JPH0248624B2 - - Google Patents

Info

Publication number
JPH0248624B2
JPH0248624B2 JP62168977A JP16897787A JPH0248624B2 JP H0248624 B2 JPH0248624 B2 JP H0248624B2 JP 62168977 A JP62168977 A JP 62168977A JP 16897787 A JP16897787 A JP 16897787A JP H0248624 B2 JPH0248624 B2 JP H0248624B2
Authority
JP
Japan
Prior art keywords
vacuum chamber
cathode
film
sputtering
film forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP62168977A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6415368A (en
Inventor
Ichiro Araki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TOTSUKI KK
Original Assignee
TOTSUKI KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TOTSUKI KK filed Critical TOTSUKI KK
Priority to JP16897787A priority Critical patent/JPS6415368A/ja
Publication of JPS6415368A publication Critical patent/JPS6415368A/ja
Publication of JPH0248624B2 publication Critical patent/JPH0248624B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
JP16897787A 1987-07-07 1987-07-07 Sputtering device Granted JPS6415368A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16897787A JPS6415368A (en) 1987-07-07 1987-07-07 Sputtering device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16897787A JPS6415368A (en) 1987-07-07 1987-07-07 Sputtering device

Publications (2)

Publication Number Publication Date
JPS6415368A JPS6415368A (en) 1989-01-19
JPH0248624B2 true JPH0248624B2 (enrdf_load_stackoverflow) 1990-10-25

Family

ID=15878068

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16897787A Granted JPS6415368A (en) 1987-07-07 1987-07-07 Sputtering device

Country Status (1)

Country Link
JP (1) JPS6415368A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010090033A (ko) * 2001-08-14 2001-10-18 손종역 박막의 레이저 증착에서 1축 제어방식의 멀티타겟홀터.
JP4667057B2 (ja) * 2005-02-08 2011-04-06 キヤノン株式会社 成膜装置および成膜方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56155981A (en) * 1980-05-06 1981-12-02 Mitsubishi Electric Corp Optical encoder

Also Published As

Publication number Publication date
JPS6415368A (en) 1989-01-19

Similar Documents

Publication Publication Date Title
EP0443049B1 (en) Sputtering apparatus and sputtering system
US4062319A (en) Vacuum treating apparatus
US20100170439A1 (en) Vapor deposition apparatus
JP2627861B2 (ja) Ｔｉ−ＴｉＮ積層膜の成膜方法および装置
JP2002088471A (ja) スパッタ装置
CN101611164B (zh) 成膜设备和成膜方法
US8585872B2 (en) Sputtering apparatus and film-forming processes
JPH0248624B2 (enrdf_load_stackoverflow)
JPS58144474A (ja) スパツタリング装置
US11384423B2 (en) Sputtering apparatus and sputtering method
JP2762479B2 (ja) マグネトロン型スパッタリング装置
JP2009287046A (ja) スパッタリング方法及びスパッタリング装置
JP4108896B2 (ja) 成膜装置
JP2790661B2 (ja) スパッタ装置
JPH02179870A (ja) 薄膜形成装置
JPH03232964A (ja) スパッタリング装置
CN102234783B (zh) 靶材基座及采用该靶材基座的镀膜装置
JPS6396268A (ja) スパツタ装置
JP2820471B2 (ja) 薄膜形成装置
KR101421642B1 (ko) 기판 처리 장치
JPS63143261A (ja) スパツタリングによる多層膜の形成法
JP3357580B2 (ja) 枚葉式マグネトロンスパッタ装置
JPS62167619A (ja) 磁気デイスク製膜装置
JPS6013068A (ja) スパツタ装置
JPH05243156A (ja) 化学気相成長装置