 B2 JP H0259615B2 JP 58217790 A JP58217790 A JP 58217790A JP 21779083 A JP21779083 A JP 21779083A JP H0259615 B2 JPH0259615 B2 JP H0259615B2
- Authority
- JP
- Japan
- Prior art keywords
- marks
- mark
- alignment
- substrates
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000005286 illumination Methods 0.000 claims description 10
- 238000000034 method Methods 0.000 claims description 8
- 238000002310 reflectometry Methods 0.000 claims 2
- 239000000758 substrate Substances 0.000 description 29
- 239000011521 glass Substances 0.000 description 8
- 238000010586 diagram Methods 0.000 description 7
- 230000003287 optical effect Effects 0.000 description 5
- 238000003384 imaging method Methods 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 230000007423 decrease Effects 0.000 description 3
- 239000007772 electrode material Substances 0.000 description 3
- 239000000428 dust Substances 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000011179 visual inspection Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7073—Alignment marks and their environment
- G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/26—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes
- G01B11/27—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes for testing the alignment of axes
- G01B11/272—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes for testing the alignment of axes using photoelectric detection means
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133354—Arrangements for aligning or assembling substrates
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Liquid Crystal (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58217790A JPS60110119A (ja) | 1983-11-21 | 1983-11-21 | 位置合わせ方法 |
US06/672,784 US4643579A (en) | 1983-11-21 | 1984-11-19 | Aligning method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58217790A JPS60110119A (ja) | 1983-11-21 | 1983-11-21 | 位置合わせ方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60110119A JPS60110119A (ja) | 1985-06-15 |
JPH0259615B2 true JPH0259615B2 (enrdf_load_stackoverflow) | 1990-12-13 |
Family
ID=16709762
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58217790A Granted JPS60110119A (ja) | 1983-11-21 | 1983-11-21 | 位置合わせ方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60110119A (enrdf_load_stackoverflow) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0241862Y2 (enrdf_load_stackoverflow) * | 1986-08-26 | 1990-11-08 | ||
JPH06102675A (ja) * | 1992-09-17 | 1994-04-15 | Kamo Denki Kenkyusho:Kk | 印刷機用版材の高速高精度自動穴あけ機構 |
JP4395796B2 (ja) | 2007-07-10 | 2010-01-13 | 株式会社デンソー | 車両用空調装置 |
JP2016082061A (ja) * | 2014-10-16 | 2016-05-16 | トヨタ自動車株式会社 | ウエハとマスクの位置合わせ方法 |
-
1983
- 1983-11-21 JP JP58217790A patent/JPS60110119A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS60110119A (ja) | 1985-06-15 |
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